Effect of bipolar pulsed dc bias on the mechanical properties of silicon oxide thin film by plasma enhanced chemical vapor deposition

2011 ◽  
Vol 11 (4) ◽  
pp. 1107-1110 ◽  
Author(s):  
Su B. Jin ◽  
Sung I. Kim ◽  
Yoon S. Choi ◽  
In S. Choi ◽  
Jeon G. Han
Keyword(s):  
Thin Film ◽  
Mechanical Properties ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Oxide Thin Film ◽  
Pulsed Dc ◽  
Dc Bias

Zinc oxide thin film synthesized by combustion chemical vapor deposition

2008 ◽  
Vol 255 (5) ◽  
pp. 2859-2863 ◽  
Author(s):  
Zhi-Yang Li ◽  
Fuchun Xu ◽  
Qi-Hui Wu ◽  
Jing Li
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Oxide Thin Film ◽  
Zinc Oxide Thin Film

Growth mechanism of zinc oxide thin film by mist chemical vapor deposition via the modulation of [H2O]/[Zn] ratios

2019 ◽  
Vol 12 (6) ◽  
pp. 065505 ◽  
Author(s):  
Phimolphan Rutthongjan ◽  
Misaki Nishi ◽  
Li Liu ◽  
Shota Sato ◽  
Yuya Okada ◽  
...  
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Growth Mechanism ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Oxide Thin Film ◽  
Zinc Oxide Thin Film

Excimer Laser-Assisted Chemical Vapor Deposition of Metal-Oxide Thin Film from β-Diketone Complexes

1991 ◽  
Vol 30 (Part 2, No. 1A) ◽  
pp. L35-L38 ◽  
Author(s):  
Takahisa Ushida ◽  
Kazutoshi Higashiyama ◽  
Izumi Hirabayashi ◽  
Shoji Tanaka
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Metal Oxide ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Oxide Thin Film ◽  
Metal Oxide Thin Film

Study of SiC’s Mechanical Property Variance Caused by Film Thickness

2015 ◽  
Vol 645-646 ◽  
pp. 400-404
Author(s):  
Zong Lei Jiao ◽  
Jian Zhu
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Mechanical Property ◽  
Chemical Vapor Deposition ◽  
Elastic Modulus ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Indentation Load

The mechanical properties of SiC thin films deposited by chemical vapor deposition process on silicon substrate are studied using nanoindentation techniques. The SiC thin films are of three different thicknesses: 1.6μm、4.5μm、9μm. In this study, nanoindentation method is preferred due to its reliability and accuracy on determining mechanical properties from indentation load-displacement data. The mechanical properties of elastic modulus and hardness are characterized. 1.6μm SiC thin film has the following values: E=345.73Gpa, H=33.71Gpa; 4.5μm SiC thin film has the following values: E=170.18Gpa, H=10.33Gpa; 9μm SiC thin film: E=167.96Gpa, H=9.48Gpa

Sign in / Sign up

Export Citation Format

Share Document