Evaluation of Silanol Concentration on Quartz Glass Surface for EOF Stability of CE Chip

2001 ◽  
pp. 595-596
Author(s):  
Takahiro Nishimoto ◽  
Hirohisa Abe ◽  
Yoichi Fujiyama ◽  
Masaki Kanai ◽  
Masakazu Akechi ◽  
...  
Keyword(s):  
Quartz Glass ◽  
Glass Surface

Generation of nano-bumps on transparent quartz glass surface under femtosecond laser irradiation

2008 ◽  
Author(s):  
Wei Guo ◽  
Zeng Bo Wang ◽  
Lin Li ◽  
Zhu Liu ◽  
Boris Luk’yanchuk ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Laser Irradiation ◽  
Quartz Glass ◽  
Glass Surface ◽  
Femtosecond Laser Irradiation

Ultra-Precision Shaping and Ultra-Smooth Polishing Investigation of High-Purity Quartz Glass in Nanoparticle Colloid Jet Machining

2012 ◽  
Vol 426 ◽  
pp. 396-399 ◽  
Author(s):  
Xiao Zong Song ◽  
Yong Zhang ◽  
Fei Hu Zhang
Keyword(s):  
Quartz Glass ◽  
High Purity ◽  
Glass Surface ◽  
Morphological Characteristics ◽  
Surface Profile ◽  
Processing Technique ◽  
Surface Shape ◽  
Before And After ◽  
Ultra Precision ◽  
Nanoparticle Colloid

In this paper, ultra-precision shaping and ultra-smooth polishing investigations have been done upon a high-purity quartz glass substrate with an aspheric surface in nanoparticle colloid jet machining, which is an ultra smooth surface processing technique utilizing surface chemical reaction between work surface atoms and nanoparticles to remove the uppermost surface atoms. The shaping and polishing characters of high-purity quartz glass in nanoparticle colloid jet machining has been researched. The surface profile of the high-purity quartz glass workpiece before and after shaping has been measured by surface profilometer. And the surface microscopic morphological characteristics of high-purity quartz glass surface polished by nanoparticle colloid jet machining have been observed by atomic force microscopy (AFM). The measurement results indicate that nanoparticle colloid jet machining has good shaping ability for surface shape correction in ultra-precision machining. And the AFM observation results show that the roughness of the high-purity quartz glass surface has been reduced from 1.919 nm RMS to 0.784 nm RMS by nanoparticle colloid jet machining.

An Effect of the Epoxy Cementing Technology on the Deformation of the Optical External Surfaces Made of Quartz Glass

2020 ◽  
Vol 299 ◽  
pp. 1099-1103
Author(s):  
Dmitry Kruchinin ◽  
Yulia Aleshina ◽  
Elena Farafontova
Keyword(s):  
Heat Treatment ◽  
Quartz Glass ◽  
Glass Surface ◽  
Heat Treatment Temperature ◽  
Treatment Temperature ◽  
Performance Characteristics ◽  
Optical Characteristics ◽  
Polymerization Temperature ◽  
Plane Convex ◽  
Surface Deformations

The problematic issues, associated with deformations of the outer surfaces of optical parts made of quartz glass, due to the process of cementing, are considered. The effect of the heat treatment temperature of optical assemblies, consisting of parts made of quartz glass and cementing with epoxy cements OK-72FT5 and OK-72FT15, on the deformation of external surfaces was experimentally established. The object of the study was plane-convex and plane-concave lenses made of quartz glass. It has been stated, that on cementing with optical epoxy cements OK72FT5 and OK72FT15 the external quartz glass surface deformations depend primarily on the heat treatment temperature. When cementing parts are made of quartz glass, increasing the polymerization temperature improves the performance characteristics of products and reduces changes in their optical characteristics.

scholarly journals Yttrium oxide film for protecting quartz glass surface from etching by long-term exposure to chlorine trifluoride gas at room temperature

2018 ◽  
Vol 83 ◽  
pp. 211-215 ◽  
Author(s):  
Ryohei Kawasaki ◽  
Yasuhiro Umetsu ◽  
Keisuke Kurashima ◽  
Kohei Shioda ◽  
Asumi Hirooka ◽  
...  
Keyword(s):  
Oxide Film ◽  
Yttrium Oxide ◽  
Quartz Glass ◽  
Glass Surface ◽  
Room Temperature

scholarly journals Shear Thickening Polishing of Quartz Glass

Micromachines ◽  
2021 ◽  
Vol 12 (8) ◽  
pp. 956
Author(s):  
Qi Shao ◽  
Shixiang Duan ◽  
Lin Fu ◽  
Binghai Lyu ◽  
Ping Zhao ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Quartz Glass ◽  
Glass Surface ◽  
Material Removal ◽  
Colloidal Silica ◽  
High Efficiency ◽  
Ph Value ◽  
Shear Thickening ◽  
Workpiece Surface ◽  
Fine Quartz

Quartz glass is a typical optical material. In this research, colloidal silica (SiO2) and colloidal cerium oxide (CeO2) are used as abrasive grains to polish quartz glass in the shear thickening polishing (STP) process. The STP method employs the shear-thickening mechanism of non-Newtonian power-law fluid to achieve high-efficiency and high-quality polishing. The different performance in material removal and surface roughness between SiO2 and CeO2 slurries was analyzed. The influence of the main factors including polishing speed, abrasive concentration, and pH value on the MRR, workpiece surface roughness, and the surface topography was discussed. Two different slurries can both achieve fine quartz surface in shear thickening polishing with the polishing speed 100 rpm, and pH value 8. The quartz glass surface roughness Ra decreases from 120 ± 10 to 2.3 nm in 14 minutes’ polishing with 8 wt% 80 nm SiO2 slurry, and the MRR reaches 121.6 nm/min. The quartz glass surface roughness Ra decreases from 120 ± 10 to 2.1 nm in 12 minutes polishing by 6 wt% 100 nm CeO2 slurry and the MRR reaches 126.2 nm/min.

Sign in / Sign up

Export Citation Format

Share Document