scholarly journals Properties of Zig-zag nickel nanostructures obtained by glad technique

2016 ◽  
Vol 48 (1) ◽  
pp. 51-56 ◽  
Author(s):  
Jelena Potocnik ◽  
Milos Nenadovic ◽  
Bojan Jokic ◽  
Maja Popovic ◽  
Zlatko Rakocevic
Keyword(s):  
Thin Film ◽  
Photoelectron Spectroscopy ◽  
Sessile Drop ◽  
Glancing Angle Deposition ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Glancing Angle ◽  
Glad Technique ◽  
Angle Deposition

Zig-zag structure of the nickel thin film has been obtained using Glancing Angle Deposition (GLAD) technique. Glass substrate was positioned 75 degrees with respect to the substrate normal. The obtained nickel thin film was characterized by X-ray Photoelectron Spectroscopy, Scanning Electron Microscopy and Atomic Force Microscopy. Surface energy of the deposited thin film was determined by measuring the contact angle using the static sessile drop method.

scholarly journals Structural, chemical and magnetic properties of nickel vertical posts obtained by glancing angle deposition technique

2017 ◽  
Vol 49 (1) ◽  
pp. 73-79
Author(s):  
Jelena Potocnik ◽  
Milos Nenadovic ◽  
Bojan Jokic ◽  
Maja Popovic ◽  
Zlatko Rakocevic
Keyword(s):  
Thin Film ◽  
Magnetic Properties ◽  
Photoelectron Spectroscopy ◽  
Glancing Angle Deposition ◽  
Deposition Technique ◽  
Force Microscopy ◽  
Atomic Force ◽  
Glancing Angle ◽  
Magneto Optical Kerr Effect ◽  
Angle Deposition

In this work, Glancing Angle Deposition technique was used for obtaining nanostructured nickel thin film with vertical posts on glass substrate which was positioned 75 degrees with respect to the substrate normal and rotated with a suitable constant speed. The obtained nickel thin film was characterized by Scanning Electron Microscopy, Atomic Force Microscopy and X-ray Photoelectron Spectroscopy. It was found that the deposited thin film consists of 94.0 at.% of nickel. Magnetic properties of the deposited thin film were determined by Magneto-Optical Kerr Effect Microscopy. According to the obtained coercivity values, it can be concluded that the nickel thin film shows uniaxial magnetic anisotropy.

Enhanced electrochromic properties of heat treated nanostructured tungsten trioxide thin films

2008 ◽  
Vol 23 (1) ◽  
pp. 274-280 ◽  
Author(s):  
Gisia Beydaghyan ◽  
Jean-Luc M. Renaud ◽  
Georges Bader ◽  
P.V. Ashrit
Keyword(s):  
Tungsten Trioxide ◽  
Thermal Evaporation ◽  
Infrared Region ◽  
Glancing Angle Deposition ◽  
Evaporation Chamber ◽  
Force Microscopy ◽  
Atomic Force ◽  
Heat Treated ◽  
Glancing Angle ◽  
Angle Deposition

Nanostructured tungsten trioxide films were fabricated with the technique of glancing angle deposition (GLAD) in a thermal evaporation chamber with a base pressure of 1.3 × 10−4 Pa. Films were deposited at vapor incidence angles of 0°, 20°, 40°, and 50° with film thickness varying between 160 and 200 nm, as determined by spectroscopic ellipsometry. After deposition, samples were heated for 1 h in air at 400 °C and were subsequently intercalated with small amounts (5 to 15 nm) of lithium by dry lithiation, a technique developed in our laboratory. Compared with our previous work on as-deposited nanostructured films, these samples showed significantly enhanced coloration in the infrared region. It was found that the films exhibited an absorption- based coloration in the lower wavelengths as well as an increased reflection in the infrared region. Morphological investigation by atomic force microscopy (AFM) showed grain agglomeration and increased surface roughness upon heating. Our studies further indicate that grain agglomeration significantly contributes to the superior coloration properties of the films.

scholarly journals Polystyrene as Graphene Film and 3D Graphene Sponge Precursor

Nanomaterials ◽  
2019 ◽  
Vol 9 (1) ◽  
pp. 101 ◽  
Author(s):  
Alejandra Rendón-Patiño ◽  
Jinan Niu ◽  
Antonio Doménech-Carbó ◽  
Hermenegildo García ◽  
Ana Primo
Keyword(s):  
Thin Film ◽  
Atomic Force Microscopy ◽  
Photoelectron Spectroscopy ◽  
Graphene Film ◽  
Visible Absorption ◽  
X Ray ◽  
3D Graphene ◽  
Force Microscopy ◽  
Atomic Force ◽  
Graphene Sponge

Polystyrene as a thin film on arbitrary substrates or pellets form defective graphene/graphitic films or powders that can be dispersed in water and organic solvents. The materials were characterized by visible absorption, Raman and X-ray photoelectron spectroscopy, electron and atomic force microscopy, and electrochemistry. Raman spectra of these materials showed the presence of the expected 2D, G, and D peaks at 2750, 1590, and 1350 cm−1, respectively. The relative intensity of the G versus the D peak was taken as a quantitative indicator of the density of defects in the G layer.

A Comparative Study of Structural and Optical Properties of ZnO Thin Film Prepared on Sapphire Substrate by PLD and Annealed

2011 ◽  
Vol 287-290 ◽  
pp. 2397-2400 ◽  
Author(s):  
Xian Qi Wei ◽  
Yong Jie Wang ◽  
Ming Yang Zhang ◽  
Zhong Zhang
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Sapphire Substrate ◽  
Photoelectron Spectroscopy ◽  
Blue Emission ◽  
Annealing Treatment ◽  
Shallow Donor ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

ZnO thin films are grown on sapphire substrate by employing a Nd:YAG (1064nm) laser ablation in 1.3 Pa oxygen ambient. X-ray diffraction (XRD) and atomic force microscopy (AFM) observation show that as-grown thin film possess (0002) textured feature and form columnar inclined grains with a small size. The as-grown films show a little oxygen vacancies and Zn interstitial by the analysis of X-ray photoelectron spectroscopy (XPS) and Raman. The annealing treatment in oxygen ambient causes obvious improvement on the structure, surface morphology, compositions and optical properties by the analysis of XRD, AFM, XPS, Raman and photoluminescence (PL) spectra. It can be concluded that the increase of UV emission is oriented to the improvement of structure and decrease of intrinsic defects. The blue emission (430 nm) is attributed to the electronic transition from shallow donor level of Zn interstitial to top level of valence band.

Fabrication of Tantalum Oxide Nanorods by DC Magnetron Sputtering with Glancing Angle Deposition

2014 ◽  
Vol 979 ◽  
pp. 196-199
Author(s):  
T. Plirdpring ◽  
M. Horprathum ◽  
P. Eiamchai ◽  
S. Limwichean ◽  
C. Chananonnawathorn ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Tantalum Oxide ◽  
Columnar Structure ◽  
Glancing Angle Deposition ◽  
Dc Magnetron Sputtering ◽  
Atomic Force ◽  
Glass Slides ◽  
Glancing Angle ◽  
Glad Technique ◽  
Angle Deposition

This study investigates tantalum oxide (Ta2O5) nanorods prepared by the dc magnetron sputtering with the glancing angle deposition (GLAD) technique. Silicon (100) wafer and glass slides were used as the substrates. The effect of the glancing angle varying from 73-87°, on the structural and optical properties were investigated by field-emission scanning electron microscopy (FE-SEM), atomic force microscope (AFM) and spectrophotometry. The results show that the deposition rate and diameter of Ta2O5 nanorod films were decreased with the increase in the glancing angle. At the highest glancing angle of 87°, the prepared Ta2O5 nanorod yielded the highest porosity from the vertically aligned columnar structure, and were must suitable for many functional applications.

An approach to durable poly(vinylidene fluoride) thin film loudspeaker

2003 ◽  
Vol 18 (12) ◽  
pp. 2904-2911 ◽  
Author(s):  
C.S. Lee ◽  
J.Y. Kim ◽  
D.E. Lee ◽  
J. Joo ◽  
S. Han ◽  
...  
Keyword(s):  
Thin Film ◽  
Indium Tin Oxide ◽  
Photoelectron Spectroscopy ◽  
Vinylidene Fluoride ◽  
X Ray ◽  
Force Microscopy ◽  
Low Surface Energy ◽  
Oxide Electrodes ◽  
Atomic Force ◽  
Poly Vinylidene Fluoride

The piezoelectric poly(vinylidene fluoride) (PVDF) surface possessing low surface energy was modified by the ion-assisted-reaction (IAR) method for the application of thin film speaker. The IAR-treated hydrophilic PVDF surface was investigated using atomic force microscopy and x-ray photoelectron spectroscopy. The adhesion strength between various types of electrodes and the film was dramatically improved due to the hydrophilic functional groups, such as –C–O–, –(C=O)–, –(C=O)–O–, and so forth. A durable loudspeaker film was fabricated by enhancing the adhesion between the screen-printed poly(3,4-ethylenedioxythiophene)/poly(4-styrenesulfonate) (PEDOT/PSS) and the modified PVDF films. The PVDF speaker film with the PEDOT/PSS electrode showed higher durability, flatter sound pressure level characteristics, and easier processability compared to metals or indium tin oxide electrodes.

Effect of Different Acid Treatment on Surface Characteristics of Titanium Alloy

2011 ◽  
Vol 694 ◽  
pp. 490-496 ◽  
Author(s):  
De Gui Zhang ◽  
Hai Mei Cheng ◽  
Ying Jun Wang ◽  
Cheng Yun Ning
Keyword(s):  
Titanium Alloy ◽  
Photoelectron Spectroscopy ◽  
Acid Treatment ◽  
Sessile Drop ◽  
Surface Characteristics ◽  
Acid Etching ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Titanium Alloy Ti6al4v

This study was aimed to investigate the effects of acid treatment on the surfacee characteristics ofgrit-blasted titanium alloy (Ti6Al4V). These treatments included (a) Al2O3 blasting, (b) Al2O3 blasting + HF acid etching, (c) Al2O3 blasting + HCl/H2SO4 acid etching, and (d) Al2O3 blasting + HF acid etching + HCl/H2SO4 acid etching. The surface topography and chemical composition of the samples were identified by field-emission scanning electron microscopy and X-ray photoelectron spectroscopy, respectively. Roughness of the as-treated samples was obtained from atomic force microscopy (AFM) and profilometry. Wettability of the samples was measured using sessile drop method. The results showed that porous structure on the surface of titanium alloy was prepared by dual acid etching treatment and the surfaces treated with acid had higher roughness and better wettability than the surface treated only by grit-blasting.

scholarly journals Structural characterization of the nickel thin film deposited by glad technique

2013 ◽  
Vol 45 (1) ◽  
pp. 61-67 ◽  
Author(s):  
J. Potocnik ◽  
M. Nenadovic ◽  
B. Jokic ◽  
S. Strbac ◽  
Z. Rakocevic
Keyword(s):  
Thin Film ◽  
Glass Sample ◽  
Columnar Structure ◽  
Vapor Flux ◽  
Force Microscopy ◽  
Atomic Force ◽  
Glancing Angle ◽  
Electron Microscopy Analysis ◽  
Microscopy Analysis ◽  
Glad Technique

In this work, a columnar structure of nickel thin film has been obtained using an advanced deposition technique known as Glancing Angle Deposition. Nickel thin film was deposited on glass sample at the constant emission current of 100 mA. Glass sample was positioned 15 degrees with respect to the nickel vapor flux. The obtained nickel thin film was characterized by Force Modulation Atomic Force Microscopy and by Scanning Electron Microscopy. Analysis indicated that the formation of the columnar structure occurred at the film thickness of 1 ?m, which was achieved for the deposition time of 3 hours.

scholarly journals Polystyrene as Graphene Film and 3D Graphene Sponge Precursor

2018 ◽  
Author(s):  
Alejandra Rendón-Patiño ◽  
Jinan Niu ◽  
Antonio Doménech-Carbó ◽  
Hermenegildo García ◽  
Ana Primo
Keyword(s):  
Thin Film ◽  
Photoelectron Spectroscopy ◽  
Graphene Film ◽  
Visible Absorption ◽  
X Ray ◽  
3D Graphene ◽  
Force Microscopy ◽  
Atomic Force ◽  
Graphene Films ◽  
Graphene Sponge

Polystyrene as a thin film on arbitrary substrates or pellets form defective graphene films or powders that can be dispersed in water and organic solvents. The materials were characterized by visible absorption, Raman and X-ray photoelectron spectroscopy, electron and atomic force microscopy and electrochemistry. Raman spectra of these materials show the presence of the expected 2D, G and D peaks at 2750, 1590 and 1350 cm-1, respectively. The relative intensity of the G vs. the D peak is taken as a quantitative indicator of the density of defects in the G layer.

Investigation of the Effect of Uv-Assisted Oxidation and Nitridation of Hafnium Metal Films

2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh
Keyword(s):  
Uv Radiation ◽  
Photoelectron Spectroscopy ◽  
Grazing Angle ◽  
X Ray Diffraction ◽  
Metal Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Silicon Interface

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.

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