ABSTRACTSmall molecular thin films using solution-based method is a challengeable subject in organic optical and electronic devices. In our previous research, we successfully deposited aluminum tris(8-hydroxyquinoline) (Alq3) films on glass substrate. In this paper, aiming at future exploration of electroluminescent devices, we deposited N, N ’-Bis(3-methylphenyl)-N,N’- diphenylbenzidine) (TPD) films on indium-tin-oxide (ITO) substrates using the vapor-deposition method. Photoluminescence characteristics evidenced the actual formation of TPD thin films. Together with the good surface morphology and low leakage current of the films, the results are promising for actual device fabrication at low cost and low material loss.
