Defects Removal Using a Triangular-Shape Designed Tool

2010 ◽  
Vol 297-301 ◽  
pp. 203-208
Author(s):  
Pai Shan Pa
Keyword(s):  
Indium Tin Oxide ◽  
Feed Rate ◽  
Electrochemical Etching ◽  
Removal Rate ◽  
Semiconductor Industry ◽  
Production Costs ◽  
Color Filter ◽  
Filter Surface ◽  
Triangular Shape ◽  
Ito Thin Films

A new triangular-shape designed tool as a cathode in microelectromechanical etching process is a precision nanoscale production of a reclamation system of Indium tin oxide (ITO) thin-films defects removal from optoelectronic flat panel displays’ color filter surface is demonstrated in the current study. Through the ultra-precise removal of the thin-film nanostructure, the optoelectronic semiconductor industry can effectively reclaim defective products, reducing production costs. In the current experiment, a large size triangular shape cathode is accompanied by a small gap-width between the cathode and the workpiece takes less time for the same amount of ITO removal. A higher feed rate of displays’ color filter or a small end radius of the cathode combined with enough electric power produces fast machining. Pulsed direct current can improve the effect of dregs discharge and is advantageous in association with a fast workpiece feed rate. However, it raises the current rating. A large flow rate of the electrolyte corresponds to a higher removal rate for the ITO nanostructure. The electrochemical etching just needs a short time to make the ITO remove removal easy and clean.

An Electrode Sets with a Cylindrical Cathode and a Platy Anode for Reclamation of TFT-LCD Surface

2014 ◽  
Vol 552 ◽  
pp. 341-344
Author(s):  
P.S. Pa
Keyword(s):  
Indium Tin Oxide ◽  
Electrochemical Etching ◽  
Removal Rate ◽  
Semiconductor Industry ◽  
Production Costs ◽  
Color Filter ◽  
Filter Surface ◽  
Major Interest ◽  
Ito Thin Films ◽  
High Feed

The low yield rate of ITO thin-films is well known in semiconductor production processes. In the current study, an electrode sets with a cylindrical cathode and a platy anode as a reclamation process for the nanoscale removal of the indium tin oxide (ITO) nanostructure from the color filter surface of TFT-LCD displays is presented. In the current experiment, the major interest lies in the features of the technology and the design of the cylindrical cathode and the platy anode for the electrochemical etching process. For this process a steep gradient of the platy anode provides large discharge mobility and a better removal effect. A thin platy anode, a small gap-width between the cylindrical cathode and the ITO surface, or a high flow rate of electrolyte corresponds to a higher removal rate of the ITO-layer. A large current flow combined with a high feed rate of the display also results in a fast removal rate. By establishing a recycling process for the ultra-precise removal of the thin-film nanostructure, the optoelectronic semiconductor industry can effectively recycle defective products with a reduction of both production costs and pollution.

Design of an Oblique Tool for the Nano Removal Process

2010 ◽  
Vol 118-120 ◽  
pp. 665-669
Author(s):  
Pai Shan Pa
Keyword(s):  
Indium Tin Oxide ◽  
Removal Rate ◽  
Semiconductor Industry ◽  
Production Costs ◽  
Color Filter ◽  
Recycling Process ◽  
Filter Surface ◽  
Removal Process ◽  
Major Interest ◽  
High Feed

A system design for a recycling process for the nano removal of the indium tin oxide (ITO) nanostructure from the color filter surface of TFT-LCD displays is presented. The low yield rate of ITO thin-films is well known in semiconductor production processes. By establishing a recycling process for the ultra-precise removal of the thin-film nanostructure, the optoelectronic semiconductor industry can effectively recycle defective products with a reduction of both production costs and pollution. In the current experiment, the major interest lies in the features of the technology and the design of an oblique cathode for the electrochemical removal process. For this process a steep gradient of the oblique cathode provides large discharge mobility and a better removal effect. A thin oblique cathode, a small gap-width between the cathode and the ITO surface, or a high flow rate of electrolyte corresponds to a higher removal rate of the ITO-layer. A large current flow combined with a high feed rate of the display also results in a fast removal rate.

Product Design of a Precision Recycle-Process Tool for Displays' Color Filters of TFT-LCDs

2008 ◽  
Vol 44-46 ◽  
pp. 449-454
Author(s):  
Pai Shan Pa
Keyword(s):  
Thin Film ◽  
Feed Rate ◽  
Removal Rate ◽  
Film Deposition ◽  
Production Costs ◽  
Color Filter ◽  
High Rotational Speed ◽  
Removal Process ◽  
Short Period ◽  
Thin Film Nanostructures

An effective process was developed using electroremoval as a precision removal-process for indium tin oxide (ITO) thin-film nanostructures from the displays’ color filter surface of thin film transistor liquid crystal displays (TFT-LCDs). The low yield of ITO thin-film deposition is an important factor in semiconductor production. By establishing a recycling process using the ultra-precise removal of thin-film nanostructures, the semiconductor optoelectronic industry can effectively recycle defective products, minimizing both production costs and pollution. For the removal-process, high rotational speed of the electrode (negative-pole) elevates the discharge mobility and results in improved removal. High flow velocity of the electrolyte provides larger discharge mobility and greater removal ability. An adequate gap-width between the negative-electrode and the ITO surface, or a higher working temperature, results in a higher removal rate for ITO thin-films. Also, adequate feed rate of the color filter combined with enough electrical power produces a fast removal rate. Pulsed direct current can improve the effect of dregs discharge and is advantageous to associate with the fast feed rate of the workpiece (displays’ color filter), but it raises the current rating. Electrochemical removal requires only a short period of time to remove the ITO thin-film easily and cleanly.

Mechanism Design of ITO-Layer Removal from Color Filter of TFT-LCD

2008 ◽  
Vol 594 ◽  
pp. 1-6
Author(s):  
Pai Shan Pa
Keyword(s):  
Mechanism Design ◽  
Removal Rate ◽  
Low Cost ◽  
Negative Electrode ◽  
Production Costs ◽  
Color Filter ◽  
Recycling Process ◽  
Filter Surface ◽  
Major Interest ◽  
Short Time

A mechanism design for the recycling process for removing the ITO-layer from color filter surface of TFT-LCD is presented. The defect rate of the ITO-layer is easily existent through the processes of semiconductor production. By establishing a recycling process for the ultra-precise removal of the thin film microstructure, the semiconductor optoelectronic industry can effectively recycle defective products, reducing both production costs and pollution. In the current experiment, the major interest is the design mechanism features of the removal process for a thin layer of ITO. For the recycling processes, a high flow velocity of the electrolyte provides a larger discharge mobility and a better removal effect. A thin thickness of the negative-electrode, an adequate gapwidth between the negative-electrode and the workpiece, or a higher working temperature corresponds to a higher removal rate for the ITO-layer. An adequate feed rate of the color filter combined with enough electric power produces a fast removal rate. An effective mechanism design and a low-cost recycling process using the electrochemical removal requires quite a short time to make the ITO layer remove easily and cleanly.

A Design Reuse Process in Reduction the Low Yield Rate for Display Panel

2013 ◽  
Vol 313-314 ◽  
pp. 1144-1147 ◽  
Author(s):  
P.S. Pa
Keyword(s):  
Thin Film ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Feed Rate ◽  
Semiconductor Industry ◽  
Machining Process ◽  
Oxide Thin Film ◽  
Color Filter ◽  
Yield Rate ◽  
Major Interest

The low yield rate in display panel production that results from imperfect Indium Tin Oxide layer deposition is well known. In this experiment a 6thGeneration TFT-LCD is used to investigate an ultra-precise method for the removal of Indium Tin Oxide (ITO) thin film microstructure from defective display panels. The complete removal of the ITO layer makes it possible to put these panels back into the production line for reuse with a considerable reduction of both waste and production cost. This process, which involves the removal of ITO layer substructure by means of an electro-chemical etching process, is of major interest to the optoelectronics semiconductor industry. The ITO film can be removed completely by a proper combination of feed rate and electric power. In this electro machining process a high current flow and high feed rate of the display (color filter) achieves complete and efficient removal of the ITO layer. A large diameter cathode virtual rotation circle also corresponds to a higher removal rate. A small cathode end radius effectively improves dregs discharge and is an advantage when associated with a high workpiece feed rate. This precision reuse process for the recycling of defective display screen color filters is presented as an effective tool for use in the screen manufacturing process. The defective Indium Tin Oxide thin-film can be removed easily and cleanly in a short time.

Nanoscale Removal Processing by a Twin-Cylinder Tool

2013 ◽  
Vol 284-287 ◽  
pp. 414-417
Author(s):  
P.S. Pa
Keyword(s):  
Indium Tin Oxide ◽  
Removal Rate ◽  
Semiconductor Industry ◽  
Large Diameter ◽  
Production Costs ◽  
Tool Electrode ◽  
High Rotational Speed ◽  
The Cost ◽  
Color Filters ◽  
Gap Width

A major problem for the implementation of microelectroremoval is the cost and the design of the tool electrode. An effective nanoscale processing for yield improvement was developed using microelectroremoval and a designed twin-cylinder tool as a precision reclamation retrieval system to remove the defective indium tin oxide (ITO) thin-film nanostructures from the optical PET surfaces of digital paper. By establishing a recycling process using the ultra-precise removal of nanostructures, the optoelectronic semiconductor industry can effectively recycle defective products, minimizing both production costs and pollution. In the current experiment, small thickness of the anode, combined with enough electric power and provided a larger discharge space, and better removal effect. A large diameter of the cylinder acthode accompanied by a small gap-width between the cathode and the workpiece, takes less time to do the same amount of ITO removal. A higher rate of removal of the defective ITO nanostructures corresponds to high temperature, a large electrolyte flow rate with a high rotational speed of the electrodes. A faster feed rate of color filters combined with a higher electric current produces a fast removal rate. A small edge angle of the anode also provides higher current density, which is advantageous for ITO removal.

An Ellipsoidal Tool as a Nanoscale Removal Processes for Computer and Digital System

2012 ◽  
Vol 586 ◽  
pp. 430-437
Author(s):  
P.S. Pa
Keyword(s):  
Electrochemical Etching ◽  
Removal Rate ◽  
Major Axis ◽  
Electrochemical Process ◽  
Production Costs ◽  
Light Transmittance ◽  
Color Filter ◽  
Electrode Tool ◽  
Effective Removal ◽  
Short Time

A newly designed ellipsoidal electrode tool used for micro-electrochemical etching (μ-ECE) in a precise reclamation process that removes defective In2O3SnO2 conductive microstructure from the surface of LCD color filters is presented. The electrochemical removal of ITO film eliminates the danger of scoring the surface of the substrate. The efficiency of the electrochemical process, enhanced by the ellipsoidal shaped electrode, also allows the feed rate of the workpiece (display color filter) to be higher and this reduces production costs. In the current study, a higher current rating and a faster workpiece feed effectively resulted in more effective removal. An ellipsoidal anode with a small major axis coupled with a narrow gap between the cathode and the workpiece also reduces the time taken to remove the In2O3SnO2. An ellipsoidal anode with small minor axis also provides better discharge mobility and removal. A thin cathode or one with a small arc radius also gives a higher removal rate for In2O3SnO2. The effective ellipsoidal anode provides more discharge mobility and removes the In2O3SnO2 easily and cleanly in a short time. The surface roughness, the average light transmittance and chromaticity of the three primary colors is also maintained at the same level after the μ-ECE process as it was before the removal of the ITO.

Precision Recycle Module for Digital-Paper Display Using Twins-Cylinder Tool

2010 ◽  
Vol 428-429 ◽  
pp. 387-390
Author(s):  
Pai Shan Pa
Keyword(s):  
Thin Film ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Feed Rate ◽  
Removal Rate ◽  
Small Diameter ◽  
Production Costs ◽  
High Rotational Speed ◽  
Digital Paper ◽  
Short Period

A new effective fabrication module was developed to mediate the problem of the low yield of Indium-tin-oxide (ITO) nanostructures deposition uses micro electroremoval technology and a design of twins-cylinder tool as a precision etching process to remove the defective Indium-tin-oxide (ITO) from the optical PET diaphragm surfaces of digital-paper displays. For the removal-process, a small gap width between the negative electrode and the workpiece (optical PET diaphragm) surface corresponds to a higher removal rate for the ITO. A small diameter of the anode or a small diameter of the cathode of the twins-cylinder tool provides large electric current density and takes less time for the same amount (20 nm) of ITO removal. High rotational speed of the twins-cylinder tool the discharge mobility and results in improving the removal effect. Providing enough electrical power can uses fast feed rate of the optical PET diaphragm combined with a fast removal rate for ITO. With increasing in current rating, pulsed direct current can improve the effect of dregs discharge and is advantageous to associate with the fast feed rate of the optical PET diaphragm. By establishing a recycling process using the ultra-precise removal of thin-film nanostructures, through the micro electroremoval and the twins-cylinder electrodes requires only a short period of time to remove the ITO thin-film easily and cleanly. The optoelectronic semiconductor industry can effectively recycle defective products, minimizing both production costs and pollution.

Nano Fabrication Technology of Selective Removal and Optical Assistance

2009 ◽  
Vol 79-82 ◽  
pp. 369-372
Author(s):  
Pai Shan Pa
Keyword(s):  
Thin Films ◽  
Complete Removal ◽  
Selective Removal ◽  
Production Costs ◽  
Color Filter ◽  
Nano Fabrication ◽  
Filter Surface ◽  
Removal Technology ◽  
Ito Thin Films ◽  
Color Filters

This study presents a new modus of selective removal technology and an excimer assistance on TFT-LCD above the five generation used to carry out the selective removal of nanostructures layers from optoelectronic flat panel displays’ color filter surface as well as the complete removal from the substrate of the ITO thin-films, RGB layer or resin BM layer. Displays’ color filters are produced using optoelectronic semiconductor fabrication techniques though the low yield during production can still be improved. Through the precise removal process of chemical etching and excimer assistance, the selective removals of different layers on top of color filter substrates will cut down the production costs. It can individually pick out and remove defective films or directly remove all films but the Cr layer or bare glass. Experimental results point out defective ITO thin-films, RGB layers, or resin BM layer can now be recycled with great precision. When the ITO proves difficult to remove, excimer-light can also be used to help with its removal. During the color filter recycle process the use of a 172nm excimer-light can remove stubborn film residues, effectively improving the quality of recycled color filters. This study offers a recovery module for defective diaplays’ color filters can be reused and fed back into the color filter production line, therefore provides many benefits in the industry of optoelectronic semiconductor.

Reclamation of Polymer PET Substrate Using T-Form Tool

2009 ◽  
Vol 626-627 ◽  
pp. 1-4
Author(s):  
Pai Shan Pa
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Feed Rate ◽  
Removal Rate ◽  
Etching Rate ◽  
High Rotational Speed ◽  
Small Thickness ◽  
Short Period ◽  
Gap Width ◽  
Pet Substrate

In the current study, a reclamation module uses micro electroetching as a precision fabrication with a new design of T-form tool to remove the defective Indium-tin-oxide (TCO) nanostructure from the optical PET surfaces of digital paper display is presented in current studies. The adopted precision reclamation process requires only a short period of time to remove the TCO nanostructure easily and cleanly is based on technical and economical considerations and is highly efficient. A large rotational diameter of the cathode accompanied by a small gap width between the cathode and the workpiece corresponds to a higher removal rate for the TCO nanostructure. A small thickness of the electrodes, or a small edge radius of the electrodes takes less time for the same amount of TCO removal. A higher feed rate of the optical PET diaphragm combines with enough electric power to drive fast etching rate. High rotational speed of the T-form tool can improve the effect of dregs discharge and is advantageous to associate with the fast feed rate of the workpiece (optical PET diaphragm).

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