Two-Dimensional Numerical Study on Characterization of Low-Pressure Capacitively Coupled Argon Discharges

2014 ◽  
Vol 556-562 ◽  
pp. 1691-1695
Author(s):  
Ya Chun Zhang ◽  
Xiang He ◽  
Jian Pin Chen ◽  
Xiao Wu Ni ◽  
Jian Lu ◽  
...  
Keyword(s):  
Numerical Study ◽  
Fluid Model ◽  
Low Pressure ◽  
Two Dimensional ◽  
Capacitively Coupled ◽  
Positive Ions ◽  
Cell Reactor ◽  
Reactor Type ◽  
Gaseous Electronics Conference

This paper presents an investigation of argon capacitively coupled plasma at low pressure. A two-dimensional, time-dependent fluid model is used to describe the production, transport, and destruction of electrons and positive ions. The model is solved for a GEC(gaseous electronics conference) Cell reactor type (with 4cm diameter and 2.5cm interelectrode distance) operating at frequency 13.56MHz, pressure 1Torr and applied voltage 1000V, in pure argon. Two-dimensional distributions are presented in the stationary state, including electron temperature and species density i.e. electron, ion and metastable atom. The electric field and electric potential at different phases in one RF cycle is also studied.

A NUMERICAL STUDY OF TWO-PHASE FLOW USING A TWO-DIMENSIONAL TWO-FLUID MODEL

2004 ◽  
Vol 45 (10) ◽  
pp. 1049-1066 ◽  
Author(s):  
Moon-Sun Chung ◽  
Seung-Kyung Pak ◽  
Keun-Shik Chang
Keyword(s):  
Two Phase Flow ◽  
Numerical Study ◽  
Fluid Model ◽  
Phase Flow ◽  
Two Dimensional ◽  
Two Phase ◽  
Two Fluid Model ◽  
Two Fluid

Frequency effects in capacitively coupled radio‐frequency glow discharges: A comparison between experiments and a two‐dimensional fluid model

1994 ◽  
Vol 64 (14) ◽  
pp. 1780-1782 ◽  
Author(s):  
P. M. Meijer ◽  
J. D. P. Passchier ◽  
W. J. Goedheer ◽  
J. Bezemer ◽  
W. G. J. H. M. van Sark
Keyword(s):  
Radio Frequency ◽  
Fluid Model ◽  
Two Dimensional ◽  
Capacitively Coupled ◽  
Frequency Effects ◽  
Glow Discharges

Quantitative simulations of ratchet potential in a dusty plasma ratchet

2021 ◽  
Author(s):  
Shuo Wang ◽  
Ning Zhang ◽  
Shun-xin Zhang ◽  
Miao Tian ◽  
Ya-wen Cai ◽  
...  
Keyword(s):  
Dusty Plasma ◽  
Dust Particle ◽  
Cross Sections ◽  
Fluid Model ◽  
Charged Dust ◽  
Two Dimensional ◽  
Plasma Parameters ◽  
Capacitively Coupled ◽  
Electric Potentials ◽  
Ratchet Potential

Abstract Using a dusty plasma ratchet, one can realize the rectification of charged dust particle in a plasma. To obtain the ratchet potential dominating the rectification, here, we perform quantitative simulations based on a two-dimensional fluid model of capacitively coupled plasma. Plasma parameters are firstly calculated in two typical cross sections of the dusty plasma ratchet which cut vertically the saw channel at different azimuthal positions. The balance positions of charged dust particle in the two cross sections then can be found exactly. The electric potentials at the two balance positions have different values. Using interpolation in term of a double-sine function from previous experimental measurement, an asymmetrical ratchet potential along the saw channel is finally obtained. The asymmetrical orientation of the ratchet potential depends on discharge conditions. Quantitative simulations further reproduce our previous experimental phenomena such as the rectification of dust particle in the dusty plasma ratchet.

Numerical study on partial discharge in a dry air cavity with a two-dimensional fluid model considering practical reactions

2020 ◽  
Vol 53 (34) ◽  
pp. 345202
Author(s):  
Feng Gao ◽  
Qiao Wang ◽  
Dong Dai ◽  
Wenjun Ning ◽  
Yuhui Zhang ◽  
...  
Keyword(s):  
Numerical Study ◽  
Fluid Model ◽  
Partial Discharge ◽  
Two Dimensional ◽  
Air Cavity ◽  
Dry Air

Modeling of a capacitively coupled radio-frequency methane plasma: Comparison between a one-dimensional and a two-dimensional fluid model

2002 ◽  
Vol 92 (5) ◽  
pp. 2290-2295 ◽  
Author(s):  
D. Herrebout ◽  
A. Bogaerts ◽  
M. Yan ◽  
R. Gijbels ◽  
W. Goedheer ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Fluid Model ◽  
Two Dimensional ◽  
Capacitively Coupled ◽  
One Dimensional

Simulaiton of the Dual Frequency Capacitively Coupled Ar Plasma Using Fluid Model in Semiconductor Technique

2014 ◽  
Vol 633-634 ◽  
pp. 887-890
Author(s):  
Xiao Wei Gu
Keyword(s):  
Fluid Model ◽  
Plasma Reactor ◽  
Energy Balance Equation ◽  
Two Dimensional ◽  
Dual Frequency ◽  
Plasma Parameters ◽  
Capacitively Coupled ◽  
Continuity Equations ◽  
Main Discharge ◽  
Coupled Plasmas

Low-pressure capacitively coupled plasmas are now widely used for plasma processing in the semiconductor technique. In this paper, a numerical simulation model was developed to simulate the plasma in a dual frequency capacitively coupled plasma reactor based on a two-dimensional, self-consistent fluid model. The aim of our work is to provide estimates of the main discharge and plasma parameters and to help understand the basic mechanisms governing the CCP etching devices. Accurate solutions of the continuity equations, electron energy balance equation and possion's equation with realistic boundary conditions are obtained. The numerical results are used to analyze the plasma density distribution for one and two dimensional on whole plasma reactor.

scholarly journals Systematic characterization of low-pressure capacitively coupled hydrogen discharges

2004 ◽  
Vol 95 (9) ◽  
pp. 4605-4620 ◽  
Author(s):  
A. Salabas ◽  
L. Marques ◽  
J. Jolly ◽  
G. Gousset ◽  
L. L. Alves
Keyword(s):  
Low Pressure ◽  
Capacitively Coupled
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