Improvement of Growth Interface Stability for 4-Inch Silicon Carbide Crystal Growth in TSSG
Keyword(s):
The growth interface instability of large-size SiC growth in top-seeded solution growth (TSSG) is a bottleneck for industrial production. The authors have previously simulated the growth of 4-inch SiC crystals and found that the interface instability in TSSG was greatly affected by the flow field. According to our simulation of the flow field, we proposed a new stepped structure that greatly improved the interface stability of large-size crystal growth. This stepped structure provides a good reference for the growth of large-sized SiC crystals by TSSG in the future.
2020 ◽
Vol 532
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pp. 125437
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2014 ◽
Vol 778-780
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pp. 79-82
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2019 ◽
Vol 527
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pp. 125248
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Keyword(s):
1999 ◽
Vol 34
(2)
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pp. 261-265
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2011 ◽
Vol 50
(9S2)
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pp. 09NE07
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2013 ◽
Vol 740-742
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pp. 311-314
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