Growth of Large Diameter SiC Crystals by Advanced Physical Vapor Transport
2005 ◽
Vol 483-485
◽
pp. 9-12
◽
Keyword(s):
Semi-insulating 6H SiC substrates, 2”, 3” and 100mm in diameter, and n+ 4H SiC substrates, 2” and 3” in diameter, are grown at II-VI using the Advanced Physical Vapor Transport (APVT) technique [1]. The process utilizes high-purity SiC source and employs special measures aimed at the reduction of background contamination. Semi-insulating properties are achieved by precise vanadium compensation, which yields substrates with stable and uniform electrical resistivity reaching ~ 1011 Ω-cm and higher. Conductive n+ 4H SiC crystals with the spatially uniform resistivity of 0.02 W-cm are grown using nitrogen doping. Crystal quality of the substrates, their electrical properties and low temperature photoluminescence are discussed.
2011 ◽
Vol 679-680
◽
pp. 169-172
2013 ◽
Vol 740-742
◽
pp. 11-14
Keyword(s):
2005 ◽
Vol 72
(2-3)
◽
pp. 254-257
◽
Keyword(s):
2008 ◽
Vol 21
(3)
◽
pp. 222-226
2016 ◽
Vol 858
◽
pp. 5-10
◽