scholarly journals Surface Evaluation of Cationic UV-curable Resin with Fluorine Additive by X-ray Photoelectron Spectroscopy

2013 ◽  
Vol 26 (1) ◽  
pp. 129-132
Author(s):  
Takahiro Oyama ◽  
Makoto Okada ◽  
Shuso Iyoshi ◽  
Yuichi Haruyama ◽  
Hiroto Miyake ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Uv Curable ◽  
X Ray ◽  
Uv Curable Resin

scholarly journals A Novel Synthetic UV-Curable Fluorinated Siloxane Resin for Low Surface Energy Coating

Polymers ◽  
2018 ◽  
Vol 10 (9) ◽  
pp. 979 ◽  
Author(s):  
Chunfang Zhu ◽  
Haitao Yang ◽  
Hongbo Liang ◽  
Zhengyue Wang ◽  
Jun Dong ◽  
...  
Keyword(s):  
Surface Energy ◽  
Photoelectron Spectroscopy ◽  
Contact Angles ◽  
Proton Nuclear Magnetic Resonance ◽  
Energy Materials ◽  
Uv Curable ◽  
X Ray ◽  
Low Surface Energy ◽  
Low Concentrations ◽  
Siloxane Polymers

Low surface energy materials have attracted much attention due to their properties and various applications. In this work, we synthesized and characterized a series of ultraviolet (UV)-curable fluorinated siloxane polymers with various fluorinated acrylates—hexafluorobutyl acrylate, dodecafluoroheptyl acrylate, and trifluorooctyl methacrylate—grafted onto a hydrogen-containing poly(dimethylsiloxane) backbone. The structures of the fluorinated siloxane polymers were measured and confirmed by proton nuclear magnetic resonance and Fourier transform infrared spectroscopy. Then the polymers were used as surface modifiers of UV-curable commercial polyurethane (DR-U356) at different concentrations (1, 2, 3, 4, 5, and 10 wt %). Among three formulations of these fluorinated siloxane polymers modified with DR-U356, hydrophobic states (91°, 92°, and 98°) were obtained at low concentrations (1 wt %). The DR-U356 resin is only in the hydrophilic state at 59.41°. The fluorine and siloxane element contents were investigated by X-ray photoelectron spectroscopy and the results indicated that the fluorinated and siloxane elements were liable to migrate to the surface of resins. The results of the friction recovering assays showed that the recorded contact angles of the series of fluorinated siloxane resins were higher than the original values after the friction-annealing progressing.

Two dimensional Sr silicate grown on Si(001) studied using X-ray Photoelectron Spectroscopy

2006 ◽  
Vol 132 ◽  
pp. 87-90
Author(s):  
M. El Kazzi ◽  
G. Delhaye ◽  
S. Gaillard ◽  
E. Bergignat ◽  
G. Hollinger
Keyword(s):  
Photoelectron Spectroscopy ◽  
Two Dimensional ◽  
X Ray

BONDS IN AMORPHOUS Nb1-xSixSTUDIED BY X-RAY EMISSION AND X-RAY PHOTOELECTRON SPECTROSCOPY

1987 ◽  
Vol 48 (C9) ◽  
pp. C9-1025-C9-1028 ◽  
Author(s):  
W. ZAHOROWSKI ◽  
A. SIMUNEK ◽  
G. WIECH ◽  
K. SÖLDNER ◽  
R. KNAUF ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
X Ray

Investigation of the Effect of Uv-Assisted Oxidation and Nitridation of Hafnium Metal Films

2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh
Keyword(s):  
Uv Radiation ◽  
Photoelectron Spectroscopy ◽  
Grazing Angle ◽  
X Ray Diffraction ◽  
Metal Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Silicon Interface

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.

Interactions of Ge Atoms with High- ê Oxide Dielectric Surfaces

2005 ◽  
Vol 879 ◽  
Author(s):  
Scott K. Stanley ◽  
John G. Ekerdt
Keyword(s):  
Oxide Layer ◽  
Photoelectron Spectroscopy ◽  
Chemical Vapor ◽  
Temperature Programmed Desorption ◽  
Tungsten Filament ◽  
X Ray ◽  
Dielectric Surfaces ◽  
Temperature Programmed ◽  
The Stability ◽  
Ge Nanocrystals

AbstractGe is deposited on HfO2 surfaces by chemical vapor deposition (CVD) with GeH4. 0.7-1.0 ML GeHx (x = 0-3) is deposited by thermally cracking GeH4 on a hot tungsten filament. Ge oxidation and bonding are studied at 300-1000 K with X-ray photoelectron spectroscopy (XPS). Ge, GeH, GeO, and GeO2 desorption are measured with temperature programmed desorption (TPD) at 400-1000 K. Ge initially reacts with the dielectric forming an oxide layer followed by Ge deposition and formation of nanocrystals in CVD at 870 K. 0.7-1.0 ML GeHx deposited by cracking rapidly forms a contacting oxide layer on HfO2 that is stable from 300-800 K. Ge is fully removed from the HfO2 surface after annealing to 1000 K. These results help explain the stability of Ge nanocrystals in contact with HfO2.

CO2 Reduction to Propanol by Copper Foams: A Pre- and Post-Catalysis Study

2020 ◽  
Author(s):  
Jennifer A. Rudd ◽  
Ewa Kazimierska ◽  
Louise B. Hamdy ◽  
Odin Bain ◽  
Sunyhik Ahn ◽  
...  
Keyword(s):  
Carbon Dioxide ◽  
Photoelectron Spectroscopy ◽  
Carbon Capture ◽  
Surface Composition ◽  
Co2 Reduction ◽  
Structural Rearrangement ◽  
Copper Electrode ◽  
Ex Situ ◽  
X Ray ◽  
Copper Electrodes

The utilization of carbon dioxide is a major incentive for the growing field of carbon capture. Carbon dioxide could be an abundant building block to generate higher value products. Herein, we describe the use of porous copper electrodes to catalyze the reduction of carbon dioxide into higher value products such as ethylene, ethanol and, notably, propanol. For <i>n</i>-propanol production, faradaic efficiencies reach 4.93% at -0.83 V <i>vs</i> RHE, with a geometric partial current density of -1.85 mA/cm<sup>2</sup>. We have documented the performance of the catalyst in both pristine and urea-modified foams pre- and post-electrolysis. Before electrolysis, the copper electrode consisted of a mixture of cuboctahedra and dendrites. After 35-minute electrolysis, the cuboctahedra and dendrites have undergone structural rearrangement. Changes in the interaction of urea with the catalyst surface have also been observed. These transformations were characterized <i>ex-situ</i> using scanning electron microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy. We found that alterations in the morphology, crystallinity, and surface composition of the catalyst led to the deactivation of the copper foams.

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