Deposition of planar waveguide structures with a fluorosilicate shell on silicon and quartz substrates in a local microwave discharge of reduced pressure.

An efficient method of gas-phase multilayer heterogeneous deposition of quartz and fluorosilicate glass in a non-isothermal plasma of a resonant local low pressure microwave discharge on quartz glass substrates and silicon wafers for the optical structures formation of waveguides and other waveguide elements based on them, is presented. It is shown that the nonisothermal plasma of a resonant local low pressure microwave discharge is an effective tool for the films formation on silicon and quartz substrates, both pure silicon dioxide and doped with fluorine. The cracks presence in films doped with fluorine is not observed even at their considerable thicknesses (20…60 µm). Deposition high rates and efficiency of silica glass doped with fluorine have been achieved (up to 7 wt.% of glass doping with fluorine at a film deposition rate of more than 3 μm/min). Planar and strip multimode and single-mode optical waveguides have been created. They are the basic structures of various fiber-optic components of local information transmission systems.