scholarly journals Interface Combinatorial Pulsed Laser Deposition to Enhance Heterostructures Functional Properties

2020 ◽  
Author(s):  
Jérôme Wolfman ◽  
Beatrice Negulescu ◽  
Antoine Ruyter ◽  
Ndioba Niang ◽  
Nazir Jaber
Keyword(s):  
Pulsed Laser Deposition ◽  
Functional Properties ◽  
Film Growth ◽  
Pulsed Laser ◽  
Complex Oxide ◽  
Laser Deposition ◽  
Layer By Layer ◽  
Interface Magnetism ◽  
Tunable Capacitors

In this chapter we will describe a new development of combinatorial pulsed laser deposition (CPLD) which targets the exploration of interface libraries. The idea is to modulate continuously the composition of interfaces on a few atomic layers in order to alter their functional properties. This unique combinatorial synthesis of interfaces is possible due to very specific PLD characteristics. The first one is its well-known ability for complex oxide stoichiometry transfer from the target to the film. The second one is the layer by layer control of thin film growth at the atomic level using in-situ RHEED characterization. The third one relates to the directionality of the ablated plume which allows for selective area deposition on the substrate using a mobile shadow-mask. However PLD also has some limitations and important PLD aspects to be considered for reliable CPLD are reviewed. Multiple examples regarding the control of interface magnetism in magnetic tunnel junctions and energy band and Schottky barrier height tuning in ferroelectric tunable capacitors are presented.

Synthesis of Complex-oxide Nanorods via Pulsed-laser Deposition

2010 ◽  
Vol 1256 ◽  
Author(s):  
John E Mathis ◽  
Gyula Eres ◽  
Claudia Cantoni ◽  
Kyunghoon Kim ◽  
Hans Christen
Keyword(s):  
Pulsed Laser Deposition ◽  
Sol Gel ◽  
Pulsed Laser ◽  
Complex Oxides ◽  
Complex Oxide ◽  
Laser Deposition ◽  
Complex Structures ◽  
Layer By Layer ◽  
Oxide Nanorods ◽  
Layer Control

AbstractNanorods composed of complex oxides have been synthesized using hydrothermal and sol-gel methods, but pulsed-laser deposition (PLD) provides precise, layer-by-layer control of growth, and is the method of choice for synthesizing complex structures. However, producing complex-oxide nanorods by PLD has proved elusive.Here we report on our efforts to produce nanorods composed of the best-understood complex oxide, strontium titanate (STO). The results suggest it is indeed possible to produce STO nanorods via PLD by using a template of MgO nanorods.

In-Situ Optical Diagnostics During Pulsed-Laser Deposition of Magnetoresistive La-Ca-Mn-O Films on Silicon Substrates

1996 ◽  
Vol 441 ◽  
Author(s):  
P.-J. Kung ◽  
J. E. Cosgrove ◽  
K. Kinsella ◽  
D. G. Hamblen
Keyword(s):  
Film Thickness ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Target Surface ◽  
Laser Deposition ◽  
Silicon Substrates ◽  
Ft Ir

AbstractDuring pulsed-laser deposition of La0.67Ca0.33MnO3 films on silicon substrates, a system that consists of visible optical-emission spectroscopy (OES) and Fourier transform infrared (FT-IR) spectroscopy is employed to perform in-situ diagnosis of the laser-induced plume and to monitor the substrate temperature and the film thickness. The effects of oxygen pressure, laser fluence, and distance from the target surface on emission spectra were studied. In FT-IR measurements, the slopes of the reflectance versus wavenumber curves were observed to increase with film thickness and hence with time, which provides end-point detection during the film growth. La0.67Ca0.33MnO3 films with (100), (110), and mixed orientations, depending on the substrate temperature, were deposited on yttria-stabilized zirconia (YSZ) buffered Si(100) and Si(111) substrates. In a magnetic field of 5 T, the maximum magnetoresistance (MR) values of 250% at 195 K and 164% at 140 K were observed in the as-deposited (110) and (100) films, respectively.

In Situ Decorated Ni Metallic Layer with CoS2-Layered Thin Films via a Layer-by-Layer Strategy Using Pulsed Laser Deposition for Enhanced Electrocatalytic OER

2021 ◽  
Author(s):  
Mahendran Mathankumar ◽  
Kannimuthu Karthick ◽  
Amal Kaitheri Nanda kumar ◽  
Subrata Kundu ◽  
Subramanian Balasubramanian
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Metallic Layer ◽  
Layer By Layer

Pulsed Laser Deposition

MRS Bulletin ◽  
1992 ◽  
Vol 17 (2) ◽  
pp. 26-29 ◽  
Author(s):  
Graham K. Hubler
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
High Temperature Superconductivity ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Original Research ◽  
High Quality ◽  
Binary Compounds

Research on materials grown by pulsed laser deposition, or PLD, has experienced phenomenal growth since late 1987 when T. Venkatesan (one of the authors for this issue) and co-workers pointed out that extreme nonequilibrium conditions created by pulsed laser melting of YBaCuO allowed in-situ preparation of thin films of this high transition temperature (Tc) superconducting material. Since then, PLD has emerged as the primary means for high throughput deposition of high-quality superconducting thin films for research and devices. This probably came as no surprise to J.T. Cheung (another of this issue's authors), who performed original research in this area and tirelessly labored during the 1980s to convince a skeptical audience of the advantages of PLD.Along with the success of PLD in the arena of high-temperature superconductivity, however, is the explosion of activity in the deposition of many other materials, made possible by the unique features of pulsed laser deposition, materials previously not amenable to in-situ thin film growth. Creative minds reasoned that since PLD can deposit a demanding, complex material such as the perovskite structure Y1Ba2Cu3O7-δ, why not other perovskites or multicomponent oxide materials? It also turns out that the range of properties of multicomponent oxides is virtually limitless. They can be metallic, insulating, semiconducting, biocompatable, superconducting, ferroelectric, piezoelectric, and so on. One is not limited to the properties of elements or binary compounds on which the electronics and microelectronics industries are based. Indeed, in a recent review of hybrid ferromagnetic- semiconductor structures, G. Prinz states, “… there has been little work devoted to incorporating magnetic materials into planar integrated electronic (or photonic) circuitry there are potential applications that have no analog in vacuum electronics but that remain unrealized, awaiting the development of appropriate materials and processing procedures.” In pulsed laser deposition, we may well have in hand the “appropriate processing procedure” to deposit sequential epitaxial layers of high quality materials that possess profoundly different properties.

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