An Amorphous-Silicon Film Usable at High-Temperature –Annealing Properties of a New Fluorinated Amorphous-Silicon–
1980 ◽
Vol 19
(S2)
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pp. 111
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1987 ◽
Vol 26
(S4)
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pp. 47
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2019 ◽
Vol 112
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pp. 363-367
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1992 ◽
Vol 60-61
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pp. 29-38
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2006 ◽
Vol 45
(10A)
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pp. 7675-7676
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1996 ◽
Vol 279
(1-2)
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pp. 174-179
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2016 ◽
Vol 364
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pp. 302-307
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