Dual Metal/High-kGate-Last Complementary Metal–Oxide–Semiconductor Field-Effect Transistor with SiBN Film and Characteristic Behavior In Sub-1-nm Equivalent Oxide Thickness
2020 ◽
Vol 92
(7)
◽
pp. 5276-5285
◽
2012 ◽
Vol 51
(4S)
◽
pp. 04DA04
◽
2021 ◽
1998 ◽
Vol 37
(Part 1, No. 11)
◽
pp. 5926-5931
2021 ◽