Oxygen accumulation effect for depth profiling of thin-multilayered sample using low-energy oxygen ion beam

Surface and Interface Analysis ◽

10.1002/sia.5107 ◽

2012 ◽

Vol 45 (1) ◽

pp. 107-110 ◽

Author(s):

Suguru Nishinomiya ◽

Naoyoshi Kubota ◽

Shun-ichi Hayashi ◽

Hisataka Takenaka

Keyword(s):

Ion Beam ◽

Depth Profiling ◽

Multilayered Sample ◽

Accumulation Effect

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SIMS depth profiling and topography studies of repetitive III–V trenches under low energy oxygen ion beam sputtering

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4944632 ◽

2016 ◽

Vol 34 (3) ◽

pp. 03H131

Author(s):

Viktoriia Gorbenko ◽

Franck Bassani ◽

Alexandre Merkulov ◽

Thierry Baron ◽

Mickael Martin ◽

...

Keyword(s):

Ion Beam ◽

Depth Profiling ◽

Ion Beam Sputtering ◽

Beam Sputtering ◽

Sims Depth Profiling

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Effect of low energy oxygen ion beam irradiation on ionic conductivity of solid polymer electrolyte

10.1063/1.4872963 ◽

2014 ◽

Author(s):

H. Manjunatha ◽

G. N. Kumaraswamy ◽

R. Damle

Keyword(s):

Ionic Conductivity ◽

Polymer Electrolyte ◽

Solid Polymer Electrolyte ◽

Ion Beam ◽

Solid Polymer ◽

Beam Irradiation ◽

Ion Beam Irradiation ◽

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Room-temperature growth of crystalline indium tin oxide films on glass using low-energy oxygen-ion-beam assisted deposition

Journal of Applied Physics ◽

10.1063/1.1538335 ◽

2003 ◽

Vol 93 (4) ◽

pp. 2262-2266 ◽

Author(s):

C. Liu ◽

T. Matsutani ◽

T. Asanuma ◽

K. Murai ◽

M. Kiuchi ◽

...

Keyword(s):

Tin Oxide ◽

Indium Tin Oxide ◽

Room Temperature ◽

Ion Beam ◽

Oxide Films ◽

Temperature Growth ◽

Ion Beam Assisted Deposition ◽

Tin Oxide Films

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Depth profiling of defect distribution in an AlGaAs/GaAs multiple quantum well structure induced by low-energy ion beam etching

Defect Recognition and Image Processing in Semiconductors 1997 ◽

10.1201/9781315140810-93 ◽

2017 ◽

pp. 453-456

Author(s):

F. Frostf ◽

K. Otte ◽

A. Schindler ◽

G. Lippold ◽

R. Pickenhain ◽

...

Keyword(s):

Quantum Well ◽

Ion Beam ◽

Multiple Quantum Well ◽

Depth Profiling ◽

Multiple Quantum ◽

Ion Beam Etching ◽

Defect Distribution ◽

Quantum Well Structure

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Low energy oxygen ion beam modification of the surface morphology and chemical structure of polyurethane fibers

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/j.nimb.2005.07.224 ◽

2006 ◽

Vol 243 (1) ◽

pp. 63-74 ◽

Author(s):

K.H. Wong ◽

M. Zinke-Allmang ◽

W.K. Wan ◽

J.Z. Zhang ◽

P. Hu

Keyword(s):

Surface Morphology ◽

Chemical Structure ◽

Ion Beam ◽

Ion Beam Modification ◽

Modification Of The Surface

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Depth profiling by means of the combination of glancing incidence X-ray fluorescence spectrometry with low energy ion beam etching technique

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(94)00130-n ◽

1995 ◽

Vol 50 (3) ◽

pp. 265-270 ◽

Author(s):

W. Frank ◽

H.-J. Thomas ◽

A. Schindler

Keyword(s):

Ion Beam ◽

Depth Profiling ◽

Fluorescence Spectrometry ◽

Etching Technique ◽

Ion Beam Etching ◽

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Low‐energy oxygen ion bombardment effect on BaTiO3thin films grown by multi‐ion‐beam reactive sputtering technique

Applied Physics Letters ◽

10.1063/1.109944 ◽

1993 ◽

Vol 63 (6) ◽

pp. 734-736 ◽

Author(s):

C.‐J. Peng ◽

H. Hu ◽

S. B. Krupanidhi

Keyword(s):

Ion Beam ◽

Ion Bombardment ◽

Reactive Sputtering ◽

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Structural, electrical and optical properties of indium tin oxide films prepared by low-energy oxygen-ion-beam assisted deposition

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/s0168-583x(03)00760-2 ◽

2003 ◽

Vol 206 ◽

pp. 348-352 ◽

Author(s):

C. Liu ◽

T. Matsutani ◽

T. Asanuma ◽

M. Kiuchi

Keyword(s):

Optical Properties ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Ion Beam ◽

Oxide Films ◽

Electrical And Optical Properties ◽

Ion Beam Assisted Deposition ◽

Tin Oxide Films

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Fermi Level Modulation of n-type Doped Single Walled Carbon Nanotube using Buried Local-Gate FET Structure by Oxygen Ion Implantation with Ultra-low Energy Ion Beam of 25eV

10.7567/ssdm.2005.g-7-5 ◽

2005 ◽

Author(s):

Takafumi Kamimura ◽

Kazuhiro Yamamoto ◽

Kazuhiko Matsumoto

Keyword(s):

Carbon Nanotube ◽

Ion Implantation ◽

Fermi Level ◽

Ion Beam ◽

Single Walled Carbon Nanotube ◽

Single Walled Carbon ◽

Oxygen Ion Implantation

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Effect of low energy oxygen ion beam on optical and electrical characteristics of dual ion beam sputtered SnO2 thin films

Thin Solid Films ◽

10.1016/s0040-6090(99)00078-4 ◽

1999 ◽

Vol 349 (1-2) ◽

pp. 126-129 ◽

Author(s):

Jae-Ho Chung ◽

Yong-Sahm Choe ◽

Dae-Seung Kim

Keyword(s):

Ion Beam ◽

Electrical Characteristics ◽

Sno2 Thin Films

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