Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
2008 ◽
Vol 52
(4)
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pp. 1103-1108
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2019 ◽
Vol 40
(1)
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pp. 012806
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2011 ◽
Vol 158
(4)
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2005 ◽
Vol 80
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pp. 158-161
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2006 ◽
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pp. G200
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2021 ◽
Vol 39
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pp. 042404
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