The Effect of Al-BSF on Seff and Rb in Industrialized Mono-Silicon Solar Cells

2012 ◽  
Vol 472-475 ◽  
pp. 1846-1850
Author(s):  
Shan Shan Dai ◽  
Gao Jie Zhang ◽  
Xiang Dong Luo ◽  
Jing Xiao Wang ◽  
Wen Jun Chen ◽  
...  
Keyword(s):  
Solar Cells ◽  
Spectral Response ◽  
Short Circuit ◽  
Rear Surface ◽  
Surface Recombination ◽  
Short Circuit Current ◽  
Open Circuit ◽  
Surface Recombination Velocity ◽  
Silicon Solar Cells ◽  
Back Surface

In this work, the effect of aluminum back surface field formed by screen printed various amount of Al paste on the effective rear surface recombination velocity (Seff) and the internal rear reflectance coeffeicient (Rb) of commercial mono-silicon solar cells was investigated. We demonstrated the effect of Seffand Rbon the performance of Al-BSF solar cells by simulating them with PC1D. The simulated results showed that the lower Seffcould get higher open circuit voltage (Voc), at the same time, the larger Rbcould get higher short-circuit current (Isc). Experimentally, we investigated the Seffand Rbthrough depositing Al paste with various amount (3.7, 5, 6, and 8 mg/cm2) for fabricating Al-BSF mono-silicon solar cells. Four group cells were characterized by light I-V, spectral response, hemispherical reflectance and scanning electron microscope (SEM) measurements. It was found that, a minimum Seffof 350 cm/s was gotten from the cells with Al paste of 8 mg/cm2, which was extracted by matching quantum efficiency (QE) from 800 nm to 1200 nm with PC1D, and a maximum Rbof 53.5% was obtained from Al paste of 5 mg/cm2by calculating at 1105 nm with PC1D. When the amount of Al paste was higher than 5mg/cm2, there were less Seffand lower Rb. On the other hand, when Al amount was 3.7mg/cm2, it was too little to form a closed BSF. Based on the SEM graphs and simulations with PC1D, a simple explaination was proposed for the experimental results.

Study on the Performance of Aluminum Thick Film Contacts for Silicon Solar Cells

2013 ◽  
Vol 833 ◽  
pp. 241-246
Author(s):  
Ming Fu ◽  
Hong Yong Li ◽  
Gong Lei Jin ◽  
Lin Fan ◽  
Dong Chen ◽  
...  
Keyword(s):  
Solar Cells ◽  
Thick Film ◽  
Short Circuit ◽  
Short Circuit Current ◽  
Open Circuit ◽  
Silicon Solar Cells ◽  
Back Surface ◽  
Gravimetric Analysis ◽  
Scanning Calorimetry ◽  
Photoelectric Properties

Aluminum rear contacts of silicon solar cells are made commonly by screen-printing aluminum paste and sintering process. Aluminum thick film contacts have a direct effect on photoelectric properties of solar cells, like open circuit voltage (Voc), short circuit current (Isc), conversion efficiency (η), etc. The principle of Al-back surface field (BSF) has been studied in this paper. With thermal gravimetric analysis and differential scanning calorimetry (TGA-DSC) method, the chemical reactions between aluminum thick film and silicon substrate during heat treatment have been investigated. The microstructure of aluminum thick film contacts were analysed by SEM. The electrical properties of Al-BSF are improved by adding a proper amount of nano silicon to the aluminum paste.

scholarly journals Enhanced Performance of Nanotextured Silicon Solar Cells with Excellent Light-Trapping Properties

Photonics ◽  
2021 ◽  
Vol 8 (7) ◽  
pp. 272
Author(s):  
Bingfei Dou ◽  
Rui Jia ◽  
Zhao Xing ◽  
Xiaojiang Yao ◽  
Dongping Xiao ◽  
...  
Keyword(s):  
Solar Cells ◽  
Light Trapping ◽  
Short Circuit ◽  
Surface Recombination ◽  
Atomic Layer ◽  
Short Circuit Current ◽  
Open Circuit ◽  
Surface Recombination Velocity ◽  
Electrode Contact ◽  
Recombination Velocity

Light-trapping nanostructures have been widely used for improving solar cells’ performance, but the higher surface recombination and poor electrode contact introduced need to be addressed. In this work, silicon nanostructures were synthesized via silver-catalyzed etching to texturize solar cells. Atomic-layer-deposited Al2O3 passivated the nanotextured cells. A surface recombination velocity of 126 cm/s was obtained, much lower than the 228 cm/s of the SiNX-passivated one. Additionally, the open-circuit voltage (VOC) of the nanotextured cells improved significantly from 582 to 610 mV, as did the short-circuit current (JSC) from 25.5 to 31 mA/cm2. Furthermore, the electrode contact property was enhanced by light-induced plating. A best efficiency of 13.3% for nano-textured cells was obtained, which is higher than the planar cell’s 12%.

The influence of emitter resistance on the electrical parameters of mono- and multicrystalline silicon solar cells

2019 ◽  
Vol 36 (3) ◽  
pp. 90-94
Author(s):  
Barbara Swatowska ◽  
Piotr Panek ◽  
Dagmara Michoń ◽  
Aleksandra Drygała
Keyword(s):  
Solar Cells ◽  
Contact Resistance ◽  
Short Circuit ◽  
Short Circuit Current ◽  
Open Circuit ◽  
Multicrystalline Silicon ◽  
Silicon Solar Cells ◽  
Electrical Parameters ◽  
Content Type ◽  
Diffusion Parameters

Purpose The purpose of this study was the comparison and analysis of the electrical parameters of two kinds of silicon solar cells (mono- and multicrystalline) of different emitter resistance. Design/methodology/approach By controlling of diffusion parameters, silicon mono- (Cz-Si) and multicrystalline (mc-Si) solar cells with different emitter resistance values were produced – 22 and 48 Ω/□. On the basis of current-voltage measurements of cells and contact resistance mapping, the properties of final solar cells based on two different materials were compared. Additionally, the influence of temperature on PV cells efficiency and open circuit voltage (Uoc) were investigated. The PC1D simulation was useful to determine spectral dependence of external quantum efficiency of solar cells with different emitter resistance. The silicon solar cells of 25 cm2 area and 240 µm thickness were investigated. Findings Considering the all stages of cell technology, the best structure is silicon solar cell with sheet resistance (Rsheet) of 45-48 Ω/□. Producing of an emitter with this resistance allowed to obtain cells with a fill factor between 0.725 and 0.758, Uoc between 585 and 612 mV, short circuit current (Isc) between 724 and 820 mA. Originality/value Measurements and analysis confirmed that mono- and multicrystalline silicon solar cells with 48 Ω/□ emitter resistance have better parameters than cells with Rsheet of 22 Ω/□. The contact resistance is the highest for mc-Si with Rsheet of 48 Ω/□ and reaches the value 3.8 Ωcm.

scholarly journals A Quarterthiophene-Based Dye as an Efficient Interface Modifier for Hybrid Titanium Dioxide/Poly(3-hexylthiophene)(P3HT) Solar Cells

Polymers ◽  
2019 ◽  
Vol 11 (11) ◽  
pp. 1752 ◽  
Author(s):  
Arumugam Pirashanthan ◽  
Thanihaichelvan Murugathas ◽  
Neil Robertson ◽  
Punniamoorthy Ravirajan ◽  
Dhayalan Velauthapillai
Keyword(s):  
Titanium Dioxide ◽  
Solar Cells ◽  
Spectral Response ◽  
Short Circuit ◽  
Photovoltaic Performance ◽  
Hole Mobility ◽  
Short Circuit Current ◽  
Acid Group ◽  
Open Circuit ◽  
Absorption Data

This work focused on studying the influence of dyes, including a thiophene derivative dye with a cyanoacrylic acid group ((E)-2-cyano-3-(3′,3′′,3′′′-trihexyl-[2,2′:5′,2′′:5′′,2′′′- quaterthiophene]-5-yl) acrylicacid)(4T), on the photovoltaic performance of titanium dioxide (TiO2)/poly(3-hexyl thiophene)(P3HT) solar cells. The insertion of dye at the interface improved the efficiency regardless of the dye used. However, 4T dye significantly improved the efficiency by a factor of three when compared to the corresponding control. This improvement is mainly due to an increase in short circuit current density (JSC), which is consistent with higher hole-mobility reported in TiO2/P3HT nanocomposite with 4T dye. Optical absorption data further revealed that 4T extended the spectral response of the TiO2/P3HT nanocomposite, which could also enhance the JSC. The reduced dark current upon dye insertion ensured the carrier recombination was controlled at the interface. This, in turn, increased the open circuit voltage. An optimized hybrid TiO2/P3HT device with 4T dye as an interface modifier showed an average efficiency of over 2% under-simulated irradiation of 100 mWcm−2 (1 sun) with an Air Mass 1.5 filter.

Low effective back‐surface recombination velocity by boron implantation on 0.3‐Ω‐cmp‐type silicon solar cells

1988 ◽  
Vol 63 (9) ◽  
pp. 4683-4687 ◽  
Author(s):  
Leendert A. Verhoef ◽  
Albert Zondervan ◽  
Fredrik A. Lindholm ◽  
Mark B. Spitzer ◽  
Christopher J. Keavney
Keyword(s):  
Solar Cells ◽  
Surface Recombination ◽  
Surface Recombination Velocity ◽  
Silicon Solar Cells ◽  
Back Surface ◽  
Type Silicon ◽  
Boron Implantation ◽  
Recombination Velocity

Simulation of Symmetrically Doped Silicon Nanowire Solar Cells

2011 ◽  
Vol 1322 ◽  
Author(s):  
Felix Voigt ◽  
Thomas Stelzner ◽  
Silke H. Christiansen
Keyword(s):  
Solar Cells ◽  
Short Circuit ◽  
Silicon Nanowire ◽  
Short Circuit Current ◽  
Cylindrical Symmetry ◽  
Short Circuit Current Density ◽  
Open Circuit ◽  
Back Surface ◽  
Cell Efficiency ◽  
P Type

ABSTRACTSilicon nanowire solar cells were simulated using the Silvaco TCAD software kit. For optimization of speed the simulations were performed in cylinder coordinates with cylindrical symmetry. Symmetric doping was assumed with a dopant density of 1018 cm-3 in the p-type core and inside the n-type shell. In the implementation a cathode contact was wrapped around the semiconductor nanorod and an anode was assumed at the bottom of the rod. Optimization of cell efficiency was performed with regard to the rod radius and the rod length. In both optimization processes clear maxima in efficiency were visible, resulting in an optimal radius of 66 nm with the pn junction at 43.5 nm and an optimal rod length of about 48 μm. The maximum of efficiency with respect to the rod radius is due to a decrease of short-circuit current density (Jsc) and an increase of open-circuit voltage (Uoc) with radius, while the maximum with respect to the rod length is explained by the combination of an increase of Jsc and a decrease of Uoc. Fill factors stay rather constant at values between 0.6 and 0.8. Further, the influence of a back surface field (BSF) layer was surveyed in simulations. Positioning the BSF next to the cathode contact considerably improved cell efficiency. In addition, simulations with a cathode contact on top of the nanowire structure were undertaken. No severe deterioration of cell performance with increasing radius was observed so far in this configuration. Hence, nanorods with much larger radii can be used for solar cells using this contact scheme. In comparison to simulations with wrapped cathode contacts, Jsc and Uoc and therefore efficiency is considerably improved.

scholarly journals Analysis of Back Surface Field (BSF) Performance in P-Type And N-Type Monocrystalline Silicon Wafer

2018 ◽  
Vol 43 ◽  
pp. 01006 ◽  
Author(s):  
Ferdiansjah ◽  
Faridah ◽  
Kelvian Tirtakusuma Mularso
Keyword(s):  
Solar Cell ◽  
Doping Level ◽  
Short Circuit ◽  
Surface Recombination ◽  
Short Circuit Current ◽  
Short Circuit Current Density ◽  
Surface Recombination Velocity ◽  
Back Surface ◽  
Solar Cell Performance ◽  
P Type

Back Surface Field (BSF) has been used as one of means to enhance solar cell performance by reducing surface recombination velocity (SRV). One of methods to produce BSF is by introducing highly doped layer on rear surface of the wafer. Depending on the type of the dopant in wafer, the BSF layer could be either p+ or n+. This research aims to compare the performance of BSF layer both in p-type and n-type wafer in order to understand the effect of BSF on both wafer types. Monociystalline silicon wafer with thickness of 300 μm. area of 1 cm2, bulk doping level NB = 1.5×1016/cm3 both for p-type wafer and n-type wafer are used. Both wafer then converted into solar cell by adding emitter layer with concentration NE =7.5×1018/cm3 both for p-type wafer and n-type wafer. Doping profile that is used for emitter layer is following complementary error function (erfc) distribution profile. BSF concentration is varied from 1×1017/cm3 to 1×1020/cm3 for each of the cell. Solar cell performance is tested under standard condition, with AM1.5G spectrum at 1000 W/m2. Its output is measured based on its open circuit voltage (Voc). short circuit current density (JSC), efficiency (η). and fill factor (FF). The result shows that the value of VOC is relatively constant along the range of BSF concentration, which is 0.694 V – 0.702 V. The same pattern is also observed in FF value which is between 0.828 – 0.831. On the other hand, value of JSC and efficiency will drop against the increase of BSF concentration. Highest JSC which is 0.033 A/cm2 and highest efficiency which is 18.6% is achieved when BSF concentration is slightly higher than bulk doping level. The best efficiency can be produced when BSF concentration is around 1×1017cm-3.. This result confirms that surface recombination velocity has been reduced due to the increase in cell’s short circuit current density and its efficiency. In general both p-type and n-type wafer will produce higher efficiency when BSF is applied. However, the increase is larger in p-type wafer than in n-type wafer. Better performance for solar cell is achieved when BSF concentration is slightly higher that bulk doping level because at very high BSF concentration the cell’s efficiency will be decreased.

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