Silicon nitride granule friction measurements with an atomic force microscope: effect of humidity and binder concentration

2001 ◽  
Vol 119 (2-3) ◽  
pp. 241-249 ◽  
Author(s):  
Anders Meurk ◽  
Joseph Yanez ◽  
Lennart Bergström
Keyword(s):  
Silicon Nitride ◽  
Atomic Force Microscope ◽  
Atomic Force ◽  
Binder Concentration ◽  
Friction Measurements

The atomic-force microscope and its future in biology

1993 ◽  
Vol 51 ◽  
pp. 704-705
Author(s):  
Jean-Paul Revel
Keyword(s):  
Silicon Nitride ◽  
Laser Beam ◽  
Atomic Force Microscope ◽  
Scanning Tunneling Microscope ◽  
Point Of View ◽  
Scanning Tunneling ◽  
Close Relative ◽  
Tunneling Microscope ◽  
Atomic Force ◽  
Sharp Point

The last few years have been marked by a series of remarkable developments in microscopy. Perhaps the most amazing of these is the growth of microscopies which use devices where the place of the lens has been taken by probes, which record information about the sample and display it in a spatial from the point of view of the context. From the point of view of the biologist one of the most promising of these microscopies without lenses is the scanned force microscope, aka atomic force microscope.This instrument was invented by Binnig, Quate and Gerber and is a close relative of the scanning tunneling microscope. Today's AFMs consist of a cantilever which bears a sharp point at its end. Often this is a silicon nitride pyramid, but there are many variations, the object of which is to make the tip sharper. A laser beam is directed at the back of the cantilever and is reflected into a split, or quadrant photodiode.

Fundamental Measurements of the Friction on an Atomically-Flat Terrace of Au(100) in Sulfuric Acid Solution under Potential Control Using Electrochemical Atomic Force Microscope

2006 ◽  
Vol 512 ◽  
pp. 395-398
Author(s):  
Nobumitsu Hirai ◽  
Tatsuya Tooyama ◽  
Toshihiro Tanaka
Keyword(s):  
Aqueous Solution ◽  
Sulfuric Acid ◽  
Silicon Nitride ◽  
Acid Solution ◽  
Atomic Force Microscope ◽  
Friction Force ◽  
Potential Range ◽  
Potential Control ◽  
Atomic Force ◽  
Atomically Flat

Potential dependence of the friction force between an atomically-flat terrace of Au(100) single crystal and a tip attached to a silicon nitride cantilever of electrochemical atomic force microscope (EC-AFM) have been investigated qualitatively in 0.05 M H2SO4 aqueous solution. It is found that the friction force gains when the potential increases in the potential range between −400 mV and 400 mV vs Hg/Hg2SO4 electrode.

Friction measurements on phase-separated thin films with a modified atomic force microscope

Nature ◽  
1992 ◽  
Vol 359 (6391) ◽  
pp. 133-135 ◽  
Author(s):  
R. M. Overney ◽  
E. Meyer ◽  
J. Frommer ◽  
D. Brodbeck ◽  
R. Lüthi ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscope ◽  
Atomic Force ◽  
Friction Measurements

Tilt of Atomic Force Microscope Cantilevers: Effect on Friction Measurements

2007 ◽  
Vol 353-358 ◽  
pp. 742-745
Author(s):  
Fei Wang ◽  
Xue Zeng Zhao
Keyword(s):  
Friction Coefficient ◽  
Atomic Force Microscope ◽  
Tilt Angle ◽  
Silicon Surface ◽  
Theoretical Study ◽  
Atomic Force ◽  
Afm Tips ◽  
Variation Range ◽  
Frictional Forces ◽  
Friction Measurements

The cantilevers of atomic force microscope (AFM) are mounted under a certain tilt angle, which is commonly assumed to have negligible effect on friction measurements in AFM. We present a theoretical study of the effect of the tilt angle on AFM based friction measurements. A method for correcting the friction coefficient between sample surfaces and AFM tips is also presented to minimize the effects of the tilt. The frictional forces between a silicon tip and a silicon surface at tilt angles ranging from 5 degrees to 25 degrees were measured. The results show that the measured friction coefficient increases with the tilt angle effectively, whereas the variation range of the corrected friction coefficient is within 10%.

Chemical Mechanical Polishing Friction Measurements With Silica Atomic Force Microscope Tips

2007 ◽  
Author(s):  
Joo Hoon Choi ◽  
Yangro Lee ◽  
Louis E. DeMarco ◽  
Richard T. Leveille ◽  
Joseph A. Levert ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Atomic Force Microscope ◽  
Chemical Mechanical Polishing ◽  
Surface Damage ◽  
Mechanical Polishing ◽  
Radius Of Curvature ◽  
Liquid Environment ◽  
Atomic Force ◽  
Friction Measurements ◽  
Circuit Components

The feature sizes on Integrated Circuits (ICs) continue to decrease to provide higher device densities and smaller chip designs. To accomplish this, current fabrication and processing technology must be advanced to achieve these goals. In particular, Chemical Mechanical Polishing (CMP), which is used for planarization of wafers and logic circuit components during IC fabrication, can cause severe surface damage to components in the form of delamination or distortion of surface features. CMP utilizes polishing particles suspended between a polymeric pad and the substrate to be polished. To control the process with higher precision the fundamentals of friction between CMP surfaces need to be analyzed. To investigate the friction contributions of the polishing particles in the CMP process, individual CMP abrasive particles are modeled by a silica atomic force microscope (AFM) probe with a radius of curvature on the order of 200 nm that is utilized in a scanning probe microscope (SPM). Lateral forces are measured that occur in simulated polishing of silica substrates and polyurethane pad material in a liquid environment. Results are obtained as a function of pH and environment and are compared with macroscopic friction results obtained using a high precision tribometer with a glass ball.

Sign in / Sign up

Export Citation Format

Share Document