scholarly journals Photoluminescence and structural defects of ZnO films deposited by reactive magnetron sputtering with unconventional Ar-O2 gas mixture formation

Author(s):  
Kristina Bockute ◽  

ZnO is a well-known traditional industrial material which has high potential to become one of the key components for the next generation of future electronics, LED emitters, visible light photocatalysis and others. In its pristine form ZnO has relatively wide band gap of approximately 3.4 eV, but a lot of emerging applications requires some level of electronic structure engineering and structure optimisation. Studies show that ZnO properties strongly depend on the intrinsic defects type and concentrations. Both characteristics usually are depending on the synthesis method. Accordingly, there is great interest to develop new methods which would allow to obtain ZnO with optimised band gap and other properties. In current, study ZnO films were deposited using reactive magnetron sputtering with unconventional Ar-O2 gas mixture supply control: Ar flow was controlled to maintain total gas pressure at 1x10-2 mbar, whereas O2 flow rate was actively adjusted to maintain the selected intensity of optical zinc emission from the working cathode zone. Applying such ZnO formation method it was possible to stabilise reactive magnetron sputtering process over wide range of conditions. Elemental composition analysis by XPS revealed that despite large variations in Zn emission peak intensity within tested experimental conditions all films had nearly identical Zn:O ratios but at the same time their structural and optical properties differed significantly. The colour of the films varied from highly transparent yellowish-greenish, to intense orange, to opaque black. XRD analysis showed that films consisted of single polycrystalline wurtzite phase with varying orientations. PL spectroscopy analysis revealed that films had a lot of various defects including oxygen and zinc vacancies, interstitials and surface defects. Wide variation of ZnO properties obtained by different reactive sputtering conditions demonstrates the potential of the proposed method to control the formation of various intrinsic defects and to tailor their concentration.

2018 ◽  
Vol 33 (2) ◽  
pp. 025004
Author(s):  
A Davydova ◽  
G Tselikov ◽  
D Dilone ◽  
K V Rao ◽  
A V Kabashin ◽  
...  

Doklady BGUIR ◽  
2020 ◽  
Vol 18 (6) ◽  
pp. 94-102
Author(s):  
T. D. Nguen ◽  
A. I. Zanko ◽  
D. A. Golosov ◽  
S. M. Zavadski ◽  
S. N. Melnikov ◽  
...  

The aim of this work was to study the effect of the gas composition during sputtering on the electrophysical properties of vanadium oxide films deposited by pulsed reactive magnetron sputtering of a vanadium target in an Ar/O2 medium of working gases.The dependences of the magnetron discharge voltage, deposition rate, resistivity, temperature coefficient of resistance (TCR), and the band gap of vanadium oxide films on the oxygen concentration in the gas mixture are obtained. It was found that amorphous films of vanadium oxide are formed during reactive magnetron sputtering. It is shown that the properties of the deposited vanadium oxide films have a strong dependence on the oxygen concentration in the Ar/O2 gas mixture, which is associated with the formation of a mixture of various intermediate vanadium oxides in the film. It was found that from the point of view of using vanadium oxide films as thermosensitive layers of microbolometers, the films must be deposited at oxygen concentrations in the gas mixture of 17 to 25 %. At the given oxygen concentrations without heating the substrates, vanadium oxide films with a resistivity (0.6–4.0)·10-2 Ohm·m, TCR 2.2–2.3%/°C and a band gap for direct transitions of 3.7–3.78 eV. The obtained characteristics make it possible to use these films as thermosensitive layers of microbolometers.


2006 ◽  
Vol 957 ◽  
Author(s):  
Yoshitaka Nakano ◽  
Takeshi Morikawa ◽  
Takeshi Ohwaki

ABSTRACTWe report on visible-light sensitivity in N-doped ZnO (ZnO:N) films that were deposited on ITO/quartz substrates by reactive magnetron sputtering. Colored ZnO:N samples showed enhanced polycrystallization and a significant decrease in optical band gap from 3.1 to 2.3 eV with increasing N doping concentration, as determined by x-ray diffraction and optical absorption measurements. Deep-level optical spectroscopy measurements revealed three characteristic deep levels located at ∼0.98, ∼1.20, and ∼2.21 eV below the conduction band. In particular, the pronounced 2.21 eV band is newly introduced by the N doping and behaves as part of the valence band, resulting in the band-gap narrowing of ZnO. Therefore, this deep level is probably one origin of visible-light sensitivity in ZnO:N.


2013 ◽  
Vol 103 (26) ◽  
pp. 263901 ◽  
Author(s):  
Dong Uk Lee ◽  
Seon Pil Kim ◽  
Kyoung Su Lee ◽  
Sang Woo Pak ◽  
Eun Kyu Kim

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