Channel-length dependence of the generation of interface states and oxide-trapped charges on drain avalanche hot carrier degradation of HfSiON/SiO2 p-channel MOSFETs with strained Si/SiGe channel
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2019 ◽
Vol 100-101
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pp. 113424
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1995 ◽
Vol 38
(1)
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pp. 183-187
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