scholarly journals Characterization of a Small Electro-Mechanical Contact Using LDV Measurement Techniques

2019 ◽  
pp. 47-58
Author(s):  
Kelsey M. Johnson
Keyword(s):  
Measurement Techniques ◽  
Mechanical Contact ◽  
Ldv Measurement

The Use of Metallographic and SEM Analysis for Characterization of Sidewall Surfaces in MEMS Devices with DRIE Processing

2010 ◽  
Vol 2010 (1) ◽  
pp. 000703-000706
Author(s):  
Colin Stevens ◽  
Robert Dean ◽  
Samuel Lawrence ◽  
Lee Levine
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Measurement Techniques ◽  
Sem Analysis ◽  
Defect Structures ◽  
Mems Devices ◽  
Depth Of Focus ◽  
Surface Conditions ◽  
Side Walls

The Bosch Deep Reactive Ion Etch Process is commonly used for the manufacture of MEMS and MOEMS devices that require deep high aspect ratio trenches. In many cases fully released, high aspect ratio features can be generated in one pass. However the process must be understood to avoid generating some of the defect structures that are characteristic of the process. Defects such as scalloping, silicon grass, and undercutting at the interface of a nonconductive layer can be controlled by process parameters and optimization. Measurement and characterization of the defective structures is a key element of controlling them. The use of SEM measurement techniques for characterizing the small features associated with scalloping and silicon grass is essential. No other technique is capable of providing the large depth of focus required to visualize these features. The use of metallographic techniques furthers understanding of the surface conditions on the side walls of these deep trenches.

scholarly journals A method for extracting calibrated volatility information from the FIGAERO-HR-ToF-CIMS and its experimental application

2019 ◽  
Vol 12 (3) ◽  
pp. 1429-1439 ◽  
Author(s):  
Thomas J. Bannan ◽  
Michael Le Breton ◽  
Michael Priestley ◽  
Stephen D. Worrall ◽  
Asan Bacak ◽  
...  
Keyword(s):  
Vapour Pressure ◽  
Homologous Series ◽  
Measurement Techniques ◽  
Ionization Mass ◽  
Particle Phase ◽  
Knudsen Effusion ◽  
Vapour Pressure Measurement ◽  
Knudsen Effusion Mass Spectrometry ◽  
Real Atmosphere

Abstract. The Filter Inlet for Gases and AEROsols (FIGAERO) is an inlet specifically designed to be coupled with the Aerodyne High-Resolution Time-of-Flight Chemical Ionization Mass Spectrometer (HR-ToF-CIMS). The FIGAERO-HR-ToF-CIMS provides simultaneous molecular information relating to both the gas- and particle-phase samples and has been used to extract vapour pressures (VPs) of the compounds desorbing from the filter whilst giving quantitative concentrations in the particle phase. However, such extraction of vapour pressures of the measured particle-phase components requires use of appropriate, well-defined, reference compounds. Vapour pressures for the homologous series of polyethylene glycols (PEG) ((H-(O-CH2-CH2)n-OH) for n=3 to n=8), covering a range of vapour pressures (VP) (10−1 to 10−7 Pa) that are atmospherically relevant, have been shown to be reproduced well by a range of different techniques, including Knudsen Effusion Mass Spectrometry (KEMS). This is the first homologous series of compounds for which a number of vapour pressure measurement techniques have been found to be in agreement, indicating the utility as a calibration standard, providing an ideal set of benchmark compounds for accurate characterization of the FIGAERO for extracting vapour pressure of measured compounds in chambers and the real atmosphere. To demonstrate this, single-component and mixture vapour pressure measurements are made using two FIGAERO-HR-ToF-CIMS instruments based on a new calibration determined from the PEG series. VP values extracted from both instruments agree well with those measured by KEMS and reported values from literature, validating this approach for extracting VP data from the FIGAERO. This method is then applied to chamber measurements, and the vapour pressures of known products are estimated.

Comparative Nanoparticle Size Characterization of EEW Alumina Using Various Measurement Techniques

2012 ◽  
Vol 30 (6) ◽  
pp. 517-532 ◽  
Author(s):  
Bhaskar Prasad Saha ◽  
Jayanta Mukhopadhyay ◽  
Roy Johnson
Keyword(s):  
Measurement Techniques ◽  
Nanoparticle Size ◽  
Size Characterization

scholarly journals Advanced Confocal Microscopy An Essential Technique for Microfluidics Development

2006 ◽  
Vol 14 (1) ◽  
pp. 8-13
Author(s):  
Terence Lundy
Keyword(s):  
Integrated Circuit ◽  
Measurement Techniques ◽  
Microfluidic Devices ◽  
Conventional Imaging ◽  
Biological Processes ◽  
Initial Development ◽  
Complex Chemical ◽  
Great Progress ◽  
Speed And Accuracy

Many believe that microfluidics has the potential to do for chemistry and biology what the integrated circuit has done for electronics — integrating tremendously complex chemical and biological processes into simple easy-to-use devices that will eventually pervade our lives. While microfluidics has made great progress in the last decade — addressing many of the fundamental questions related to manipulating nanoliter volumes of chemicals and solutions — it still faces some very basic challenges as it moves out of the laboratory and into use. Perhaps most basic is the need for fast, accurate characterization of the size and shape of the microfluidic devices themselves. Conventional imaging and measurement techniques have proven adequate for initial development, but are unable to provide the speed and accuracy needed to support the continued development of microfluidic technologies.

Sign in / Sign up

Export Citation Format

Share Document