Post-CMP Cleaners for Tungsten Advanced Nodes: 10nm and 7nm

2018 ◽  
Vol 282 ◽  
pp. 278-283
Author(s):  
Ruben R. Lieten ◽  
Daniela White ◽  
Thomas Parson ◽  
Michael White
Keyword(s):  
Contact Angle ◽  
Hydrogen Bonding ◽  
Surface Energy ◽  
Surface Characterization ◽  
Dielectric Breakdown ◽  
Chemical Mechanical Planarization ◽  
Organic Residue ◽  
Polishing Process ◽  
Chemical Corrosion ◽  
Abrasive Particles

Chemical Mechanical Planarization (CMP) is a key process for IC manufacturers. Tungsten (W) is an important material for connecting logic elements and for connecting memory elements, thanks to its excellent planarization, filling, mechanical and electromigration properties. W slurries are developed to remove high amounts of W via an abrasive, in conjunction with an oxidizer. After the polishing process, the planarized surface is contaminated with abrasive particles, organic residue, pad debris and metal cations through covalent or hydrogen-bonding, electrostatic and Van der Waals attractions. Post-CMP cleaning is required to remove all these contaminants while exhibiting low galvanic and chemical corrosion. Formulated cleans are needed to meet all these requirements. The performance of formulated W/TiN post-CMP cleaners for N10 and N7 has been evaluated. The newly developed formulations show a factor 4 reduction in metal surface contamination (from ~2 x 1012atoms/cm2to ~ 5 x 1011atoms/cm2), which is important to prevent dielectric breakdown. Very low particulate and organic residue defectivity was additionally confirmed by different surface characterization techniques: XPS, FTIR, contact angle/surface energy.

scholarly journals Contact Angle Measurement for The Surface Characterization of Solids

2011 ◽  
Vol 2 ◽  
pp. 1-4 ◽  
Author(s):  
D. P. Subedi
Keyword(s):  
Contact Angle ◽  
Surface Energy ◽  
Surface Characterization ◽  
Contact Angle Measurement ◽  
Angle Measurement ◽  
Liquid Model ◽  
Convenient Approach ◽  
Young's Equation

This paper reports a description of the theory of contact angle measurement and its use for the determination of surface energy of solids. The main objective of the work is to present a convenient approach to explain wetting phenomenon using contact angle theory. A brief review of Young’s equation and Young- Dupre equation is also presented followed by an extended Fowke’s equation widely used for the calculation of surface energy of solids. The two liquid model has been applied to determine the surface energy of polycarbonate and low density polyethylene.Key words: Contact angle; Surface energy; Surface characterization; Wettability; Young’s equation; Fowke’s modelThe Himalayan Physics Vol.2, No.2, May, 2011Page:1-4Uploaded Date: 31 July, 2011

Thermal Investigation of a Honing Process Utilizing Polyborosiloxane Impregnated with Abrasive Particles

1996 ◽  
Vol 210 (1) ◽  
pp. 43-50
Author(s):  
A Fioravanti ◽  
A J Fletcher
Keyword(s):  
Thermal Effects ◽  
Complex Geometry ◽  
Target Surface ◽  
Polishing Process ◽  
Complete Coverage ◽  
Component System ◽  
Abrasive Particles ◽  
Temperature Distributions ◽  
Particulate Form ◽  
Multi Component System

A novel honing and polishing process utilizes polyborosiloxane impregnated with a range of abrasives in particulate form, to polish mould cavities of complex geometry. The polymer, which deforms in such a way as to allow complete coverage of the target surface, is used to carry the abrasive. This compound is agitated using an ultrasonic source and is made to flow relative to the target surface. The process causes heating of the various components in the system. This is the second paper concerned with the prediction of the resultant temperature distributions. The work reported here is an extension of the previous work to take into account the complex geometry of the multi-component system used in the operation. Furthermore, the development of the honing process required the introduction of flow of polishing compound relative to the workpiece. As a result the previous work has been extended to take into account the thermal effects of this flow. The modelling work has been complemented by measurement of temperatures in a geometry that is representative of the processing requirements. The calculated and measured results have been compared and the model validated accordingly.

Material Removal and Application by Chemical Impact Reaction in Nano-Abrasive Jet Polishing

2013 ◽  
Vol 631-632 ◽  
pp. 550-555
Author(s):  
Wen Qiang Peng ◽  
Sheng Yi Li ◽  
Chao Liang Guan ◽  
Xin Min Shen
Keyword(s):  
Material Removal ◽  
Abrasive Particle ◽  
Precision Machining ◽  
Optical Surface ◽  
Polishing Process ◽  
Abrasive Particles ◽  
Mechanical Process ◽  
Abrasive Jet Polishing ◽  
Ultra Precision ◽  
Machining Properties

Material removed by mechanical process inevitably causes surface or subsurface damage containing cracks, plastic scratch, residual stress or dislocations. In nano-abrasive jet polishing (NAJP) the material is removed by chemical impact reaction. The chemical impact reaction is validated by contrast experiment with traditional lap polishing process in which the material is mainly removed through mechanical process. Experiment results show the dependence of the abrasive particles on the choice of materials. Even if the abrasive particle and the workpiece are composed of similar components, the machining properties are remarkably different due to slight differences in their physical properties or crystallography etc. Plastic scratches on the sample which was polished by the traditional mechanical process are completely removed by NAJP process, and the surface root-square-mean roughness has decreased from 1.403nm to 0.611nm. The NAJP process will become a promising method for ultra precision machining method for ultrasmooth optical surface.

Comparative Study of Surface Energies of Native Oxides of Si(100) and Si(111) via Three Liquid Contact Angle Analysis

MRS Advances ◽  
2018 ◽  
Vol 3 (57-58) ◽  
pp. 3379-3390 ◽  
Author(s):  
Saaketh R. Narayan ◽  
Jack M. Day ◽  
Harshini L. Thinakaran ◽  
Nicole Herbots ◽  
Michelle E. Bertram ◽  
...  
Keyword(s):  
Contact Angle ◽  
Surface Energy ◽  
Sessile Drop ◽  
Surface Composition ◽  
Ion Beam ◽  
Contact Angles ◽  
Van Der Waals Interactions ◽  
Native Oxides ◽  
Relative Errors ◽  
Contact Angle Analysis

ABSTRACTThe effects of crystal orientation and doping on the surface energy, γT, of native oxides of Si(100) and Si(111) are measured via Three Liquid Contact Angle Analysis (3LCAA) to extract γT, while Ion Beam Analysis (IBA) is used to detect Oxygen. During 3LCAA, contact angles for three liquids are measured with photographs via the “Drop and Reflection Operative Program (DROP™). DROP™ removes subjectivity in image analysis, and yields reproducible contact angles within < ±1°. Unlike to the Sessile Drop Method, DROP can yield relative errors < 3% on sets of 20-30 drops. Native oxides on 5 x 1013 B/cm3 p- doped Si(100) wafers, as received in sealed, 25 wafer teflon boats continuously stored in Class 100/ISO 5 conditions at 24.5°C in 25% controlled humidity, are found to be hydrophilic. Their γT, 52.5 ± 1.5 mJ/m2, is reproducible between four boats from three sources, and 9% greater than γT of native oxides on n- doped Si(111), which averages 48.1 ± 1.6 mJ/m2 on four 4” Si(111) wafers. IBA combining 16O nuclear resonance with channeling detects 30% more oxygen on native oxides of Si(111) than Si(100). While γT should increase on thinner, more defective oxides, Lifshitz-Van der Waals interactions γLW on native oxides of Si(100) remain at 36 ± 0.4 mJ/m2, equal to γLW on Si(111), 36 ± 0.6 mJ/m2, since γLW arises from the same SiO2 molecules. Native oxides on 4.5 x 1018 B/cm3 p+ doped Si(100) yield a γT of 39 ± 1 mJ/m2, as they are thicker per IBA. In summary, 3LCAA and IBA can detect reproducibly and accurately, within a few %, changes in the surface energy of native oxides due to thickness and surface composition arising from doping or crystal structure, if conducted in well controlled clean room conditions for measurements and storage.

Addition of Cellulose Nanofibers to Control Surface Roughness for Hydrophobic Ceramic Coatings

2021 ◽  
Vol 21 (8) ◽  
pp. 4492-4497
Author(s):  
Eun Ae Shin ◽  
Gye Hyeon Kim ◽  
Jeyoung Jung ◽  
Sang Bong Lee ◽  
Chang Kee Lee
Keyword(s):  
Surface Roughness ◽  
Contact Angle ◽  
Surface Energy ◽  
Water Contact Angle ◽  
Ceramic Coating ◽  
Cellulose Nanofibers ◽  
Ceramic Coatings ◽  
Coating Material ◽  
Textured Surface ◽  
Water Contact

Hydrophobic ceramic coatings are used for a variety of applications. Generally, hydrophobic coating surfaces are obtained by reducing the surface energy of the coating material or by forming a highly textured surface. Reducing the surface energy of the coating material requires additional costs and processing and changes the surface properties of the ceramic coating. In this study, we introduce a simple method to improve the hydrophobicity of ceramic coatings by implementing a textured surface without chemical modification of the surface. The ceramic coating solution was first prepared by adding cellulose nanofibers (CNFs) and then applied to a polypropylene (PP) substrate. The surface roughness increased as the amount of added CNFs increased, increasing the water contact angle of the surface. When the amount of CNFs added was corresponding to 10% of the solid content, the surface roughness average of the area was 43.8 μm. This is an increase of approximately 140% from 3.1 μm (the value of the surface roughness of the surface without added CNFs). In addition, the water contact angle of the coating with added CNF increased to 145.0°, which was 46% higher than that without the CNFs. The hydrophobicity of ceramic coatings with added CNFs was better because of changes in the surface topography. After coating and drying, the CNFs randomly accumulated inside the ceramic coating layer, forming a textured surface. Thus, hydrophobicity was improved by implementing a rugged ceramic surface without revealing the surface of the CNFs inside the ceramic layer.

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