Ultralow Voltage FinFET- Versus TFET-Based STT-MRAM Cells for IoT Applications

Spin-transfer torque magnetic tunnel junction (STT-MTJ) based on double-barrier magnetic tunnel junction (DMTJ) has shown promising characteristics to define low-power non-volatile memories. This, along with the combination of tunnel FET (TFET) technology, could enable the design of ultralow-power/ultralow-energy STT magnetic RAMs (STT-MRAMs) for future Internet of Things (IoT) applications. This paper presents the comparison between FinFET- and TFET-based STT-MRAM bitcells operating at ultralow voltages. Our study is performed at the bitcell level by considering a DMTJ with two reference layers and exploiting either FinFET or TFET devices as cell selectors. Although ultralow-voltage operation occurs at the expense of reduced reading voltage sensing margins, simulations results show that TFET-based solutions are more resilient to process variations and can operate at ultralow voltages (<0.5 V), while showing energy savings of 50% and faster write switching of 60%.