Channel-length dependence of mechanical stress effect by hybrid shallow trench isolation on NBTI degradation of HfSiON/SiO2 p-channel MOSFETs with strained Si/SiGe channel
2019 ◽
Vol 100-101
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pp. 113424
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Keyword(s):
1998 ◽
2012 ◽
Vol 52
(9-10)
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pp. 1949-1952
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Keyword(s):
2011 ◽
Vol 50
(4S)
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pp. 04DC21
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2011 ◽
Vol 88
(6)
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pp. 882-887
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2008 ◽
Vol 55
(6)
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pp. 1558-1562
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