Role of ethylenediamine additive in Cu growth on a Co/SiO2/Si substrate via electrochemical atomic layer deposition of Pb and its surface limited redox replacement

2019 ◽  
Vol 477 ◽  
pp. 280-284 ◽  
Author(s):  
Jai-Ling Wu ◽  
Jau-Shiung Fang
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Si Substrate ◽  
Layer Deposition

Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactant

2021 ◽  
Author(s):  
Matthias Marcus Minjauw ◽  
Ji-Yu Feng ◽  
Timo Sajavaara ◽  
Christophe Detavernier ◽  
Jolien Dendooven
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Ruthenium Tetroxide ◽  
Layer Deposition

In this work, the use of ruthenium tetroxide (RuO4) as a co-reactant for atomic layer deposition (ALD) is reported. The role of RuO4 as a co-reactant is twofold: it acts...

Role of reactive gas on the structure and properties of titanium nitride films grown by plasma enhanced atomic layer deposition

2018 ◽  
Vol 36 (6) ◽  
pp. 06A105 ◽  
Author(s):  
Igor Krylov ◽  
Xianbin Xu ◽  
Ekaterina Zoubenko ◽  
Kamira Weinfeld ◽  
Santiago Boyeras ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Structure And Properties ◽  
Layer Deposition ◽  
Reactive Gas

Order of magnitude enhancement of inherently selective atomic layer deposition of zirconia on silicon without deposition on copper: The role of precursor

Vacuum ◽  
2021 ◽  
pp. 110686
Author(s):  
Soumya Saha ◽  
Gregory Jursich ◽  
Abhijit H. Phakatkar ◽  
Tolou Shokuhfar ◽  
Christos G. Takoudis
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Order Of Magnitude

scholarly journals Role of oligomer structures in the surface chemistry of amidinate metal complexes used for atomic layer deposition of thin films

2019 ◽  
Vol 35 (7) ◽  
pp. 720-731 ◽  
Author(s):  
Jonathan Guerrero-Sánchez ◽  
Bo Chen ◽  
Noboru Takeuchi ◽  
Francisco Zaera
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Chemistry ◽  
Metal Complexes ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Image Position

Abstract

scholarly journals Synthesis of a Rationally Designed Multi-Component Photocatalyst Pt:SiO2:TiO2(P25) with Improved Activity for Dye Degradation by Atomic Layer Deposition

Nanomaterials ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 1496 ◽  
Author(s):  
Dominik Benz ◽  
Hao Van Bui ◽  
Hubertus T. Hintzen ◽  
Michiel T. Kreutzer ◽  
J. Ruud van Ommen
Keyword(s):  
Atomic Layer Deposition ◽  
Dye Degradation ◽  
Atomic Layer ◽  
Oh Groups ◽  
Practical Applications ◽  
Beneficial Effects ◽  
Layer Deposition ◽  
The Individual ◽  
Materials Behavior

Photocatalysts for water purification typically lack efficiency for practical applications. Here we present a multi-component (Pt:SiO2:TiO2(P25)) material that was designed using knowledge of reaction mechanisms of mono-modified catalysts (SiO2:TiO2, and Pt:TiO2) combined with the potential of atomic layer deposition (ALD). The deposition of ultrathin SiO2 layers on TiO2 nanoparticles, applying ALD in a fluidized bed reactor, demonstrated in earlier studies their beneficial effects for the photocatalytic degradation of organic pollutants due to more acidic surface Si–OH groups which benefit the generation of hydroxyl radicals. Furthermore, our investigation on the role of Pt on TiO2(P25), as an improved photocatalyst, demonstrated that suppression of charge recombination by oxygen adsorbed on the Pt particles, reacting with the separated electrons to superoxide radicals, acts as an important factor for the catalytic improvement. Combining both materials into the resulting Pt:SiO2:TiO2(P25) nanopowder exceeded the dye degradation performance of both the individual SiO2:TiO2(P25) (1.5 fold) and Pt:TiO2(P25) (4-fold) catalysts by 6-fold as compared to TiO2(P25). This approach thus shows that by understanding the individual materials’ behavior and using ALD as an appropriate deposition technique enabling control on the nano-scale, new materials can be designed and developed, further improving the photocatalytic activity. Our research demonstrates that ALD is an attractive technology to synthesize multicomponent catalysts in a precise and scalable way.

Impact of in situ atomic layer deposition TiN/high-κ stack onto In0.53Ga0.47As MOSCAPs on 300 mm Si substrate

2019 ◽  
Vol 58 (4) ◽  
pp. 040905 ◽  
Author(s):  
Jun-Gyu Kim ◽  
Hyuk-Min Kwon ◽  
Dae-Hyun Kim ◽  
Tae-Woo Kim
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Si Substrate ◽  
Layer Deposition
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