2009 IEEE International Integrated Reliability Workshop Final Report
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9781424439218
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

The use of Taguchi method for process design of experiment to resolve gate oxide integrity issue

2009 ◽  
Author(s):  
Tommy Cahyadi ◽  
Pee-Ya Tan ◽  
Mien-Ta Ng ◽  
Tammi Yeo ◽  
Juat-Jong Boh ◽  
...  
Keyword(s):  
Taguchi Method ◽  
Design Of Experiment ◽  
Process Design ◽  
Gate Oxide ◽  
Integrity Issue ◽  
Gate Oxide Integrity

Investigation of SILC via Energy Resolved spin dependent tunneling spectroscopy

2009 ◽  
Author(s):  
J.T. Ryan ◽  
P.M. Lenahan ◽  
A.T. Krishnan ◽  
S. Krishnan
Keyword(s):  
Tunneling Spectroscopy

Correlation of electrical properties with interface structures of CVD oxide-based oxynitride tunnel dielectrics

2009 ◽  
Author(s):  
Ziyuan Liu ◽  
Hirokazu Ishigaki ◽  
Shuu Ito ◽  
Takashi Ide ◽  
Mariko Makabe ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Interface Structures

The critical role of the defect structural relaxation for interpretation of noise measurements in MOSFETs

2009 ◽  
Author(s):  
D. Veksler ◽  
G. Bersuker ◽  
H. Park ◽  
C. Young ◽  
K. Y. Lim ◽  
...  
Keyword(s):  
Structural Relaxation ◽  
Critical Role ◽  
Noise Measurements
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