Internal Stress Tensor Determination in Molybdenum and Molybdenum-Carbon Thin Films Deposited by D.C. Magnetron Sputtering

1993 ◽  
Vol 133-136 ◽  
pp. 873-878
Author(s):  
Patrice Gergaud ◽  
J.J. Bacmann
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Internal Stress ◽  
Stress Tensor ◽  
Carbon Thin Films

Tribological properties of amorphous carbon thin films grown by magnetron sputtering method

2004 ◽  
Vol 180-181 ◽  
pp. 218-221 ◽  
Author(s):  
Yong Seob Park ◽  
Hyun Sik Myung ◽  
Jeon Geon Han ◽  
Byungyou Hong
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
Tribological Properties ◽  
Carbon Thin Films

Hydrogen-free carbon thin films prepared by unbalanced magnetron sputtering

2006 ◽  
Author(s):  
Junqi Xu ◽  
Lingxia Hang ◽  
Weiguo Liu ◽  
Huiqing Fan ◽  
Yingxue Xing
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Free Carbon ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Carbon Thin Films

Production and Characterization of Carbon Thin Films by the Magnetron Sputtering Technique

2016 ◽  
Vol 881 ◽  
pp. 471-474 ◽  
Author(s):  
D.L.C. Silva ◽  
L.R.P Kassab ◽  
J.R. Martinelli ◽  
A.D. Santos ◽  
M.F. Pillis
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Magnetron Sputtering ◽  
Carbon Film ◽  
Carbon Films ◽  
Buffer Layers ◽  
Degree Of Crystallinity ◽  
X Ray Diffraction ◽  
Carbon Thin Films

Carbon thin films were produced by the magnetron sputtering technique. The deposition of the carbon films was performed on Co buffer-layers previously deposited on c-plane (0001) sapphire substrates. The samples were thermally treated under vacuum conditions and characterized by Raman spectroscopy, scanning electron microscopy (SEM) and X-ray diffraction (XRD). The XRD peak related to the carbon film was observed and the Raman spectroscopy indicated a good degree of crystallinity of the carbon film.

Internal stress reduction by nitrogen incorporation in hard amorphous carbon thin films

1992 ◽  
Vol 60 (26) ◽  
pp. 3229-3231 ◽  
Author(s):  
D. F. Franceschini ◽  
C. A. Achete ◽  
F. L. Freire
Keyword(s):  
Thin Films ◽  
Internal Stress ◽  
Amorphous Carbon ◽  
Stress Reduction ◽  
Nitrogen Incorporation ◽  
Carbon Thin Films
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