Inherently Area‐Selective Atomic Layer Deposition of SiO
2
Thin Films to Confer Oxide Versus Nitride Selectivity
Keyword(s):
2015 ◽
Vol 764-765
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pp. 138-142
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Keyword(s):
Keyword(s):
Keyword(s):
2006 ◽
Vol 24
(3)
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pp. 1088
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W:Al2O3 Nanocomposite Thin Films with Tunable Optical Properties Prepared by Atomic Layer Deposition
2016 ◽
Vol 120
(27)
◽
pp. 14681-14689
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