scholarly journals Simulation and Fabrication of HfO2 Thin Films Passivating Si from a Numerical Computer and Remote Plasma ALD

2017 ◽  
Vol 7 (12) ◽  
pp. 1244 ◽  
Author(s):  
Xiao-Ying Zhang ◽  
Chia-Hsun Hsu ◽  
Yun-Shao Cho ◽  
Shui-Yang Lien ◽  
Wen-Zhang Zhu ◽  
...  
Keyword(s):  
Thin Films ◽  
Remote Plasma ◽  
Numerical Computer

Atomic structure in SiO2 thin films deposited by remote plasma‐enhanced chemical vapor deposition

1989 ◽  
Vol 7 (3) ◽  
pp. 1136-1144 ◽  
Author(s):  
G. Lucovsky ◽  
J. T. Fitch ◽  
D. V. Tsu ◽  
S. S. Kim
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Atomic Structure ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Remote Plasma

Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH3 plasma pretreatment

2019 ◽  
Vol 40 (1) ◽  
pp. 012806 ◽  
Author(s):  
Hui Hao ◽  
Xiao Chen ◽  
Zhengcheng Li ◽  
Yang Shen ◽  
Hu Wang ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Gallium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Plasma Pretreatment

The effect of low frequency pulse-shaped substrate bias on the remote plasma deposition of a-Si : H thin films

2009 ◽  
Vol 19 (1) ◽  
pp. 015012 ◽  
Author(s):  
I T Martin ◽  
M A Wank ◽  
M A Blauw ◽  
R A C M M van Swaaij ◽  
W M M Kessels ◽  
...  
Keyword(s):  
Thin Films ◽  
Plasma Deposition ◽  
Low Frequency ◽  
Substrate Bias ◽  
Remote Plasma ◽  
Frequency Pulse
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