scholarly journals In-situ diagnosis of Ar/CH4 helicon wave plasma for synthesis of carbon nanomaterials

2021 ◽  
Vol 70 (9) ◽  
pp. 097201-097201
Author(s):  
Ji Pei-Yu ◽  
◽  
Huang Tian-Yuan ◽  
Chen Jia-Li ◽  
Zhuge Lan-Jian ◽  
...  
Keyword(s):  
Carbon Nanomaterials ◽  
Helicon Wave ◽  
Helicon Wave Plasma

A universal strategy for thein situsynthesis of TiO2(B) nanosheets on pristine carbon nanomaterials for high-rate lithium storage

2018 ◽  
Vol 6 (16) ◽  
pp. 7070-7079 ◽  
Author(s):  
Long Pan ◽  
Zheng-Wei Zhou ◽  
Yi-Tao Liu ◽  
Xu-Ming Xie
Keyword(s):  
Synergistic Effect ◽  
Lithium Ion Batteries ◽  
Anode Materials ◽  
Carbon Nanomaterials ◽  
Lithium Ion ◽  
High Energy ◽  
High Rate ◽  
Lithium Storage ◽  
Storage Performance

A universal strategy is proposed for thein situsynthesis of TiO2(B) nanosheets on pristine carbon nanomaterials. Benefiting from a remarkable synergistic effect, the resulting nanohybrids exhibit superior high-rate lithium storage performance. In this sense, our strategy may open the door to next-generation, high-power and high-energy anode materials for lithium-ion batteries.

Etching characteristics in helicon wave plasma

1993 ◽  
Vol 2 (1) ◽  
pp. 11-13 ◽  
Author(s):  
H Kitagawa ◽  
A Tsunoda ◽  
H Shindo ◽  
Y Horiike
Keyword(s):  
Helicon Wave ◽  
Helicon Wave Plasma

Low Energy Bias Sputtering Filling of SiO2 into High Aspect Ratio Trench Employing Axially Confined Helicon Wave Plasma

1994 ◽  
Author(s):  
G. Sadakuni ◽  
Y. Kobayashi ◽  
H. Shindo ◽  
T. Fukazawa ◽  
H. Sakaue ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Low Energy ◽  
Helicon Wave ◽  
Helicon Wave Plasma

Effects of Helicon-Wave-Plasma Etching on the Charging Damage of Aluminum Interconnects

1998 ◽  
Vol 37 (Part 1, No. 7A) ◽  
pp. 3867-3870
Author(s):  
Wendy Lin ◽  
Tzong-Kuei Kang ◽  
Yean-Chyi Perng ◽  
Bau-Tong Dai ◽  
Huang-Chung Cheng
Keyword(s):  
Plasma Etching ◽  
Helicon Wave ◽  
Aluminum Interconnects ◽  
Helicon Wave Plasma

High growth-rate fabrication of micro-crystalline silicon by Helicon wave plasma CVD

2001 ◽  
Vol 66 (1-4) ◽  
pp. 283-288 ◽  
Author(s):  
Koji Endo ◽  
Masao Isomura ◽  
Mikio Taguchi ◽  
Hisaki Tarui ◽  
Seiichi Kiyama
Keyword(s):  
Growth Rate ◽  
Crystalline Silicon ◽  
High Growth ◽  
High Growth Rate ◽  
Plasma Cvd ◽  
Helicon Wave ◽  
Helicon Wave Plasma

Al Etching Characteristics Employing Helicon Wave Plasma

1993 ◽  
Vol 32 (Part 1, No. 6B) ◽  
pp. 3019-3022 ◽  
Author(s):  
Nobuhiro Jiwari ◽  
Hiroaki Iwasawa ◽  
Akira Narai ◽  
Hiroyuki Sakaue ◽  
Haruo Shindo ◽  
...  
Keyword(s):  
Helicon Wave ◽  
Helicon Wave Plasma
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