The etching of natural alpha-recoil tracks in mica with an argon RF-plasma discharge and their imaging via atomic force microscopy

The paper presents results related to surface treatment of polypropylene fibres with intention to increase its performance in cement composite by exposing such fibres in cold plasma discharge. In was previously demonstrated that such treatment has beneficial effect. Here we focused mainly on the changes in the surface. The study was carried out by electron microscopy, confocal microscopy and microscopy of atomic forces. The results suggest increasing degree of change in the surface as the energy of discharge and time of exposure increase. Atomic force microscopy indicates increase in adhesion force.

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Atomic Force Microscopy Study of Initial Nucleation in the Deposition OF μc-Si:H

MRS Proceedings ◽

10.1557/proc-557-519 ◽

1999 ◽

Vol 557 ◽

Author(s):

P. Brogueira ◽

V. Chu ◽

J.P. Conde

Keyword(s):

Atomic Force Microscopy ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microscopy Study ◽

Dark Conductivity ◽

Rf Plasma ◽

Hydrogen Treatment ◽

Force Microscopy ◽

Atomic Force

AbstractThe initial stages of microcrystalline silicon growth of n+ doped films prepared by rf plasma enhanced chemical vapor deposition (PECVD) and of intrinsic films prepared by hot-wire chemical vapor deposition (HW-CVD) are studied using atomic force microscopy, Raman spectroscopy and parallel dark conductivity measurements. The effect of the use of a plasma hydrogen treatment, of chamber conditioning prior to this treatment, of the type of substrate (glass or c-Si) used and the effects of a seed layer on the film properties are discussed.

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An Atomic Force Microscopy Study of the Initial Nucleation of GaN on Sapphire

MRS Proceedings ◽

10.1557/proc-395-237 ◽

1995 ◽

Vol 395 ◽

Cited By ~ 10

Author(s):

M. Richards-Babb ◽

S. L. Buczkowski ◽

Zhonghai Yu ◽

T. H. Myers

Keyword(s):

Atomic Force Microscopy ◽

Plasma Source ◽

Microscopy Study ◽

Rf Plasma ◽

X Ray Diffraction ◽

Force Microscopy ◽

Atomic Force ◽

Initial Nucleation ◽

Dimensional Growth ◽

Thick Layers

ABSTRACTPreliminary results of a study of GaN nucleation and growth by molecular beam epitaxy using a nitrogen rf plasma source are presented. Nucleation layers and 3000 Å thick layers were investigated by atomic force microscopy and x-ray diffraction. Growth under gallium-rich conditions both increased nucleation island size and promoted two-dimensional growth.

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Microscopic Electrical Conductivity of Nanodiamonds after Thermal and Plasma Treatments

MRS Advances ◽

10.1557/adv.2016.112 ◽

2016 ◽

Vol 1 (16) ◽

pp. 1105-1111 ◽

Cited By ~ 4

Author(s):

Jan Čermák ◽

Halyna Kozak ◽

Štěpán Stehlík ◽

Vladimír Švrček ◽

Vincent Pichot ◽

...

Keyword(s):

Electrical Conductivity ◽

Atomic Force Microscopy ◽

Electric Current ◽

Amorphous Carbon ◽

Rf Plasma ◽

Electrically Conductive ◽

Force Microscopy ◽

Atomic Force ◽

Plasma Treatments ◽

Hydrogenated Amorphous

ABSTRACTAtomic force microscopy (AFM) is used to measure local electrical conductivity of HPHT nanodiamonds (NDs) dispersed on Au substrate in the as-received state and after thermal or plasma treatments. Oxygen-treated NDs are highly electrically resistive, whereas on hydrogen-treated NDs electric current around -200 pA at -2 V is detected. The as-received NDs as well as NDs after an underwater radio-frequency (RF) plasma or laser irradiation (LI) treatments contain both electrically conductive (two types: highly and weakly conductive) and highly resistive particles. The higher conductivity is attributed to H-terminated (RF) or graphitized (LI) NDs. The lower conductivity is attributed to NDs with hydrogenated amorphous carbon shell.

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