Insights into deposition processes for amorphous semiconductor materials and devices from real time spectroscopic ellipsometry

1996 ◽  
Vol 198-200 ◽  
pp. 981-986 ◽  
Author(s):  
R.W. Collins ◽  
J.S. Burnham ◽  
Sangbo Kim ◽  
Joohyun Koh ◽  
Yiwei Lu ◽  
...  
Keyword(s):  
Real Time ◽  
Spectroscopic Ellipsometry ◽  
Amorphous Semiconductor ◽  
Semiconductor Materials ◽  
Deposition Processes

Real-Time Diagnosis of Etching and Deposition Processes by Spectroscopic Ellipsometry

1983 ◽  
Vol 29 ◽  
Author(s):  
D. E. Aspnes ◽  
R. P. H. Chang
Keyword(s):  
High Pressure ◽  
Data Analysis ◽  
Laser Beam ◽  
Real Time ◽  
Spectroscopic Ellipsometry ◽  
Chemical Etching ◽  
Polarization State ◽  
Surface Information ◽  
Deposition Processes ◽  
Time Diagnosis

ABSTRACTRecent advances in instrumentation and data analysis have made spectroscopic ellipsometry a routine analytic tool with submonolayer sensitivity for monitoring and controlling cleaning, etching, deposition, or other processes that take place in relatively high-pressure or reactive environments. We discuss representative applications in chemical etching, plasma processing, and MOCVD to illustrate analytical procedures and to indicate other potential uses of the technique. The possibility of extracting surface information already carried in the polarization state of the processing laser beam is also discussed.

Real-time monitoring of silicon oxide deposition processes

2004 ◽  
Vol 180-181 ◽  
pp. 655-658 ◽  
Author(s):  
C Gravalidis ◽  
M Gioti ◽  
A Laskarakis ◽  
S Logothetidis
Keyword(s):  
Real Time ◽  
Silicon Oxide ◽  
Real Time Monitoring ◽  
Oxide Deposition ◽  
Deposition Processes

Study of the growth and interface engineering of dense/porous SiN_x optical coatings by real-time spectroscopic ellipsometry

2004 ◽  
Author(s):  
Aram Amassian ◽  
Richard Vernhes ◽  
Jolanta Klemberg-Sapieha ◽  
Patrick Desjardins ◽  
Ludvik Martinu
Keyword(s):  
Real Time ◽  
Spectroscopic Ellipsometry ◽  
Optical Coatings ◽  
Interface Engineering
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