scholarly journals The On-Line Measurement Technique of Fe Grade on the Belt by RI Back Scattering Method

FLOTATION ◽  
1972 ◽  
Vol 1972 (46) ◽  
pp. 1-3
Author(s):  
Hiromu FUSHIMI
Keyword(s):  
Measurement Technique ◽  
Scattering Method ◽  
Line Measurement ◽  
Back Scattering ◽  
On Line

The Experimental Study on Detection of Dust Concentration by Back Scattering Method

2013 ◽  
Vol 753-755 ◽  
pp. 2400-2403 ◽  
Author(s):  
Xu Yi Deng ◽  
Xiao Chang Ni ◽  
Bin Wang ◽  
Tong Li ◽  
Zhen Ming Song
Keyword(s):  
Modulation Frequency ◽  
Dust Concentration ◽  
Scattering Method ◽  
Time Data ◽  
Detection Range ◽  
Scattering Angle ◽  
Flue Dust ◽  
Line Measurement ◽  
Chopper Modulation ◽  
On Line

The result of the experiment using Labview real-time data acquisition and analysis, and considered the backward scattering Angle, detection range, chopper modulation frequency and test factors, thus draws the dust concentration and the relationship between the voltage detection. The results show that the modulation frequency up to 145 HZ, backward scattering Angle as close to ,the detection range as far as possible close to the flue, dust concentration and detection voltage can better meet the linear relationship for the future, it improves industrial smoke concentration on-line measurement provides a basis for the application.

An On-Line Measurement Technique for Machine Volumetric Error Compensation

1993 ◽  
Vol 115 (1) ◽  
pp. 85-92 ◽  
Author(s):  
J. Ni ◽  
S. M. Wu
Keyword(s):  
Measurement Technique ◽  
Error Compensation ◽  
Experimental Tests ◽  
Geometric Error ◽  
Degree Of Freedom ◽  
Volumetric Error ◽  
Measurement Systems ◽  
Line Measurement ◽  
Maximum Range ◽  
On Line

A hybrid on-line and off-line measurement technique is developed for machine volumetric error compensation based on a multiple-degree-of-freedom laser optical system. When implemented on a 3-axis machine up to 15 geometric error components can be measured simultaneously on-line and the remaining 6 components need to be calibrated off-line. Since the on-line measurement systems use different metrology bases, a modified volumetric error model is derived for a milling machine by considering the measurement features of the multiple-degree-of-freedom system. Through experimental tests, it was found that the discrepancy between the identified errors and the actual errors was less than 4 μm out of a maximum range of 20 μm.

Raman spectroscopy as an on-line measurement technique in a laser-CVD reactor during production of Si3N4

1996 ◽  
Vol 27 ◽  
pp. S295-S296
Author(s):  
I.L. Tuinman ◽  
J. Veenstra ◽  
J.C.M. Marijnissen ◽  
B. Scarlett ◽  
J. Schoonman
Keyword(s):  
Raman Spectroscopy ◽  
Measurement Technique ◽  
Line Measurement ◽  
On Line ◽  
Laser Cvd

Thickness Measurement in the AEM by Macintosh-Based Analysis of Two-Beam Convergent Beam Patterns

1990 ◽  
Vol 48 (2) ◽  
pp. 504-505
Author(s):  
John F. Mansfield ◽  
Douglas C. Crawford
Keyword(s):  
Electron Microscope ◽  
Video Camera ◽  
Thickness Measurement ◽  
Specimen Thickness ◽  
Crystalline Materials ◽  
Beam Dynamic ◽  
Line Measurement ◽  
On Line ◽  
Image Position ◽  
Convergent Beam

A method has been developed that allows on-line measurement of the thickness of crystalline materials in the analytical electron microscope. Two-beam convergent beam electron diffraction (CBED) patterns are digitized from a JEOL 2000FX electron microscope into an Apple Macintosh II microcomputer via a Gatan #673 CCD Video Camera and an Imaging Systems Technology Video 1000 frame-capture board. It is necessary to know the lattice parameters of the sample since measurements are made of the spacing of the diffraction discs in order to calibrate the pattern. The sample thickness is calculated from measurements of the spacings of the fringes that are seen in the diffraction discs. This technique was pioneered by Kelly et al, who used the two-beam dynamic theory of MacGillavry relate the deviation parameter (Si) of the ith fringe from the exact Bragg condition to the specimen thickness (t) with the equation:Where ξg, is the extinction distance for that reflection and ni is an integer.

Control Strategies for a Highly Loaded Biological Ammonia Elimination Process

1993 ◽  
Vol 28 (11-12) ◽  
pp. 531-538 ◽  
Author(s):  
B. Teichgräber
Keyword(s):  
Closed Loop ◽  
Control Strategies ◽  
Level Control ◽  
Sludge Dewatering ◽  
Loop Control ◽  
Reject Water ◽  
Line Measurement ◽  
Control Pattern ◽  
On Line ◽  
Treatment Facilities

A nitrification/denitrification process was applied to reject water treatment from sludge dewatering at Bottrop central sludge treatment facilities of the Emschergenossenschaft. On-line monitoring of influent and effluent turbidity, closed loop control of DO and pH, and on-line monitoring of nitrogen compounds were combined to a three level control pattern. Though on-line measurement of substrate and product showed substantial response time it could be used to operate nitrification/denitrification within process boundaries.

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