Fabrication of Tantalum Oxide Nanorods by DC Magnetron Sputtering with Glancing Angle Deposition

2014 ◽  
Vol 979 ◽  
pp. 196-199
Author(s):  
T. Plirdpring ◽  
M. Horprathum ◽  
P. Eiamchai ◽  
S. Limwichean ◽  
C. Chananonnawathorn ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Tantalum Oxide ◽  
Columnar Structure ◽  
Glancing Angle Deposition ◽  
Dc Magnetron Sputtering ◽  
Atomic Force ◽  
Glass Slides ◽  
Glancing Angle ◽  
Glad Technique ◽  
Angle Deposition

This study investigates tantalum oxide (Ta2O5) nanorods prepared by the dc magnetron sputtering with the glancing angle deposition (GLAD) technique. Silicon (100) wafer and glass slides were used as the substrates. The effect of the glancing angle varying from 73-87°, on the structural and optical properties were investigated by field-emission scanning electron microscopy (FE-SEM), atomic force microscope (AFM) and spectrophotometry. The results show that the deposition rate and diameter of Ta2O5 nanorod films were decreased with the increase in the glancing angle. At the highest glancing angle of 87°, the prepared Ta2O5 nanorod yielded the highest porosity from the vertically aligned columnar structure, and were must suitable for many functional applications.

scholarly journals Properties of Zig-zag nickel nanostructures obtained by glad technique

2016 ◽  
Vol 48 (1) ◽  
pp. 51-56 ◽  
Author(s):  
Jelena Potocnik ◽  
Milos Nenadovic ◽  
Bojan Jokic ◽  
Maja Popovic ◽  
Zlatko Rakocevic
Keyword(s):  
Thin Film ◽  
Photoelectron Spectroscopy ◽  
Sessile Drop ◽  
Glancing Angle Deposition ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Glancing Angle ◽  
Glad Technique ◽  
Angle Deposition

Zig-zag structure of the nickel thin film has been obtained using Glancing Angle Deposition (GLAD) technique. Glass substrate was positioned 75 degrees with respect to the substrate normal. The obtained nickel thin film was characterized by X-ray Photoelectron Spectroscopy, Scanning Electron Microscopy and Atomic Force Microscopy. Surface energy of the deposited thin film was determined by measuring the contact angle using the static sessile drop method.

scholarly journals Structural, chemical and magnetic properties of nickel vertical posts obtained by glancing angle deposition technique

2017 ◽  
Vol 49 (1) ◽  
pp. 73-79
Author(s):  
Jelena Potocnik ◽  
Milos Nenadovic ◽  
Bojan Jokic ◽  
Maja Popovic ◽  
Zlatko Rakocevic
Keyword(s):  
Thin Film ◽  
Magnetic Properties ◽  
Photoelectron Spectroscopy ◽  
Glancing Angle Deposition ◽  
Deposition Technique ◽  
Force Microscopy ◽  
Atomic Force ◽  
Glancing Angle ◽  
Magneto Optical Kerr Effect ◽  
Angle Deposition

In this work, Glancing Angle Deposition technique was used for obtaining nanostructured nickel thin film with vertical posts on glass substrate which was positioned 75 degrees with respect to the substrate normal and rotated with a suitable constant speed. The obtained nickel thin film was characterized by Scanning Electron Microscopy, Atomic Force Microscopy and X-ray Photoelectron Spectroscopy. It was found that the deposited thin film consists of 94.0 at.% of nickel. Magnetic properties of the deposited thin film were determined by Magneto-Optical Kerr Effect Microscopy. According to the obtained coercivity values, it can be concluded that the nickel thin film shows uniaxial magnetic anisotropy.

Enhanced electrochromic properties of heat treated nanostructured tungsten trioxide thin films

2008 ◽  
Vol 23 (1) ◽  
pp. 274-280 ◽  
Author(s):  
Gisia Beydaghyan ◽  
Jean-Luc M. Renaud ◽  
Georges Bader ◽  
P.V. Ashrit
Keyword(s):  
Tungsten Trioxide ◽  
Thermal Evaporation ◽  
Infrared Region ◽  
Glancing Angle Deposition ◽  
Evaporation Chamber ◽  
Force Microscopy ◽  
Atomic Force ◽  
Heat Treated ◽  
Glancing Angle ◽  
Angle Deposition

Nanostructured tungsten trioxide films were fabricated with the technique of glancing angle deposition (GLAD) in a thermal evaporation chamber with a base pressure of 1.3 × 10−4 Pa. Films were deposited at vapor incidence angles of 0°, 20°, 40°, and 50° with film thickness varying between 160 and 200 nm, as determined by spectroscopic ellipsometry. After deposition, samples were heated for 1 h in air at 400 °C and were subsequently intercalated with small amounts (5 to 15 nm) of lithium by dry lithiation, a technique developed in our laboratory. Compared with our previous work on as-deposited nanostructured films, these samples showed significantly enhanced coloration in the infrared region. It was found that the films exhibited an absorption- based coloration in the lower wavelengths as well as an increased reflection in the infrared region. Morphological investigation by atomic force microscopy (AFM) showed grain agglomeration and increased surface roughness upon heating. Our studies further indicate that grain agglomeration significantly contributes to the superior coloration properties of the films.

Hydrophobic Metallic Nanorods coated with Teflon Nanopatches by Glancing Angle Deposition

2009 ◽  
Vol 1188 ◽  
Author(s):  
Wisam J Khudhayer ◽  
Rajesh Sharma ◽  
Tansel Karabacak
Keyword(s):  
Contact Angle ◽  
Normal Incidence ◽  
Glancing Angle Deposition ◽  
Nanorod Arrays ◽  
Hydrophobic Property ◽  
Glancing Angle ◽  
Shadowing Effect ◽  
Glad Technique ◽  
Metallic Nanorods ◽  
Angle Deposition

AbstractIntroducing a hydrophobic property to vertically aligned hydrophilic metallic nanorods was investigated experimentally and theoretically. First, platinum nanorod arrays were deposited on flat silicon substrates using a sputter Glancing Angle Deposition Technique (GLAD). Then a thin layer of Teflon (nanopatches) was partially deposited on the tips of platinum nanorod at a glancing angle of  = 85° as well as at normal incidence ( = 0°) for different deposition times. We show that GLAD technique is capable of depositing ultrathin isolated Teflon nanopatches on selective regions of nanorod arrays due to the shadowing effect during GLAD. Contact angle measurements on Pt/Teflon nano-composite have shown contact angle values as high as 138°, indicating a significant increase in the hydrophobicity of originally hydrophilic Pt nanostructures. Finally, a 2D simplified wetting model utilizing Cassie and Baxter theory of heterogeneous surfaces has been developed to explain the wetting behavior of Pt/Teflon nanocomposite.

scholarly journals Synthesis of Nanowire Using Glancing Angle Deposition and Their Applications

2020 ◽  
Author(s):  
Chinnamuthu Paulsamy ◽  
Pheiroijam Pooja ◽  
Heigrujam Manas Singh
Keyword(s):  
Nanowire Array ◽  
Optoelectronic Devices ◽  
Glancing Angle Deposition ◽  
Optical And Electrical Properties ◽  
Large Aspect Ratio ◽  
Glancing Angle ◽  
1D Nanostructure ◽  
Glad Technique ◽  
Angle Deposition ◽  
Nanowires Array

Nanowires are highly attractive for advanced nanoelectronics and nanoscience applications, due to its novel properties such as increased surface area, large aspect ratio, and increased surface scattering of electrons and phonons. The design and fabrication of nanowires array provide a great platform to overcome the challenges/limitation of its counter partner. This chapter focuses on the synthesis of metal oxide nanowire and axial heterostructure nanowire array using the Glancing angle deposition (GLAD) technique. The structural, optical and electrical properties are studied. This GLAD technique offers control over one-dimensional (1D) nanostructure growth with self-alignment capability. It is also reviewed in an effort to cover the various application in this area of optoelectronic devices and wettability applications that had been synthesized using GLAD.

Characterization of Glancing Angle Deposition Thin Film Optical Filters with Engineered Index Profiles

2006 ◽  
Vol 928 ◽  
Author(s):  
James Gospodyn ◽  
Michael T. Taschuk ◽  
Peter C. P. Hrudey ◽  
Ying Y. Tsui ◽  
Robert Fedosejevs ◽  
...  
Keyword(s):  
Optical Filters ◽  
Absolute Intensity ◽  
Glancing Angle Deposition ◽  
Fused Silica ◽  
Emission Profile ◽  
Intensity Measurements ◽  
Glancing Angle ◽  
Glad Technique ◽  
Conversion Efficiencies ◽  
Angle Deposition

ABSTRACTPeriodic high-/low-index film stacks of Y2O3:Eu were grown with varying periodicities us-ing the glancing angle deposition (GLAD) technique onto silicon and fused silica substrates. Post-deposition annealing at temperatures from 600 to 1000°C for 1 hour in atmosphere was per-formed to enhance the photoluminescent output of the films. The films were optically character-ized using transmission measurements and Mueller matrix ellipsometry. The luminescence was measured using a spectrometer calibrated for absolute intensity measurements using a frequency-quadrupled Nd:YAG pulsed laser as an excitation source. Absolute conversion efficiencies were measured for the films by characterizing the angular emission profile. The angular emission pro-file of the films was found to follow a non-Lambertian emission profile, with peak emission in-tensities at 50° to 60° with respect to the substrate normal.

Fabrication of Perforated Film Nanostructures

2002 ◽  
Vol 739 ◽  
Author(s):  
A. L. Elias ◽  
K. D. Harris ◽  
M. J. Brett
Keyword(s):  
Thin Films ◽  
Glancing Angle Deposition ◽  
Thin Coatings ◽  
Glancing Angle ◽  
Perforated Film ◽  
Glad Technique ◽  
Angle Deposition

ABSTRACTWe have demonstrated the fabrication of perforated thin films (PTFs), comprised of thin coatings perforated with unusual pore shapes such as helices or chevrons. PTFs are fabricated using a template of nanohelices or nanochevrons produced using the Glancing Angle Deposition (GLAD) technique. PTFs can be produced by filling GLAD films with a variety of substances, etching back the coating to reveal the tips of the helices or chevrons, and etching out the template film. A process for fabricating nickel PTFs has been developed, and a nickel PTF of helical pores with nominal diameters of 100nm has been produced.

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