Effects of activated reactive evaporation process parameters on the microhardness of polycrystalline silicon carbide thin films

1994 ◽  
Vol 253 (1-2) ◽  
pp. 212-217 ◽  
Author(s):  
YongHwa Chris Cha ◽  
Guho Kim ◽  
Hans J. Doerr ◽  
Rointan F. Bunshah
2005 ◽  
Vol 86 (7) ◽  
pp. 071920 ◽  
Author(s):  
J. J. Bellante ◽  
H. Kahn ◽  
R. Ballarini ◽  
C. A. Zorman ◽  
M. Mehregany ◽  
...  

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