scholarly journals A Novel Measurement Method of Mechanical Properties for Individual Layers in Multilayered Thin Films

Micromachines ◽  
2019 ◽  
Vol 10 (10) ◽  
pp. 669
Author(s):  
Zhou ◽  
Meng ◽  
Sun ◽  
Huang

Various multilayered thin films are extensively used as the basic component of some micro-electro-mechanical systems, requiring an efficient measurement method for material parameters, such as Young’s modulus, residual stress, etc. This paper developed a novel measurement method to extract the Young’s moduli and residual stresses for individual layers in multilayered thin films, based on the first resonance frequency measurements of both cantilever beams and doubly-clamped beams. The fabrication process of the test structure, the corresponding modeling and the material parameter extraction process are introduced. To verify this method, the test structures with gold/polysilicon bilayer beams are fabricated and tested. The obtained Young’s moduli of polysilicon films are from 151.38 GPa to 154.93GPa, and the obtained Young’s moduli of gold films are from 70.72 GPa to 75.34GPa. The obtained residual stresses of polysilicon films are from −14.86 MPa to −13.11 MPa (compressive stress), and the obtained residual stresses of gold films are from 16.27 to 23.95 MPa (tensile stress). The extracted parameters are within the reasonable ranges, compared with the available results or the results obtained by other test methods.

1997 ◽  
Vol 505 ◽  
Author(s):  
Xin Zhang ◽  
Tong-Yi Zhang ◽  
Yitshak Zohar

ABSTRACTFEM simulation of micro-rotating-structures was performed for local measurement of residual stresses in thin films. A sensitivity factor is introduced, studied and tabulated from the simulation results. The residual stress can be evaluated from the rotating deflection, the lengths of rotating and fixed beams, and the sensitivity factor. The micro-structure technique was applied to measure residual stresses in both silicon nitride and polysilicon thin films, before and after rapid thermal annealing (RTA), and further confirmed by wafer curvature method. Residual stresses in polysilicon films at different RTA stages were also characterized by micro-Raman spectroscopy (MRS). The experimental results indicate that micro-rotating-structures indeed have the ability to measure spatially and locally residual stresses in MEMS thin films with appropriate sensitivities.


1998 ◽  
Vol 546 ◽  
Author(s):  
Xin Zhang ◽  
Tong-Yi Zhang ◽  
Yitshak Zohar

AbstractThe residual stress in doped and undoped polysilicon films, before and after rapid thermal annealing (RTA), is investigated using both wafer-curvature and micro-rotating structures techniques. Microstructure characterization has been conducted as well to understand the mechanism of the stress evolution. The results show that the compressive residual stresses in undoped polysilicon films can be reduced or eliminated within a few seconds RTA. Surface nitridation and grain growth are identified as the mechanisms responsible for the stress evolution.


2005 ◽  
Vol 123 ◽  
pp. 137-142 ◽  
Author(s):  
J. Takadoum ◽  
J. Lintymer ◽  
J. Gavoille ◽  
N. Martin

1996 ◽  
Vol 457 ◽  
Author(s):  
R. Banerjee ◽  
X. D. Zhang ◽  
S. A. Dregia ◽  
H. L. Fraser

ABSTRACTNanocomposite Ti/Al multilayered thin films have been deposited by magnetron sputtering. These multilayers exhibit interesting structural transitions on reducing the layer thickness of both Ti and Al. Ti transforms from its bulk stable hep structure to fee and Al transforms from fee to hep. The effect of ratio of Ti layer thickness to Al layer thickness on the structural transitions has been investigated for a constant bilayer periodicity of 10 nm by considering three different multilayers: 7.5 nm Ti / 2.5 nm Al, 5 nm Ti / 5 nm Al and 2.5 nm Ti / 7.5 nm Al. The experimental results have been qualitatively explained on the basis of a thermodynamic model. Preliminary experimental results of interfacial reactions in Ti/Al bilayers resulting in the formation of Ti-aluminides are also presented in the paper.


1989 ◽  
Vol 40 (12) ◽  
pp. 8256-8269 ◽  
Author(s):  
M. B. Stearns ◽  
C. H. Lee ◽  
T. L. Groy

1992 ◽  
Vol 117 (1-2) ◽  
pp. 294-300 ◽  
Author(s):  
Eiji Kita ◽  
Makoto Ochi ◽  
Tomoki Erata ◽  
Akira Tasaki

1994 ◽  
Vol 75 (10) ◽  
pp. 5807-5807 ◽  
Author(s):  
D. Weller ◽  
M. G. Samant ◽  
J. Stöhr ◽  
Y. Wu ◽  
B. D. Hermsmeier ◽  
...  

Metals ◽  
2018 ◽  
Vol 8 (7) ◽  
pp. 514 ◽  
Author(s):  
Yung-I Chen ◽  
Zhi-Ting Zheng ◽  
Jia-Wei Jhang

2009 ◽  
pp. 9426 ◽  
Author(s):  
Oxana V. Vassiltsova ◽  
Subhendu K. Panda ◽  
Zhouying Zhao ◽  
Michael A. Carpenter ◽  
Marina A. Petrukhina

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