The Effect of Preparation Conditions to Crystall of Ti Film

2011 ◽  
Vol 328-330 ◽  
pp. 1339-1342 ◽  
Author(s):  
Qi Lai ◽  
Shuang Hua Huang
Keyword(s):  
Negative Bias ◽  
Preparation Conditions ◽  
Diffraction Peaks ◽  
Ti Films

Ti film on AISI 201 was prepared by plasma. The film was characterized and analyzed by using XRD. it was found that of Ti film has a different microstructure in different condition. With negative bias increased from 15V to 260V, the diffraction peaks of Ti films changed from planes (111) to planes (200). With power increased from 8W to 145W, the diffraction peaks of Ti films decrease at planes (002), the diffraction peaks of Ti films decrease at planes (102) and (103). The result suggests that negative bias and power contributed to form an different phase throughout the films. The vacuum, distance and time have no effect to crystal of Ti film.

INFLUENCES OF PREPARATION CONDITIONS ON CNx THIN FILM STRUCTURE AND CHARACTERISTICS

2002 ◽  
Vol 16 (06n07) ◽  
pp. 1105-1109
Author(s):  
XIANCHENG WU ◽  
BO WANG ◽  
GUANGHUA CHEN ◽  
HULIN LI
Keyword(s):  
Thin Film ◽  
Carbon Nitride ◽  
Chemical Vapor ◽  
Film Structure ◽  
Negative Bias ◽  
Flow Ratio ◽  
Thin Film Structure ◽  
Preparation Conditions ◽  
Hot Filament ◽  
Reactive Gas

Carbon nitride (CNx) thin films have been synthesized by hot filament assisted r.f. plasma-enhanced chemical vapor deposition with negative bias methods on Si (100) substrates. The influences on the thin film structure and hardness characteristics of r.f. power and substrate negative bias have been emphatically investigated. The optimal preparation parameters have been summarized as follows: r.f. power of 200W, substrate negative bias of -200V, substrate temperature of about 600°C, total reactive gas pressure of about 110Pa, flow ratio of CH4 to N2 of 1 : 5.5.

Effects of Negative Bias on the Structure of Ti Film and its Adhesiveness to the Base by Plasma

2011 ◽  
Vol 110-116 ◽  
pp. 592-595
Author(s):  
Qi Lai ◽  
Shuang Hua Huang ◽  
De Jun Lan ◽  
Min Zou ◽  
Xue Ping Luo
Keyword(s):  
Stainless Steel ◽  
Stainless Steel Substrate ◽  
Steel Substrate ◽  
Analytical Techniques ◽  
Test Machine ◽  
Negative Bias ◽  
Aisi 304 ◽  
Film Density ◽  
Maximum Value ◽  
Ti Films

Ti film on AISI 201 was prepared by plasma. The film was characterized and analyzed by using a variety of analytical techniques, such as XRD, SEM and universal test machine. Ti films were deposited on AISI 201 stainless steel substrate, it was found that of Ti film has a different microstructure in various negative bias. And film density is connected with bias. When bias rose from the 15V to 100V, the film density increased from 3.82 g/cm3 to 4.28 g/cm3. After bias rose from the 100V to 180V, film density decreased from 4.28 g/cm3 to 4.13g/cm3. And also, due to the microstructural changes, the adhesiveness of Ti films at the AISI 201 increased from 1.16 MPa to maximum of 3.87 MPa, and then decreased. There is a similar maximum value of approximately 7.53 MPa at the AISI 304.

Catalytic Combustion of Vinyl Chloride Emission over a TiO2–MnOx Catalyst

2017 ◽  
Vol 42 (3) ◽  
pp. 259-268 ◽  
Author(s):  
Yiling Wan ◽  
Xiangyu Xie ◽  
Xiaojun Chen
Keyword(s):  
Vinyl Chloride ◽  
Catalytic Combustion ◽  
Active Oxygen Species ◽  
Catalyst Activity ◽  
Sol Gel ◽  
Space Velocity ◽  
Catalytic Performance ◽  
Molar Ratio ◽  
Preparation Conditions ◽  
Diffraction Peaks

TiO2–MnO x catalyst samples with different Ti/(Ti + Mn) molar ratios (2:3, 3:4, 4:5, 5:6, 6:7 and 1) prepared by the citric acid (CA) sol-gel method were studied in the catalytic combustion of vinyl chloride (VC) emission. The effects of preparation conditions and operation parameters on the catalytic performance of TiO2–MnO x were investigated. The catalyst samples were characterised by N2 adsorption, X-ray diffraction (XRD) and H2-temperature programmed reduction (H2-TPR). In the catalytic combustion of VC over TiO2–MnO x, products containing HCl, CO2, and H2O were obtained and there were no by-products such as chlorohydrocarbons and chlorine. The TiO2–MnO x catalyst with the molar ratio of CA/Mn/Ti = 0.30:0.20:0.80 showed the best catalytic performance and had better operating flexibility over the ranges of gas hourly space velocity (GHSV) of 15000–100000 h−1 and VC concentration of 0.05–2.00%. The temperatures at 50% conversion (140 °C) and at 99% conversion (220 °C) were achieved at a VC concentration of 0.1% and GHSV of 15000 h−1. XRD characterisation indicated that only the characteristic diffraction peaks of TiO2 with the anatase structure appeared and no characteristic diffraction peaks of MnO x species appeared for the TiO2–MnO x catalyst. XRD and H2-TPR results indicated that Mn ions were incorporated into the TiO2 lattice to form a Ti–Mn–O solid solution, which enhanced the reactivity of active oxygen species on the catalyst surface and thereby promoted the catalyst activity.

The Deposition Rate of Ti Film by Plasma

2011 ◽  
Vol 328-330 ◽  
pp. 1220-1223
Author(s):  
Shuang Hua Huang ◽  
Qi Lai
Keyword(s):  
Deposition Rate ◽  
Negative Bias ◽  
Titanium Film ◽  
Preparation Time ◽  
Deposition Rates ◽  
Deposition Power ◽  
Bias Range ◽  
Film Change ◽  
Ti Films

Ti film on AISI 201 was prepared by plasma. The film was characterized by SEM. Their deposition rates were measured by measure the mess of Ti film(m) and the preparation time(t). SEM show that the more time is, the thicker Ti films is. The stronger power is, the thicker Ti films is. And the far the distance is, the more thin Ti films is. It was found that the deposition rates range from 0.02 mg.min-1 to 0.025 mg.min-1 at the area of 6.25cm2. The deposition rate of titanium film change with the deposition power range from 0.021 mg.min-1 to 0.163 mg.min-1. The deposition rate of titanium film change with the deposition power range from 0.096 mg.min-1 to 0.130 mg.min-1. The deposition rate of titanium film change with the deposition negative bias range from 0.008 mg.min-1 to 0.02mg.min-1 at the area of 6.25cm2.

Interpretation of irradiation-induced changes in electron diffractograms and images of extinction contours at low temperatures

1984 ◽  
Vol 42 ◽  
pp. 268-269
Author(s):  
E. Knapek ◽  
H. Formanek ◽  
G. Lefranc ◽  
I. Dietrich
Keyword(s):  
Low Temperatures ◽  
Carbon Films ◽  
Organic Crystals ◽  
Wide Spread ◽  
Lens System ◽  
Preparation Conditions ◽  
Thin Carbon ◽  
Electron Diffractograms ◽  
Diffraction Patterns ◽  
Induced Changes

A few years ago results on cryoprotection of L-valine were reported, where the values of the critical fluence De i.e, the electron exposure which decreases the intensity of the diffraction reflections by a factor e, amounted to the order of 2000 + 1000 e/nm2. In the meantime a discrepancy arose, since several groups published De values between 100 e/nm2 and 1200 e/nm2 /1 - 4/. This disagreement and particularly the wide spread of the results induced us to investigate more thoroughly the behaviour of organic crystals at very low temperatures during electron irradiation.For this purpose large L-valine crystals with homogenuous thickness were deposited on holey carbon films, thin carbon films or Au-coated holey carbon films. These specimens were cooled down to nearly liquid helium temperature in an electron microscope with a superconducting lens system and irradiated with 200 keU-electrons. The progress of radiation damage under different preparation conditions has been observed with series of electron diffraction patterns and direct images of extinction contours.

The 3-Dimensional Molecular Structure of the Actin Filament Revisited

1985 ◽  
Vol 43 ◽  
pp. 480-481
Author(s):  
U. Aebi ◽  
R. Millonig ◽  
H. Salvo
Keyword(s):  
Actin Filament ◽  
Supramolecular Assembly ◽  
Specimen Preparation ◽  
X Ray Diffraction ◽  
Single Filament ◽  
X Ray ◽  
3 Dimensional ◽  
Filament Diameter ◽  
Preparation Conditions ◽  
Apparent Diameter

To date, most 3-D reconstructions of undecorated actin filaments have been obtained from actin filament paracrystal data (for refs, see 1,2). However, due to the fact that (a) the paracrystals may be several filament layers thick, and (b) adjacent filaments may sustantially interdigitate, these reconstructions may be subject to significant artifacts. None of these reconstructions has permitted unambiguous tracing or orientation of the actin subunits within the filament. Furthermore, measured values for the maximal filament diameter both determined by EM and by X-ray diffraction analysis, vary between 6 and 10 nm. Obviously, the apparent diameter of the actin filament revealed in the EM will critically depend on specimen preparation, since it is a rather flexible supramolecular assembly which can easily be bent or distorted. To resolve some of these ambiguities, we have explored specimen preparation conditions which may preserve single filaments sufficiently straight and helically ordered to be suitable for single filament 3-D reconstructions, possibly revealing molecular detail.

Patients with Parkinson’s disease display a dopamine therapy related negative bias and an enlarged range in emotional responses to facial emotional stimuli.

2017 ◽  
Vol 31 (6) ◽  
pp. 605-612 ◽  
Author(s):  
Daniel Lundqvist ◽  
Joakim Svärd ◽  
Åsa Michelgård Palmquist ◽  
Håkan Fischer ◽  
Per Svenningsson
Keyword(s):  
Parkinson’S Disease ◽  
Parkinson's Disease ◽  
Emotional Responses ◽  
Negative Bias ◽  
Emotional Stimuli

Short-range order effects in amorphous FexSi1-x/Si multilayers induced by preparation conditions

1998 ◽  
Vol 08 (PR2) ◽  
pp. Pr2-175-Pr2-178 ◽  
Author(s):  
G. T. Pérez ◽  
F. H. Salas ◽  
R. Morales ◽  
L. M. Álvarez-Prado ◽  
J. M. Alameda
Keyword(s):  
Short Range ◽  
Short Range Order ◽  
Range Order ◽  
Order Effects ◽  
Preparation Conditions
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