Structures and Dielectric Properties of (Pb, La)(Zr, Ti)O3 Antiferroelectric Thick Films Prepared by Different Sintering Procedures

2012 ◽  
Vol 503 ◽  
pp. 375-380 ◽  
Author(s):  
Wen Ping Geng ◽  
Xiu Jian Chou ◽  
Yong Bo Lv ◽  
Ji Jun Xiong ◽  
Wen Dong Zhang

(Pb,La)(Zr,Ti)O3antiferroelectric thick films were prepared on Pt (111)/ Ti/SiO2/Si (100) substrates by a sol-gel process. The effects of single annealing and multistep annealing on the structures and electric properties of the films were investigated. The crystal orientation and structure of the antiferroelectric thick films were studied. The thick films by multistep annealing have higher (100)-preferred orientation than them by single annealing. The surface of the films was more smooth, compact and uniform by single annealing. The antiferroelectric nature of the (Pb,La)(Zr,Ti)O3antiferroelectric thick films by various sintering procedures was demonstrated by P(polarization)-E(electric field) and C(capactitance)-E(electric field). The temperature dependent of the dielectric constant and loss was measured under the frequency 1, 10, and 100 kHz and comparing with traditional signal annealing, the films have phase transition from antiferroelectric state to paraelectric state by multistep annealing.

2012 ◽  
Vol 503 ◽  
pp. 97-102 ◽  
Author(s):  
Xiu Jian Chou ◽  
Miao Xuan Du ◽  
Yong Bo Lv ◽  
Jun Liu ◽  
Wen Dong Zhang

Pb0.97La0.02(Zr0.95Ti0.05)O3 antiferroelectric thick films were prepared on platinized silicon substrates by sol–gel methods. Films showed polycrystalline perovskite structure with a strong (100) preferred orientation. The antiferroelectric nature of the films was confirmed by the double hysteresis behaviors versus applied field. The temperature dependence of dielectric constant and loss displayed the Curie temperature was 225oC.The current caused by the polarization and depolarization of polar was detected at coupling application of electric field and temperature. The phase transition characterization could be effectively adjusted by electric field and temperature.


2011 ◽  
Vol 287-290 ◽  
pp. 2460-2463
Author(s):  
Wen Ping Geng ◽  
Xiu Jian Chou ◽  
Ya Ting Zhang ◽  
Mao Xiang Guo ◽  
Jun Liu

Pb0.97La0.02Zr0.95Ti0.05O3(PLZT) antiferroelectric thin films were prepared on Pt (111)/ Ti/SiO2/Si (100) substrates by a sol-gel process. The influences of annealing temperature on the structures and dielectric properties of the PLZT antiferroelectric thin films were investigated. And the phase structure and crystal orientation were studied by X-ray diffraction analyses (XRD). The antiferroelectric characterization of the PLZT thin films annealed at different temperature was demonstrated by P(polarization)-E(electric field) and C(capactitance)-E(electric field) curves. The maximum polarizations for the films annealed at 650°C, 700°C and 750°C were 35μC/cm2, 42μC/cm2and 47μC/cm2, respectively. The temperature dependent of the dielectric constant and loss was measured under the frequency 1, 10, 100 and 1000 kHz. The films annealed at 700°C have high (100)-preferred orientation and excellent dielectric properties.


2011 ◽  
Vol 80-81 ◽  
pp. 13-17 ◽  
Author(s):  
Yu Hua Yang ◽  
Zhen Yu Zhao ◽  
Xin Feng Guan ◽  
Xiu Jian Chou

(Pb, La) (Zr, Ti)O3 (PLZT) antiferroelectric thick films were deposited on Pt (111)/ Ti/SiO2/Si (100) substrates via sol-gel process. X-ray diffraction (XRD) analysis indicated that the films derived on Pt (111)/ Ti/SiO2/Si (100) substrates showed strong (111) preferred orientation. The Bulk and Surface silicon of micromachining process were employed in the silicon-based antiferroelectric thick film microcantilever fabrication, such as wet chemical etching for PLZT, inductive couple plasmas (ICP)for silicon etching, platinum etching and so on. Challenges such as Pt/Ti bottom electrode and morphology of PLZT thick film were solved, the integration of functional antiferroelectric materials and MEMS technology, provide a new way of thinking for the design and manufacture of micro-actuators.


2017 ◽  
Vol 181 ◽  
pp. 1-7 ◽  
Author(s):  
F. Belkhiria ◽  
F.I.H. Rhouma ◽  
S. Hcini ◽  
M. Daoudi ◽  
H. Gammoudi ◽  
...  

2013 ◽  
Vol 737 ◽  
pp. 74-79
Author(s):  
Annisa Aprilia ◽  
Priastuti Wulandari ◽  
Rahmat Hidayat

Aluminum doped Zinc Oxide (AZO) layer has been employed as electron acceptor in hybrid solar cell based on Poly(3-hexylthiophene) with inverted structure. AZO layers used in this work were prepared by sol-gel process using two different solvents, namely methanol and methoxyethanol. From X-ray diffraction measurements, AZO layer prepared using methanol solvent (AZO-me) indicates the formation of crystallines with the same (002) orientation, whereas AZO layer prepared using methoxyethanol (AZO-mx) indicates the formation of crystallines with (100), (002), and (101) orientations. The nanomorphology of those AZO layer surfaces was also remarkably different, which might be related to differences in crystal orientation. For both solvents, the photocurrent density-voltage (J-V) characteristics were also affected by the Al ion concentration in AZO layer. However, solar cell with AZO-mx shows better performances in comparison to that of AZO-me with the same Al ion concentration. The observation of performance variations in those fabricated solar cells are suggested to be strongly related with the crystal orientation and nanomorphology of AZO layer. These experimental results then suggest that charge carrier dissociation by AZO layer are significantly influenced by the crystal orientation and nanomorphology of AZO layer, which are affected by the solvent used for preparing the AZO layer.


2001 ◽  
Vol 260 (1) ◽  
pp. 231-236 ◽  
Author(s):  
Qifa Zhou ◽  
Qingqi Zhang ◽  
Helen Lai Wah Chan ◽  
Chung Loong Choy

CrystEngComm ◽  
2015 ◽  
Vol 17 (45) ◽  
pp. 8664-8670 ◽  
Author(s):  
Wenhui He ◽  
Qiang Li ◽  
Nengneng Luo ◽  
Yiling Zhang ◽  
Qingfeng Yan

Temperature-dependent domain configurations were studied for both unpoled and poled [110]C-oriented 0.63Pb(Mg1/3Nb2/3)O3–0.37PbTiO3 (PMN–0.37PT) single crystals by polarized light microscopy (PLM).


2016 ◽  
Vol 75 ◽  
pp. 167-171 ◽  
Author(s):  
Zhongqiang Hu ◽  
Beihai Ma ◽  
Meiya Li ◽  
Rachel E. Koritala ◽  
Uthamalingam Balachandran

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