Influence of N2 flow ratio on the properties of hafnium nitride thin films prepared by DC magnetron sputtering

Fe–N thin films were deposited on glass substrates by dc magnetron sputtering under various Ar∕N2 discharge conditions. Crystal structures and elemental compositions of the films were characterized by X-ray diffraction and X-ray photoelectron spectroscopy. Magnetic properties of the films were measured using a superconducting quantum interference device magnetometer. Films deposited at different N2∕(Ar+N2) flow ratios were found to have different crystal structures and different nitrogen contents. When the flow ratios were 60%, 50%, and 30%, a nonmagnetic single-phase FeN was formed in the films. At the flow ratio of 10%, two crystal phases of γ′-Fe4N and ε-Fe3N were detected. When the flow ratio reduced to 5%, a mixture of α-Fe, ε-Fe3N, FeN0.056, and α″-Fe16N2 phases was obtained. The value of saturation magnetization for the mixture was found to be larger than that of pure Fe.

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High Rate Deposition of Nickel Oxide Electrochromic Thin Films by Reactive DC Magnetron Sputtering

MRS Proceedings ◽

10.1557/proc-369-663 ◽

1994 ◽

Vol 369 ◽

Author(s):

Kazuki Yoshimura ◽

T. Miki ◽

S. Tanemura

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Substrate Temperature ◽

Nickel Oxide ◽

Deposition Rate ◽

Operation Mode ◽

High Rate ◽

Flow Ratio ◽

Low Oxygen ◽

Dc Magnetron Sputtering

AbstractNickel oxide electrochromic thin films were prepared by reactive DC magnetron sputtering. As-deposited optical property and electrochromic behavior strongly depended on the target operation mode and the substrate temperature. In the condition of low oxygen flow ratio (∼1%), the deposition rate can be raised up to 40 nm/min at the power of 60 W. The sample with the deposition rate of 30 nm/min exhibited the best electrochromic performance when the substrate temperature was kept to 200°C-300°C during sputtering. The integrated luminous transmittance of the best sample could be controlled from 6.6% to 82.3%.

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Influence of substrate and Ar/N2 gas flow ratio on structural, optical and electrical properties of TiN thin films synthetized by DC magnetron sputtering

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-018-9031-2 ◽

2018 ◽

Vol 29 (12) ◽

pp. 9893-9900 ◽

Cited By ~ 3

Author(s):

Peng Gu ◽

Xinghua Zhu ◽

Jitao Li ◽

Haihua Wu ◽

Dingyu Yang

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Gas Flow ◽

Optical And Electrical Properties ◽

Flow Ratio ◽

Dc Magnetron Sputtering ◽

Gas Flow Ratio ◽

Tin Thin Films ◽

Influence Of Substrate

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Effects of Oxygen Flow Ratio and Thermal Annealing on Defect Evolution of Aluminum Doped Zinc Oxide Thin Films by Reactive DC Magnetron Sputtering

Journal of Physics Condensed Matter ◽

10.1088/1361-648x/ac1f50 ◽

2021 ◽

Author(s):

Chao Ping Liu ◽

Zhan Hua Li ◽

Kingsley Egbo ◽

Cheuk Kai Kwok ◽

Xiao Hu Lv ◽

...

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Magnetron Sputtering ◽

Thermal Annealing ◽

Oxygen Flow ◽

Flow Ratio ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films ◽

Defect Evolution ◽

Aluminum Doped Zinc Oxide

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Preparing transparent cobalt-doped ZnO thin films by DC magnetron sputtering

Materials Today Proceedings ◽

10.1016/j.matpr.2017.06.132 ◽

2017 ◽

Vol 4 (5) ◽

pp. 6311-6316 ◽

Cited By ~ 1

Author(s):

Pongladda Panyajirawut ◽

Nattha Pratumsuwan ◽

Kornkamon Meesombad ◽

Kridsana Thanawattana ◽

Artit Chingsungnoen ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Zno Thin Films ◽

Dc Magnetron Sputtering ◽

Doped Zno

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The Structure and Magnetic Properties of NiZn-Ferrite Films Deposited by Magnetron Sputtering at Room Temperature

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.690-693.1702 ◽

2013 ◽

Vol 690-693 ◽

pp. 1702-1706 ◽

Cited By ~ 2

Author(s):

Shuang Jun Nie ◽

Hao Geng ◽

Jun Bao Wang ◽

Lai Sen Wang ◽

Zhen Wei Wang ◽

...

Keyword(s):

Thin Films ◽

Magnetic Properties ◽

Magnetron Sputtering ◽

Saturation Magnetization ◽

Room Temperature ◽

Oxygen Flow ◽

Flow Ratio ◽

Study Results ◽

Ferrite Thin Films ◽

Ferrite Films

NiZn-ferrite thin films were deposited onto silicon and glass substrates by radio frequency magnetron sputtering at room temperature. The effects of the relative oxygen flow ratio on the structure and magnetic properties of the thin films were investigated. The study results reveal that the films deposited under higher relative oxygen flow ratio show a better crystallinity. Static magnetic measurement results indicated that the saturation magnetization of the films was greatly affected by the crystallinity, grain dimension, and cation distribution in the NiZn-ferrite films. The NiZn-ferrite thin films with a maximum saturation magnetization of 151 emucm-3, which is about 40% of the bulk NiZn ferrite, was obtained under relative oxygen flow ratio of 60%.

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