7664. The relation between lift-off of photoresist and the surface coverage of trimethylsiloxy groups on silicon wafers: a quantitative time-of-flight secondary ion mass spectroscopy and contact angle study

Lift Off ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

The relation between lift-off of photoresist and the surface coverage of trimethylsiloxy groups on silicon wafers: A quantitative time-of-flight secondary ion mass spectrometry and contact angle study

10.1116/1.585045 ◽

1990 ◽

Vol 8 (3) ◽

pp. 463 ◽

Cited By ~ 16

Author(s):

J. J. Ponjeé

Keyword(s):

Mass Spectrometry ◽

Contact Angle ◽

Surface Coverage ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Silicon Wafers ◽

Ion Mass Spectrometry ◽

Lift Off ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Determination of trace metallic impurities on 200-mm silicon wafers by time-of-flight secondary-ion-mass spectroscopy

10.1116/1.589577 ◽

1997 ◽

Vol 15 (6) ◽

pp. 1908 ◽

Cited By ~ 12

Author(s):

Paul K. Chu

Keyword(s):

Mass Spectroscopy ◽

Time Of Flight ◽

Silicon Wafers ◽

Secondary Ion ◽

Metallic Impurities

Secondary ion counting for surface-sensitive chemical analysis of organic compounds using time-of-flight secondary ion mass spectroscopy with cluster ion impact ionization

Review of Scientific Instruments ◽

10.1063/1.3541799 ◽

2011 ◽

Vol 82 (3) ◽

pp. 033101 ◽

Cited By ~ 9

Author(s):

K. Hirata ◽

Y. Saitoh ◽

A. Chiba ◽

K. Yamada ◽

Y. Takahashi ◽

...

Keyword(s):

Chemical Analysis ◽

Organic Compounds ◽

Mass Spectroscopy ◽

Impact Ionization ◽

Time Of Flight ◽

Cluster Ion ◽

Ion Impact ◽

Quantitative Evaluation of Molecular Diffusion in Organic Planar Heterojunctions by Time-of-Flight Secondary Ion Mass Spectroscopy

ACS Omega ◽

10.1021/acsomega.7b01524 ◽

2018 ◽

Vol 3 (2) ◽

pp. 1522-1528 ◽

Cited By ~ 8

Author(s):

Kyohei Nakano ◽

Takahiro Shibamori ◽

Keisuke Tajima

Keyword(s):

Quantitative Evaluation ◽

Mass Spectroscopy ◽

Molecular Diffusion ◽

Time Of Flight ◽

Guide for Interpretation of Mass Spectral Data Acquired with Time-of-Flight Secondary Ion Mass Spectroscopy

10.1520/e2695 ◽

2009 ◽

Author(s):

Keyword(s):

Spectral Data ◽

Mass Spectroscopy ◽

Time Of Flight ◽

Mass Spectral Data ◽

Mass Spectral ◽

An investigation of the wear track on DLC (a-C:H) film by time-of-flight secondary ion mass spectroscopy

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01422-0 ◽

2001 ◽

Vol 146-147 ◽

pp. 378-383 ◽

Cited By ~ 29

Author(s):

Haruyo Fukui ◽

Miki Irie ◽

Yoshiharu Utsumi ◽

Kazuhiko Oda ◽

Hisanori Ohara

Keyword(s):

Mass Spectroscopy ◽

Wear Track ◽

Time Of Flight ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Determination of silicon oxide layer thickness by time-of-flight secondary ion mass spectroscopy

10.1116/1.590891 ◽

1999 ◽

Vol 17 (5) ◽

pp. 2191 ◽

Cited By ~ 5

Author(s):

O. Brox ◽

K. Iltgen ◽

S. Hellweg ◽

A. Benninghoven

Keyword(s):

Oxide Layer ◽

Layer Thickness ◽

Mass Spectroscopy ◽

Silicon Oxide ◽

Time Of Flight ◽

Oxide Layer Thickness ◽

Silicon Oxide Layer ◽

Ink identification by time-of-flight secondary ion mass spectroscopy

Surface and Interface Analysis ◽

10.1002/sia.2246 ◽

2006 ◽

Vol 38 (4) ◽

pp. 854-858 ◽

Cited By ~ 13

Author(s):

A. He ◽

D. Karpuzov ◽

S. Xu

Keyword(s):

Mass Spectroscopy ◽

Time Of Flight ◽

Surface structures of binary mixtures of imidazolium-based ionic liquids using high-resolution Rutherford backscattering spectroscopy and time of flight secondary ion mass spectroscopy

The Journal of Chemical Physics ◽

10.1063/1.4838376 ◽

2013 ◽

Vol 139 (22) ◽

pp. 224701 ◽

Cited By ~ 22

Author(s):

Kaoru Nakajima ◽

Motoki Miyashita ◽

Motofumi Suzuki ◽

Kenji Kimura

Keyword(s):

Ionic Liquids ◽

High Resolution ◽

Binary Mixtures ◽

Mass Spectroscopy ◽

Time Of Flight ◽

Rutherford Backscattering ◽

Rutherford Backscattering Spectroscopy ◽

Surface Structures ◽

Physical and Chemical Characterization of Beryllium Particles from Several Workplaces in Québec, Canada—Part B: Time-of-flight Secondary-ion Mass Spectroscopy

Journal of Toxicology and Environmental Health Part A ◽

10.1080/15287390500192080 ◽

2005 ◽

Vol 68 (21) ◽

pp. 1907-1916 ◽

Cited By ~ 11

Author(s):

Mathieu Rouleau ◽

Joseph Zayed ◽

Chantal Dion ◽

Philippe Plamondon ◽

Gilles L'Espérance

Keyword(s):

Mass Spectroscopy ◽

Time Of Flight ◽

Chemical Characterization ◽

Physical And Chemical Characterization ◽

Physical And Chemical ◽