scholarly journals Pathways to Tailor Photocatalytic Performance of TiO2 Thin Films Deposited by Reactive Magnetron Sputtering

Materials ◽  
2019 ◽  
Vol 12 (17) ◽  
pp. 2840 ◽  
Author(s):  
Alexander Vahl ◽  
Salih Veziroglu ◽  
Bodo Henkel ◽  
Thomas Strunskus ◽  
Oleksandr Polonskyi ◽  
...  

TiO2 thin films are used extensively for a broad range of applications including environmental remediation, self-cleaning technologies (windows, building exteriors, and textiles), water splitting, antibacterial, and biomedical surfaces. While a broad range of methods such as wet-chemical synthesis techniques, chemical vapor deposition (CVD), and physical vapor deposition (PVD) have been developed for preparation of TiO2 thin films, PVD techniques allow a good control of the homogeneity and thickness as well as provide a good film adhesion. On the other hand, the choice of the PVD technique enormously influences the photocatalytic performance of the TiO2 layer to be deposited. Three important parameters play an important role on the photocatalytic performance of TiO2 thin films: first, the different pathways in crystallization (nucleation and growth); second, anatase/rutile formation; and third, surface area at the interface to the reactants. This study aims to provide a review regarding some strategies developed by our research group in recent years to improve the photocatalytic performance of TiO2 thin films. An innovative approach, which uses thermally induced nanocrack networks as an effective tool to enhance the photocatalytic performance of sputter deposited TiO2 thin films, is presented. Plasmonic and non-plasmonic enhancement of photocatalytic performance by decorating TiO2 thin films with metallic nanostructures are also briefly discussed by case studies. In addition to remediation applications, a new approach, which utilizes highly active photocatalytic TiO2 thin film for micro- and nanostructuring, is also presented.

2006 ◽  
Vol 500 (1-2) ◽  
pp. 19-26 ◽  
Author(s):  
F. Gracia ◽  
F. Yubero ◽  
J.P. Holgado ◽  
J.P. Espinos ◽  
A.R. Gonzalez-Elipe ◽  
...  

1998 ◽  
Vol 526 ◽  
Author(s):  
Ashok Kumar ◽  
R. Alexandrescu ◽  
Michael A. George

AbstractLaser assisted methods such as laser physical vapor deposition (LPVD) and laser induced chemical vapor deposition (LCVD) have been utilized to grow carbon nitride (CNx) films on various substrates. It has been shown that the both techniques produce good quality thin films of CNx. In LPVD, a laser beam (λ= 248 nm) has been used to ablate the pyrolytic graphite target in nitrogen atmosphere, where as CO2 laser was to irradiate carbon-nitrogen containing mixtures such as C2H2/N2O/NH3 in LCVD method. A comparative analysis will be presented in terms of structural properties of CNx films prepared by both techniques.


2014 ◽  
Vol 32 (6) ◽  
pp. 061502 ◽  
Author(s):  
Wenjiao B. Wang ◽  
Angel Yanguas-Gil ◽  
Yu Yang ◽  
Do-Young Kim ◽  
Gregory S. Girolami ◽  
...  

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