The Removal of In2O3SnO4 Thin Film Using an Arc-Form Tool for the Precision Recycling of Defective Digital-Paper

2013 ◽  
Vol 668 ◽  
pp. 288-291
Author(s):  
P.S. Pa

A newly designed arc-form shaped tool was used to carry out precise micro electrochemical etching (MECE) to remove Indium-tin-oxide (In2O3SnO2) thin-film nanostructures from the optical PET diaphragm surfaces for digital-paper surface. For this precise removal process, a higher current with a faster feed rate of the optical PET diaphragm effectively achieved rapid material removal. A pulsed direct current can improve dregs discharge and is advantageous when associated with fast PET feed rates, but this raises the total current required. A higher temperature or flow velocity of the electrolyte corresponds to a higher removal rate of the In2O3SnO2 nanostructures. A high rotational speed of the arc-form shaped tool corresponds to a higher removal rate of In2O3SnO2. A large cathode, along with a small gap-width between the cathode and the PET diaphragm, increases In2O3SnO2 removal rates. A thin cathode, or a short arc length of the arc-form anode, reduces the time taken for In2O3SnO2 removal.

2012 ◽  
Vol 426 ◽  
pp. 3-6
Author(s):  
P.S. Pa

A bluge rotational tool has been developed as an effective precision electrochemical removal for the thin film nanostructures from LCD panels. This ultra-precise process effectively removes defective Indium-Tin-Oxide layers allowing LCD panels to be returned to the production line and significantly reduces costs. In the current experiment a 7th Generation TFT-LCD panel was used. A high rotational speed of the cheek rotational tool elevates discharge mobility and improves the removal effect. A negative electrode of large diameter with a small end radius provides higher current density and also improves the removal affect. Pulsed direct current can improve the effect of dregs discharge and is advantageous when combined with a higher electric power. A fast feed combined with a high current flow results in very effective removal of the color filter layer. This novel design using electrochemical removal as a precision recycling process for removing ITO layers from LCD panels is clean, effective and very fast.


2010 ◽  
Vol 428-429 ◽  
pp. 387-390
Author(s):  
Pai Shan Pa

A new effective fabrication module was developed to mediate the problem of the low yield of Indium-tin-oxide (ITO) nanostructures deposition uses micro electroremoval technology and a design of twins-cylinder tool as a precision etching process to remove the defective Indium-tin-oxide (ITO) from the optical PET diaphragm surfaces of digital-paper displays. For the removal-process, a small gap width between the negative electrode and the workpiece (optical PET diaphragm) surface corresponds to a higher removal rate for the ITO. A small diameter of the anode or a small diameter of the cathode of the twins-cylinder tool provides large electric current density and takes less time for the same amount (20 nm) of ITO removal. High rotational speed of the twins-cylinder tool the discharge mobility and results in improving the removal effect. Providing enough electrical power can uses fast feed rate of the optical PET diaphragm combined with a fast removal rate for ITO. With increasing in current rating, pulsed direct current can improve the effect of dregs discharge and is advantageous to associate with the fast feed rate of the optical PET diaphragm. By establishing a recycling process using the ultra-precise removal of thin-film nanostructures, through the micro electroremoval and the twins-cylinder electrodes requires only a short period of time to remove the ITO thin-film easily and cleanly. The optoelectronic semiconductor industry can effectively recycle defective products, minimizing both production costs and pollution.


2009 ◽  
Vol 626-627 ◽  
pp. 1-4
Author(s):  
Pai Shan Pa

In the current study, a reclamation module uses micro electroetching as a precision fabrication with a new design of T-form tool to remove the defective Indium-tin-oxide (TCO) nanostructure from the optical PET surfaces of digital paper display is presented in current studies. The adopted precision reclamation process requires only a short period of time to remove the TCO nanostructure easily and cleanly is based on technical and economical considerations and is highly efficient. A large rotational diameter of the cathode accompanied by a small gap width between the cathode and the workpiece corresponds to a higher removal rate for the TCO nanostructure. A small thickness of the electrodes, or a small edge radius of the electrodes takes less time for the same amount of TCO removal. A higher feed rate of the optical PET diaphragm combines with enough electric power to drive fast etching rate. High rotational speed of the T-form tool can improve the effect of dregs discharge and is advantageous to associate with the fast feed rate of the workpiece (optical PET diaphragm).


2008 ◽  
Vol 44-46 ◽  
pp. 449-454
Author(s):  
Pai Shan Pa

An effective process was developed using electroremoval as a precision removal-process for indium tin oxide (ITO) thin-film nanostructures from the displays’ color filter surface of thin film transistor liquid crystal displays (TFT-LCDs). The low yield of ITO thin-film deposition is an important factor in semiconductor production. By establishing a recycling process using the ultra-precise removal of thin-film nanostructures, the semiconductor optoelectronic industry can effectively recycle defective products, minimizing both production costs and pollution. For the removal-process, high rotational speed of the electrode (negative-pole) elevates the discharge mobility and results in improved removal. High flow velocity of the electrolyte provides larger discharge mobility and greater removal ability. An adequate gap-width between the negative-electrode and the ITO surface, or a higher working temperature, results in a higher removal rate for ITO thin-films. Also, adequate feed rate of the color filter combined with enough electrical power produces a fast removal rate. Pulsed direct current can improve the effect of dregs discharge and is advantageous to associate with the fast feed rate of the workpiece (displays’ color filter), but it raises the current rating. Electrochemical removal requires only a short period of time to remove the ITO thin-film easily and cleanly.


2011 ◽  
Vol 181-182 ◽  
pp. 955-958
Author(s):  
Pai Shan Pa

A effective method for the precision electrochemical removal of thin film nanostructures from LCD panels using a gear-shaped electrode tool has been developed. This ultra-precise process effectively removes defective Indium-Tin-Oxide layers allowing LCD panels to be returned to the production line and significantly reduces costs. In the current experiment a 7th Generation TFT-LCD panel was used. A high rotational speed of the gear-shaped negative electrode elevates discharge mobility and improves the removal effect. Pulsed direct current can improve the effect of dregs discharge and is advantageous when combined with a fast workpiece feed rate. A fast feed combined with a high current flow results in very effective removal of the color filter layer. A negative electrode of large diameter with a small edge radius provides higher current density and also improves the removal affect. This novel design using electrochemical removal as a precision recycling process for removing ITO layers from LCD panels is clean, effective and very fast.


2013 ◽  
Vol 284-287 ◽  
pp. 414-417
Author(s):  
P.S. Pa

A major problem for the implementation of microelectroremoval is the cost and the design of the tool electrode. An effective nanoscale processing for yield improvement was developed using microelectroremoval and a designed twin-cylinder tool as a precision reclamation retrieval system to remove the defective indium tin oxide (ITO) thin-film nanostructures from the optical PET surfaces of digital paper. By establishing a recycling process using the ultra-precise removal of nanostructures, the optoelectronic semiconductor industry can effectively recycle defective products, minimizing both production costs and pollution. In the current experiment, small thickness of the anode, combined with enough electric power and provided a larger discharge space, and better removal effect. A large diameter of the cylinder acthode accompanied by a small gap-width between the cathode and the workpiece, takes less time to do the same amount of ITO removal. A higher rate of removal of the defective ITO nanostructures corresponds to high temperature, a large electrolyte flow rate with a high rotational speed of the electrodes. A faster feed rate of color filters combined with a higher electric current produces a fast removal rate. A small edge angle of the anode also provides higher current density, which is advantageous for ITO removal.


2013 ◽  
Vol 706-708 ◽  
pp. 387-390
Author(s):  
P.S. Pa

A newly devised process using micro-electrochemical machining (MECE) is described as a recycling module in the current study. The purpose is the precise removal of In2O3SnO2 thin-film nanostructures from optical PET diaphragm surfaces for digital-paper surface. In the current experiment it was found that a large rotational diameter (Dc) for the cathode with a small gap width between the anode and the PET diaphragm surfaces was found to remove the In2O3SnO2 rapidly. A small edge radius of the cathode, or a short arc length of the anode, reduces the time taken for In2O3SnO2 removal. A high feed rate of the PET and adequate electrical power results in fast machining. Pulsed direct current improves dregs discharge and this is an advantage with a fast feed. A high electrode rotational speed also corresponds to faster removal of the In2O3SnO2 nanostructures. The development of the proposed precision production design is based on both technical and economic considerations.


2010 ◽  
Vol 135 ◽  
pp. 36-40
Author(s):  
Pai Shan Pa

This study describes a new module that uses micro electrochemical machining, and a new design of a convex-shaped tool, in a precision reclamation process to remove defective Indium-tin-oxide (ITO) nanostructures from the optical PET diaphragm surfaces of a digital-paper display. This process takes very little time to remove the ITO layers easily and cleanly and is highly efficient both technically and economically. A small end radius of the cathode or a thin cathode of the bulge-form tool takes less time for the same amount (20 nm) of ITO removal. A large diameter of the cathode of the bulge-form tool combined with a small gap between the cathode and the workpiece corresponds to a higher removal rate of ITO. A high rotational speed of the bulge-form tool can also improve dregs discharge and allows a higher feed rate of the optical PET diaphragm. This higher feed rate combined with enough voltage results in a shorter machining time.


2010 ◽  
Vol 297-301 ◽  
pp. 203-208
Author(s):  
Pai Shan Pa

A new triangular-shape designed tool as a cathode in microelectromechanical etching process is a precision nanoscale production of a reclamation system of Indium tin oxide (ITO) thin-films defects removal from optoelectronic flat panel displays’ color filter surface is demonstrated in the current study. Through the ultra-precise removal of the thin-film nanostructure, the optoelectronic semiconductor industry can effectively reclaim defective products, reducing production costs. In the current experiment, a large size triangular shape cathode is accompanied by a small gap-width between the cathode and the workpiece takes less time for the same amount of ITO removal. A higher feed rate of displays’ color filter or a small end radius of the cathode combined with enough electric power produces fast machining. Pulsed direct current can improve the effect of dregs discharge and is advantageous in association with a fast workpiece feed rate. However, it raises the current rating. A large flow rate of the electrolyte corresponds to a higher removal rate for the ITO nanostructure. The electrochemical etching just needs a short time to make the ITO remove removal easy and clean.


2007 ◽  
Vol 124-126 ◽  
pp. 263-266
Author(s):  
Nam Hoon Kim ◽  
Gwon Woo Choi ◽  
Yong Jin Seo ◽  
Woo Sun Lee

Indium tin oxide (ITO) CMP was performed by change of de-ionized water (DIW) temperature in pad conditioning process. DIW with high temperature was employed in pad conditioning immediately before ITO-CMP. The removal rate of ITO thin film polished by silica slurry immediately after pad conditioning process with the different DIW temperatures dramatically increased to 93.0 nm/min after pad conditioning at DIW of 75 oC, while that after the general conditioning process at 30 oC was about 66.1 nm/min. The grains of ITO thin film became indistinguishable by CMP after pad conditioning with the high-temperature DIW. The carrier density decreased with the increase of conditioning temperature. The hall mobility rapidly increased regardless of conditioning temperature. The uniformity of optical transmittance also improved.


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