scholarly journals Structural characterization of the nickel thin film deposited by glad technique

2013 ◽  
Vol 45 (1) ◽  
pp. 61-67 ◽  
Author(s):  
J. Potocnik ◽  
M. Nenadovic ◽  
B. Jokic ◽  
S. Strbac ◽  
Z. Rakocevic
Keyword(s):  
Thin Film ◽  
Glass Sample ◽  
Columnar Structure ◽  
Vapor Flux ◽  
Force Microscopy ◽  
Atomic Force ◽  
Glancing Angle ◽  
Electron Microscopy Analysis ◽  
Microscopy Analysis ◽  
Glad Technique

In this work, a columnar structure of nickel thin film has been obtained using an advanced deposition technique known as Glancing Angle Deposition. Nickel thin film was deposited on glass sample at the constant emission current of 100 mA. Glass sample was positioned 15 degrees with respect to the nickel vapor flux. The obtained nickel thin film was characterized by Force Modulation Atomic Force Microscopy and by Scanning Electron Microscopy. Analysis indicated that the formation of the columnar structure occurred at the film thickness of 1 ?m, which was achieved for the deposition time of 3 hours.

scholarly journals Properties of Zig-zag nickel nanostructures obtained by glad technique

2016 ◽  
Vol 48 (1) ◽  
pp. 51-56 ◽  
Author(s):  
Jelena Potocnik ◽  
Milos Nenadovic ◽  
Bojan Jokic ◽  
Maja Popovic ◽  
Zlatko Rakocevic
Keyword(s):  
Thin Film ◽  
Photoelectron Spectroscopy ◽  
Sessile Drop ◽  
Glancing Angle Deposition ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Glancing Angle ◽  
Glad Technique ◽  
Angle Deposition

Zig-zag structure of the nickel thin film has been obtained using Glancing Angle Deposition (GLAD) technique. Glass substrate was positioned 75 degrees with respect to the substrate normal. The obtained nickel thin film was characterized by X-ray Photoelectron Spectroscopy, Scanning Electron Microscopy and Atomic Force Microscopy. Surface energy of the deposited thin film was determined by measuring the contact angle using the static sessile drop method.

scholarly journals Structural, chemical and magnetic properties of nickel vertical posts obtained by glancing angle deposition technique

2017 ◽  
Vol 49 (1) ◽  
pp. 73-79
Author(s):  
Jelena Potocnik ◽  
Milos Nenadovic ◽  
Bojan Jokic ◽  
Maja Popovic ◽  
Zlatko Rakocevic
Keyword(s):  
Thin Film ◽  
Magnetic Properties ◽  
Photoelectron Spectroscopy ◽  
Glancing Angle Deposition ◽  
Deposition Technique ◽  
Force Microscopy ◽  
Atomic Force ◽  
Glancing Angle ◽  
Magneto Optical Kerr Effect ◽  
Angle Deposition

In this work, Glancing Angle Deposition technique was used for obtaining nanostructured nickel thin film with vertical posts on glass substrate which was positioned 75 degrees with respect to the substrate normal and rotated with a suitable constant speed. The obtained nickel thin film was characterized by Scanning Electron Microscopy, Atomic Force Microscopy and X-ray Photoelectron Spectroscopy. It was found that the deposited thin film consists of 94.0 at.% of nickel. Magnetic properties of the deposited thin film were determined by Magneto-Optical Kerr Effect Microscopy. According to the obtained coercivity values, it can be concluded that the nickel thin film shows uniaxial magnetic anisotropy.

The Dynamics of Mgo Surface Faceting

1997 ◽  
Vol 3 (S2) ◽  
pp. 741-742
Author(s):  
Svetlana V. Yanina ◽  
Matthew T. Johnson ◽  
C. Barry Carter
Keyword(s):  
Elevated Temperatures ◽  
Film Growth ◽  
Heat Treatments ◽  
Santa Barbara ◽  
Contact Mode ◽  
Force Microscopy ◽  
Minimal Sample ◽  
Atomic Force ◽  
Electron Microscopy Analysis ◽  
Microscopy Analysis

The {001} surface of magnesium oxide (MgO) has been the focus of numerous studies, which were prompted by the importance of MgO for its use as a substrate for thin film growth and also as a chemical catalyst. In the present work, atomic force microscopy (AFM) was used for studying the dynamics of surface processes of MgO which occur at elevated temperatures. AFM was chosen, in part, because it allows for imaging of topographical details at the atomic level with minimal sample preparation. Additionally, because the surface morphology of the same area was traced through a series of heat treatments, scanning electron microscopy analysis would be difficult because no conductive coating could be used (such a coating may have altered the surface between subsequent heat treatments).AFM images were recorded in contact mode, in air, on a Nanoscope III (Digital instruments, Santa Barbara, CA) using Si3N4 cantilevers (Ultralevers, Park Inst., Sunnyvale, CA) with a nominal applied force of 10-15 nN.

scholarly journals The Kinetoplast of Trypanosomatids: From Early Studies of Electron Microscopy to Recent Advances in Atomic Force Microscopy

Scanning ◽  
2018 ◽  
Vol 2018 ◽  
pp. 1-10 ◽  
Author(s):  
Danielle Pereira Cavalcanti ◽  
Wanderley de Souza
Keyword(s):  
Electron Microscopy ◽  
Atomic Force Microscopy ◽  
Nuclear Dna ◽  
Kinetoplast Dna ◽  
Thin Sections ◽  
Force Microscopy ◽  
Atomic Force ◽  
Electron Microscopy Analysis ◽  
Microscopy Analysis ◽  
Specialized Region

The kinetoplast is a specialized region of the mitochondria of trypanosomatids that harbors the most complex and unusual mitochondrial DNA found in nature. Kinetoplast DNA (kDNA) is composed of thousands of circular molecules topologically interlocked to form a single network. Two types of DNA circles are present in the kinetoplast: minicircles (0.5–10 kb) and maxicircles (20–40 kb). Knowledge of kinetoplast architecture is crucial to understanding the replication and segregation of kDNA circles because the molecules involved in these processes are precisely positioned in functional domains throughout the kinetoplast. The fine structure of the kinetoplast was revealed in early electron microscopy (EM) studies. However, an understanding of the topological organization of kDNA was only demonstrated after the development of protocols to separate kDNA from nuclear DNA, followed by EM observations. Electron microscopy analysis of thin sections of trypanosomatids, spreading of isolated kDNA networks onto EM grids, deep-etching studies, and cytochemical and immunocytochemical approaches are examples of techniques that were useful for elucidating the structure and replication of the kinetoplast. Recently, atomic force microscopy has joined this set of techniques and improved our knowledge about the kDNA network and revealed new details about kDNA topology in trypanosomatids.

Fabrication of Tantalum Oxide Nanorods by DC Magnetron Sputtering with Glancing Angle Deposition

2014 ◽  
Vol 979 ◽  
pp. 196-199
Author(s):  
T. Plirdpring ◽  
M. Horprathum ◽  
P. Eiamchai ◽  
S. Limwichean ◽  
C. Chananonnawathorn ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Tantalum Oxide ◽  
Columnar Structure ◽  
Glancing Angle Deposition ◽  
Dc Magnetron Sputtering ◽  
Atomic Force ◽  
Glass Slides ◽  
Glancing Angle ◽  
Glad Technique ◽  
Angle Deposition

This study investigates tantalum oxide (Ta2O5) nanorods prepared by the dc magnetron sputtering with the glancing angle deposition (GLAD) technique. Silicon (100) wafer and glass slides were used as the substrates. The effect of the glancing angle varying from 73-87°, on the structural and optical properties were investigated by field-emission scanning electron microscopy (FE-SEM), atomic force microscope (AFM) and spectrophotometry. The results show that the deposition rate and diameter of Ta2O5 nanorod films were decreased with the increase in the glancing angle. At the highest glancing angle of 87°, the prepared Ta2O5 nanorod yielded the highest porosity from the vertically aligned columnar structure, and were must suitable for many functional applications.

Enhanced Photodetection in Glancing Angle Deposited One-Dimensional In2O3 Nanorod Array

2021 ◽  
Vol 21 (5) ◽  
pp. 3115-3122
Author(s):  
Amitabha Nath ◽  
Rahul Raman ◽  
Laishram Robindro Singh ◽  
Mitra Barun Sarkar
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
High Resolution ◽  
Nanorod Array ◽  
Low Noise ◽  
Array Detector ◽  
Force Microscopy ◽  
Atomic Force ◽  
Transmission Electron ◽  
Glancing Angle

Glancing angle deposition (GLAD) oriented electron beam (e-beam) evaporation process has been employed to develop 1D In2O3 nanorod array over n-Si substrate. The morphology of as-deposited In2O3 thin film (∼70 nm) and GLAD 1D In2O3 nanorod array (∼400 nm) were explored using field emission scanning electron microscopy (FESEM), energy dispersive spectroscopy (EDS) and high resolution transmission electron microscopy (HRTEM) analysis. The structural analysis were perceived by high-resolution X-ray diffraction (HRXRD) and atomic force microscopy (AFM) techniques. The clampdown of ∼4.4 fold photoluminescence (PL) emission intensity was observed for In2O3 nanorod array. Metallization were done to measure the current (I)–voltage (V) characteristics for n-Si/In2O3 thin film and n-Si/In2O3 nanorod devices. The In2O3 nanorod device displayed ∼2.2 fold enhancement in current conduction at −4.6 V and an averagely ∼1.1 fold augmentation in photosensitivity were also observed. The photoresponsivity of ∼28 μA/W, maximum specific detectivity of ∼9.9×107 Jones and low NEP of ∼4.5×10−12 W/√Hz was achieved for the In2O3 nanorod-based photodetectors. The maximum ∼2.5 fold high detectivity and ∼2.4 fold low noise equivalent power (NEP) were perceived for the 1D In2O3 nanorod array detector as compared to the bare In2O3 thin film detector.

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