Photoluminescence and Structural Properties of Si Nanoparticles Embedded in SiO2 Matrix by Reactive RF Magnetron Sputtering

2007 ◽  
Vol 336-338 ◽  
pp. 2074-2076
Author(s):  
K. Ma ◽  
Jia You Feng
Keyword(s):  
Magnetron Sputtering ◽  
Structural Properties ◽  
Near Infrared ◽  
Silicon Oxide ◽  
Rf Magnetron Sputtering ◽  
Sio2 Matrix ◽  
Si Nanoparticles ◽  
Oxide Matrix ◽  
Reactive Rf Magnetron Sputtering ◽  
Deposited Films

In the present work, we investigate the photoluminescence (PL) and structural properties of Si nanoparticles embedded in SiO2 matrix. Si-rich silicon oxide (SRSO) films with Si concentration of 39% were synthesized by reactive RF magnetron sputtering. Annealing was performed at temperatures between 600°C and 1100°C in N2 ambient for 2h to precipitate Si nanoparticles from oxide matrix. Near infrared photoluminescence around 750nm can be clearly observed even in the as-deposited films, which indicates the existence of Si nanoparticles in films. The structural properties were analyzed by infrared absorption and Raman spectra. It is found that the structural properties strongly affect the PL properties of Si nanoparticles embedded in SiO2 matrix.

Study of Structural Properties of N-Doped ZnO Thin Film Prepared by Reactive Gas-Timing RF Magnetron Sputtering

2015 ◽  
Vol 1131 ◽  
pp. 8-11 ◽  
Author(s):  
Thitikorn Boonkoom ◽  
Kittipong Tantisantisom ◽  
Jedsada Manyam
Keyword(s):  
Magnetron Sputtering ◽  
Structural Properties ◽  
Photoelectron Spectroscopy ◽  
Rf Magnetron Sputtering ◽  
X Ray ◽  
Structure Morphology ◽  
X Ray Absorption ◽  
Reactive Rf Magnetron Sputtering ◽  
Deposited Films ◽  
Reactive Gas

We examined structural properties of nitrogen doped (ZnO:N) thin films prepared by reactive RF magnetron sputtering technique in conjunction with gas timing method. The deposited films were polycrystalline ZnO in wurtzite structure. Morphology of the ZnO:N films could be modified by adjusting gas timing conditions. The x-ray photoelectron spectroscopy (XPS) and extended x-ray absorption fine structure (EXAFS) analysis showed that incorporation of nitrogen may cause structural distortion in the ZnO:N crystal.

Structural Properties of Amorphous Carbon Nitride Films Prepared by Reactive RF-Magnetron Sputtering

1993 ◽  
Vol 32 (Part 2, No. 10A) ◽  
pp. L1465-L1468 ◽  
Author(s):  
Noriaki Nakayama ◽  
Yasuaki Tsuchiya ◽  
Satoru Tamada ◽  
Kouji Kosuge ◽  
Shinji Nagata ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Structural Properties ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Rf Magnetron Sputtering ◽  
Amorphous Carbon Nitride ◽  
Reactive Rf Magnetron Sputtering
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