A UHV Study of Ni/SiC Schottky Barrier and Ohmic Contact Formation

2000 ◽  
Vol 338-342 ◽  
pp. 1025-1028 ◽  
Author(s):  
A. Kestle ◽  
S.P. Wilks ◽  
P.R. Dunstan ◽  
M. Pritchard ◽  
G. Pope ◽  
...  
2000 ◽  
Vol 622 ◽  
Author(s):  
Dae-Woo Kim ◽  
Joon Cheol Bae ◽  
Woo Jin Kim ◽  
Hong Koo Baik ◽  
Chong Cook Kim ◽  
...  

ABSTRACTWe have investigated surface treatment effect on the interfacial reaction of Pd/p-GaN interface and also room temperature ohmic contact formation mechanism of Pd-based ohmic contact. In order to examine room temperature ohmic behavior, various metal contact systems were deposited and current-voltage measurements were carried out. In spite of large theoretical Schottky barrier height between Pd and p-GaN, Pd-based contact showed perfect ohmic characteristic even before annealing. According to the results of synchrotron X-ray radiation, the closed-packed atomic planes (111) of the Pd film were quite well ordered in surface normal direction as well as in the in-plane direction. The effective Schottky barrier height of Au/Pd/Mg/Pd/p-GaN was 0.47eV, which was estimated by Norde method. This discrepancy between theoretical barrier height and the measured one might be due to the epitaxial growth of Pd contact metal and so the room-temperature ohmic characteristic of Pd-based ohmic contact was related strongly to the in-plane epitaxial quality of metal on p-GaN.


2014 ◽  
Vol 105 (19) ◽  
pp. 192103 ◽  
Author(s):  
Hanhui Liu ◽  
Peng Wang ◽  
Dongfeng Qi ◽  
Xin Li ◽  
Xiang Han ◽  
...  

2008 ◽  
Vol 41 (17) ◽  
pp. 175105
Author(s):  
Yow-Jon Lin ◽  
Feng-Tso Chien ◽  
Ching-Ting Lee ◽  
Chi-Shin Lin ◽  
Yang-Chun Liu

2001 ◽  
Author(s):  
Sarunas Meskinis ◽  
Kestutis Slapikas ◽  
R. Gudaitis

2000 ◽  
Vol 338-342 ◽  
pp. 1619-1619
Author(s):  
L.S. Tan ◽  
A. Raman ◽  
K.M. Ng ◽  
S.J. Chua ◽  
A.T.S. Wee ◽  
...  

“removed due to double publication”. The original paper: Journal: Semiconductor Science and Technology Create an alertIssue Volume 15, Number 6 Citation: L S Tan et al 2000 Semicond. Sci. Technol. 15 585 doi: 10.1088/0268-1242/15/6/317 can be accesses at IOP: http://iopscience.iop.org/0268-1242/15/6/317


2017 ◽  
Vol 215 (9) ◽  
pp. 1700516
Author(s):  
Ievgen Boturchuk ◽  
Leopold Scheffler ◽  
Arne Nylandsted Larsen ◽  
Brian Julsgaard

2003 ◽  
Vol 82 (5) ◽  
pp. 736-738 ◽  
Author(s):  
H. Tang ◽  
J. A. Bardwell ◽  
J. B. Webb ◽  
S. Rolfe ◽  
Y. Liu ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document