Double epitaxial layer power Schottky diodes with end in the ramp oxide technique
1996 ◽
Vol 27
(1)
◽
pp. 67-72
◽
2005 ◽
Vol 2
(7)
◽
pp. 2559-2563
◽
2005 ◽
pp. 429-432
Keyword(s):
SiC-4H Epitaxial Layer Growth by Trichlorosilane (TCS) as Silicon Precursor at Very High Growth Rate
2008 ◽
Vol 600-603
◽
pp. 123-126
◽
Keyword(s):
2006 ◽
Vol 527-529
◽
pp. 199-202
◽
2012 ◽
Vol 27
(5)
◽
pp. 055007
2006 ◽
Vol 527-529
◽
pp. 163-166
◽
1987 ◽
Vol 34
(9)
◽
pp. 1963-1970
◽