Nano-topography of ultra-precision ground surface of silicon nitride ceramics using atomic force microscope

1993 ◽  
Vol 15 (4) ◽  
pp. 301
Keyword(s):  
Silicon Nitride ◽  
Atomic Force Microscope ◽  
Ground Surface ◽  
Atomic Force ◽  
Nitride Ceramics ◽  
Ultra Precision

The atomic-force microscope and its future in biology

1993 ◽  
Vol 51 ◽  
pp. 704-705
Author(s):  
Jean-Paul Revel
Keyword(s):  
Silicon Nitride ◽  
Laser Beam ◽  
Atomic Force Microscope ◽  
Scanning Tunneling Microscope ◽  
Point Of View ◽  
Scanning Tunneling ◽  
Close Relative ◽  
Tunneling Microscope ◽  
Atomic Force ◽  
Sharp Point

The last few years have been marked by a series of remarkable developments in microscopy. Perhaps the most amazing of these is the growth of microscopies which use devices where the place of the lens has been taken by probes, which record information about the sample and display it in a spatial from the point of view of the context. From the point of view of the biologist one of the most promising of these microscopies without lenses is the scanned force microscope, aka atomic force microscope.This instrument was invented by Binnig, Quate and Gerber and is a close relative of the scanning tunneling microscope. Today's AFMs consist of a cantilever which bears a sharp point at its end. Often this is a silicon nitride pyramid, but there are many variations, the object of which is to make the tip sharper. A laser beam is directed at the back of the cantilever and is reflected into a split, or quadrant photodiode.

Fundamental Measurements of the Friction on an Atomically-Flat Terrace of Au(100) in Sulfuric Acid Solution under Potential Control Using Electrochemical Atomic Force Microscope

2006 ◽  
Vol 512 ◽  
pp. 395-398
Author(s):  
Nobumitsu Hirai ◽  
Tatsuya Tooyama ◽  
Toshihiro Tanaka
Keyword(s):  
Aqueous Solution ◽  
Sulfuric Acid ◽  
Silicon Nitride ◽  
Acid Solution ◽  
Atomic Force Microscope ◽  
Friction Force ◽  
Potential Range ◽  
Potential Control ◽  
Atomic Force ◽  
Atomically Flat

Potential dependence of the friction force between an atomically-flat terrace of Au(100) single crystal and a tip attached to a silicon nitride cantilever of electrochemical atomic force microscope (EC-AFM) have been investigated qualitatively in 0.05 M H2SO4 aqueous solution. It is found that the friction force gains when the potential increases in the potential range between −400 mV and 400 mV vs Hg/Hg2SO4 electrode.

Research on Ultra-Precision Machining of Silicon Nitride Ceramics: A Review

2012 ◽  
Vol 497 ◽  
pp. 294-298 ◽  
Author(s):  
Su Jiang Dai ◽  
Yu Gang Ren ◽  
Tao Kong ◽  
Yong Liang Hu
Keyword(s):  
Silicon Nitride ◽  
Precision Machining ◽  
Advantages And Disadvantages ◽  
Nitride Ceramics ◽  
Ultra Precision

The contemporary aspects of ultra precision machining of Si3N4 with regards to enhanced productivity and precision demands is presented in this paper. This paper reviews the literature on machining technology of covering the history, Several machining methods of Si3N4 are discussed. By comparing their advantages and disadvantages, some beneficial conclusions, which have some guiding significance for the coming practical works, are reached.

Nanotopography of Ultraprecise Ground Surface of Fine Ceramics Using Atomic Force Microscope

CIRP Annals ◽  
1993 ◽  
Vol 42 (1) ◽  
pp. 647-650 ◽  
Author(s):  
Yoshio Ichida ◽  
Kozo Kishi ◽  
Hisayoshi Sato
Keyword(s):  
Atomic Force Microscope ◽  
Ground Surface ◽  
Atomic Force ◽  
Fine Ceramics

Research on Chemical Mechanical Polishing for Silicon Nitride Ceramics

2008 ◽  
Vol 375-376 ◽  
pp. 283-287
Author(s):  
Cong Rong Zhu ◽  
Ju Long Yuan ◽  
Qin Xu ◽  
Bing Hai Lv
Keyword(s):  
Silicon Nitride ◽  
Chemical Mechanical Polishing ◽  
Research Result ◽  
Surface Profile ◽  
Mechanical Polishing ◽  
Machining Process ◽  
Good Thermal Stability ◽  
Nitride Ceramics ◽  
Ultra Precision ◽  
Small Density

Silicon nitride ceramics materials have excellent properties such as small density, high rigidity, high Young's modulus, high wearability, good thermal stability and chemical stability, which make it become one of the most appropriate materials for rollers of high precision bearing. Chemical Mechanical Polishing (CMP) technology is employed to have an ultra-precision machining process for silicon nitride ceramics materials workpiece and the effects of workpiece surface roughness in different abrasive are discussed in this research. The XRD and SEM technology are used to take phase analysis and surface profile detection for the finishing workpiece polished with CeO2 abrasive. The chemical reaction mechanism and the material remove mechanism of silicon nitride ceramics materials in CMP process with CeO2 abrasive are both analysed and discussed in this paper. The research result shows that an extremely smooth surface of silicon nitride ceramics materials workpiece with roughness 5nm Ra is obtained after CMP process with polyurethane polishing pad and CeO2 abrasive.

scholarly journals Unzipping a Membrane

2000 ◽  
Vol 8 (9) ◽  
pp. 3-7
Author(s):  
Stephen W. Carmichael ◽  
Julio M. Fernandez
Keyword(s):  
Silicon Nitride ◽  
Atomic Force Microscope ◽  
Spatial Resolution ◽  
High Resistance ◽  
Outer Surface ◽  
Deinococcus Radiodurans ◽  
Force Spectroscopy ◽  
Test Subject ◽  
Atomic Force ◽  
Inner Surface

The atomic force microscope (AFM) is well known for its outstanding spatial resolution, but it is becoming increasingly useful as the instrument for force spectroscopy. In the force spectroscopy mode, the AFM can measure tiny tension forces, in the piconewton (pN) range. Daniel Müller, Wolfgang Baurmeister, and Andreas Engel have used the AFM in both the imaging and force spectroscopy modes to pull proteins out of membranes in a controlled fashion.Müller et al. used Deinococcus radiodurans, a bacterium best known for its high resistance to radiation (as its Genus name implies), as their test subject. They extracted a highly regular membrane from the bacterium, the hexagonally packed intermediate (HPl) layer. They mounted the HPI on mica, so that the hydrophilic outer surface of the HPI adsorbed strongly to the mica, exposing the hydrophobic inner surface to the silicon nitride AFM stylus.

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