Recent Developments in TEM Applications for the IC Industry
Keyword(s):
Abstract Recent developments in aberration-corrected transmission electron microscopy have drawn much attention from the semiconductor characterization community. Two new developments in transmission electron microscopy, image aberration correctors and probe aberration correctors, are discussed in term of their applications in characterizing gate oxide dielectrics for the IC industry.
2013 ◽
Vol 750-752
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pp. 2267-2270
2002 ◽
Vol 191
(2)
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pp. 467-481
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2015 ◽
Vol 618
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pp. 545-550
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