ChemInform Abstract: Effects of Surface Pretreatments of a Glass Substrate on the Properties of Tin Oxide Film Prepared by Plasma-Assisted Chemical Vapor Deposition (PCVD).

ChemInform ◽  
2010 ◽  
Vol 23 (30) ◽  
pp. no-no
Author(s):  
M. ARAI ◽  
S. HAMADA ◽  
Y. NISHIYAMA
Keyword(s):  
Chemical Vapor Deposition ◽  
Oxide Film ◽  
Tin Oxide ◽  
Vapor Deposition ◽  
Glass Substrate ◽  
Chemical Vapor

X-ray photoelectron spectroscopy study on the chemistry involved in tin oxide film growth during chemical vapor deposition processes

2013 ◽  
Vol 31 (1) ◽  
pp. 01A105 ◽  
Author(s):  
Gilbère J. A. Mannie ◽  
Gijsbert Gerritsen ◽  
Hendrikus C. L. Abbenhuis ◽  
Joop van Deelen ◽  
J. W. (Hans) Niemantsverdriet ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Oxide Film ◽  
Tin Oxide ◽  
Vapor Deposition ◽  
Photoelectron Spectroscopy ◽  
Film Growth ◽  
Chemical Vapor ◽  
Spectroscopy Study ◽  
X Ray ◽  
Deposition Processes

Early stage of tin oxide film growth in chemical vapor deposition

2003 ◽  
Vol 169-170 ◽  
pp. 549-552 ◽  
Author(s):  
Yuji Matsui ◽  
Michio Mitsuhashi ◽  
Yoshio Goto
Keyword(s):  
Chemical Vapor Deposition ◽  
Oxide Film ◽  
Tin Oxide ◽  
Vapor Deposition ◽  
Film Growth ◽  
Early Stage ◽  
Chemical Vapor
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