Structural and Optical Characterization of Thermally Oxidized Titanium Thin Films Prepared by Ion Beam-assisted Deposition (IBAD) Technique

2021 ◽  
Vol 14 (2) ◽  
pp. 101-109
Keyword(s):  
Thin Films ◽  
Annealing Temperature ◽  
Ion Beam ◽  
Visible Spectrum ◽  
Film Structure ◽  
Thin Layers ◽  
Tio2 Thin Films ◽  
Structure Transition ◽  
Ion Beam Assisted Deposition ◽  
Titanium Thin Films

Abstract: Titanium oxide (TiO2) thin films have been grown by thermal oxidation of sputtered Titanium (Ti) thin layers using ion beam-assisted deposition (IBAD). X-ray diffraction showed that prior to oxidation, the films are composed of hexagonal crystallites of Ti. After oxidation, a film structure transition occurs from monoclinic β-TiO2 type to tetragonal anatase type as the annealing temperature of Ti layer is increased from 250 °C to 550 °C. The film thickness was about 230 nm. Visualization and scanning by atomic force microscope (AFM) revealed a low roughness of the samples, which increases when the annealing temperature is increased. The optical transmittances of the films in the visible spectrum were in the range of 85-95%. The values of optical band gap have been estimated to be 3.43 eV and 3.61 eV, for thin films annealed at 250°C and 550°C, respectively. Keywords: TiO2 thin film, IBAD, XRD, structural and optical properties.

Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

2016 ◽  
Vol 185 ◽  
pp. 295-298 ◽  
Author(s):  
Lin-Ao Zhang ◽  
Hao-Nan Liu ◽  
Xiao-Xia Suo ◽  
Shuo Tong ◽  
Ying-Lan Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition

scholarly journals Emergence and Evolution of Crystallization in TiO2 Thin Films: A Structural and Morphological Study

Nanomaterials ◽  
2021 ◽  
Vol 11 (6) ◽  
pp. 1409
Author(s):  
Ofelia Durante ◽  
Cinzia Di Giorgio ◽  
Veronica Granata ◽  
Joshua Neilson ◽  
Rosalba Fittipaldi ◽  
...  
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Transition Metal Oxides ◽  
Annealing Temperature ◽  
Morphological Properties ◽  
Degree Of Crystallinity ◽  
Tio2 Thin Films ◽  
Force Microscopy ◽  
Heat Treated ◽  
Complementary Techniques

Among all transition metal oxides, titanium dioxide (TiO2) is one of the most intensively investigated materials due to its large range of applications, both in the amorphous and crystalline forms. We have produced amorphous TiO2 thin films by means of room temperature ion-plasma assisted e-beam deposition, and we have heat-treated the samples to study the onset of crystallization. Herein, we have detailed the earliest stage and the evolution of crystallization, as a function of both the annealing temperature, in the range 250–1000 °C, and the TiO2 thickness, varying between 5 and 200 nm. We have explored the structural and morphological properties of the as grown and heat-treated samples with Atomic Force Microscopy, Scanning Electron Microscopy, X-ray Diffractometry, and Raman spectroscopy. We have observed an increasing crystallization onset temperature as the film thickness is reduced, as well as remarkable differences in the crystallization evolution, depending on the film thickness. Moreover, we have shown a strong cross-talking among the complementary techniques used displaying that also surface imaging can provide distinctive information on material crystallization. Finally, we have also explored the phonon lifetime as a function of the TiO2 thickness and annealing temperature, both ultimately affecting the degree of crystallinity.

Optical and electrical properties of p-type zinc oxide thin films synthesized by ion beam assisted deposition

2005 ◽  
Vol 492 (1-2) ◽  
pp. 203-206 ◽  
Author(s):  
Zhi Yan ◽  
Zhi Tang Song ◽  
Wei Li Liu ◽  
Qing Wan ◽  
Fu Min Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Electrical Properties ◽  
Ion Beam ◽  
Optical And Electrical Properties ◽  
Oxide Thin Films ◽  
Ion Beam Assisted Deposition ◽  
P Type

TiO2 thin films – Influence of annealing temperature on structural, optical and photocatalytic properties

Solar Energy ◽  
2009 ◽  
Vol 83 (9) ◽  
pp. 1499-1508 ◽  
Author(s):  
N.R. Mathews ◽  
Erik R. Morales ◽  
M.A. Cortés-Jacome ◽  
J.A. Toledo Antonio
Keyword(s):  
Thin Films ◽  
Annealing Temperature ◽  
Photocatalytic Properties ◽  
Tio2 Thin Films

Effect of Annealing on Structural and Optical Properties of Pulsed Laser Deposited Titanium Dioxide Thin Films

2009 ◽  
Vol 67 ◽  
pp. 65-70 ◽  
Author(s):  
Gaurav Shukla ◽  
Alika K. Khare
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Annealing Temperature ◽  
Ambient Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Tio2 Thin Films ◽  
Post Annealing ◽  
Post Annealing Temperature

TiO2 is a widely studied material for many important applications in areas such as environmental purification, photocatalyst, gas sensors, cancer therapy and high effect solar cell. However, investigations demonstrated that the properties and applications of titanium oxide films depend upon the nature of the crystalline phases present in the films, i.e. anatase and rutile phases. We report on the pulsed laser deposition of high quality TiO2 thin films. Pulsed Laser deposition of TiO2 thin films were performed in different ambient viz. oxygen, argon and vacuum, using a second harmonic of Nd:YAG laser of 6 ns pulse width. These deposited films of TiO2 were further annealed for 5hrs in air at different temperatures. TiO2 thin films were characterized using x-ray diffraction, SEM, photoluminescence, transmittance and reflectance. We observed effect of annealing over structural, morphological and optical properties of TiO2 thin films. The anatase phase of as-deposited TiO2 thin films is found to change into rutile phase with increased annealing temperature. Increase in crystalline behaviour of thin films with post-annealing temperature is also observed. Surface morphology of TiO2 thin films is dependent upon ambient pressure and post- annealing temperature. TiO2 thin films are found to be optically transparent with very low reflectivity hence will be suitable for antireflection coating applications.

Mössbauer spectroscopic study of iron–nickel nitrides thin films prepared by ion beam assisted deposition

2011 ◽  
Vol 202 (1-3) ◽  
pp. 47-55
Author(s):  
P. Prieto ◽  
M. Monti ◽  
J. de la Figuera ◽  
J. M. Sanz ◽  
J. F. Marco
Keyword(s):  
Thin Films ◽  
Spectroscopic Study ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition ◽  
Iron Nickel

Structures and properties of copper thin films prepared by ion beam assisted deposition

1996 ◽  
Vol 288 (1-2) ◽  
pp. 300-308 ◽  
Author(s):  
Y. Gotoh ◽  
H. Yoshii ◽  
T. Amioka ◽  
K. Kameyama ◽  
H. Tsuji ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition ◽  
Structures And Properties
Sign in / Sign up

Export Citation Format

Share Document