Photolysis of Fluorinated Graphites with Embedded Acetonitrile Using a White-Beam Synchrotron Radiation

Fluorinated graphitic layers with good mechanical and chemical stability, polar C–F bonds, and tunable bandgap are attractive for a variety of applications. In this work, we investigated the photolysis of fluorinated graphites with interlayer embedded acetonitrile, which is the simplest representative of the acetonitrile-containing photosensitizing family. The samples were continuously illuminated in situ with high-brightness non-monochromatized synchrotron radiation. Changes in the compositions of the samples were monitored using X-ray photoelectron spectroscopy and near-edge X-ray absorption fine structure (NEXAFS) spectroscopy. The NEXAFS N K-edge spectra showed that acetonitrile dissociates to form HCN and N2 molecules after exposure to the white beam for 2 s, and the latter molecules completely disappear after exposure for 200 s. The original composition of fluorinated matrices CF0.3 and CF0.5 is changed to CF0.10 and GF0.17, respectively. The highly fluorinated layers lose fluorine atoms together with carbon neighbors, creating atomic vacancies. The edges of vacancies are terminated with the nitrogen atoms and form pyridinic and pyrrolic units. Our in situ studies show that the photolysis products of acetonitrile depend on the photon irradiation duration and composition of the initial CFx matrix. The obtained results evaluate the radiation damage of the acetonitrile-intercalated fluorinated graphites and the opportunities to synthesize nitrogen-doped graphene materials.

The white beam station at imaging beamline BL-4, Indus-2

The high flux density of synchrotron white beam offers several advantages in X-ray imaging such as higher resolution and signal-to-noise ratio in 3D/4D micro-tomography, higher frame rate in real-time imaging of transient phenomena, and higher penetration in thick and dense materials especially at higher energies. However, these advantages come with additional challenges to beamline optics, camera and sample due to increased heat load and radiation damage, and to personal safety due to higher radiation dose and ozone gas hazards. In this work, a white beam imaging facility at imaging beamline BL-4, Indus-2, has been developed, while taking care of various instrumental and personal safety challenges. The facility has been tested to achieve 1.5 µm spatial resolution, increased penetration depth up to 900 µm in steel, and high temporal resolutions of ∼10 ms (region of interest 2048 × 2048 pixels) and 70 µs (256 × 2048 pixels). The facility is being used successfully for X-ray imaging, non-destructive testing and dosimetry experiments.

Investigation of the dislocation structure in Czochralski germanium crystals grown in [211] and [110] growth direction

The dislocation structure of single-crystalline germanium crystals grown by the Czochralski method in [211] and [110] direction has been examined by white beam X-ray topography. The dislocation densities in different...

Submicronic Laue diffraction to determine in-depth strain in very closely matched complex HgCdTe/CdZnTe heterostructures with a 10−5 resolution

Cross-sectional submicronic Laue diffraction has been successfully applied to HgCdTe/CdZnTe heterostructures to provide accurate strain profiles from substrate to surface. Combined with chemical-sensitive techniques, this approach allows correlation of lattice-mismatch, interface compositional gradient and strain while isolating specific layer contributions which would otherwise be averaged using conventional X-ray diffraction. The submicronic spatial resolution allowed by the synchrotron white beam size is particularly suited to complex infrared detector designed structures such as dual-color detectors. The extreme strain resolution of 10−5 required for the very low lattice-mismatch system HgCdTe/CdZnTe is demonstrated.